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公开(公告)号：US08664703B2
公开(公告)日：2014-03-04
申请号：US13599753
申请日：2012-08-30
IPC分类号： H01L31/062
CPC分类号： H01L29/78633
摘要： The instant application describes a display device that includes a substrate; a gate electrode provided on the substrate; a gate insulating film provided on the gate electrode; a semiconductor layer provided on the gate insulating film; a source electrode and a drain electrode provided on the semiconductor layer; a protective insulating film provided on the source electrode and the drain electrode; a pixel electrode provided on the protective insulating film, and connected to one of the source electrode and the drain electrode through a contact hole formed through the protective insulating film; and a shield provided on the protective insulating film, the shield not being electrically connected to the pixel electrode.
摘要翻译： 本申请描述了包括基板的显示装置; 设置在所述基板上的栅电极; 设置在栅电极上的栅极绝缘膜; 设置在栅极绝缘膜上的半导体层; 设置在半导体层上的源电极和漏电极; 设置在源电极和漏电极上的保护绝缘膜; 设置在所述保护绝缘膜上的像素电极，通过形成在所述保护绝缘膜上的接触孔与所述源电极和所述漏电极中的一方连接; 以及设置在保护绝缘膜上的屏蔽层，该屏蔽层不与像素电极电连接。
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公开(公告)号：US20130048997A1
公开(公告)日：2013-02-28
申请号：US13599753
申请日：2012-08-30
IPC分类号： H01L29/786
CPC分类号： H01L29/78633
摘要： The instant application describes a display device that includes a substrate; a gate electrode provided on the substrate; a gate insulating film provided on the gate electrode; a semiconductor layer provided on the gate insulating film; a source electrode and a drain electrode provided on the semiconductor layer; a protective insulating film provided on the source electrode and the drain electrode; a pixel electrode provided on the protective insulating film, and connected to one of the source electrode and the drain electrode through a contact hole formed through the protective insulating film; and a shield provided on the protective insulating film, the shield not being electrically connected to the pixel electrode.
摘要翻译： 本申请描述了包括基板的显示装置; 设置在所述基板上的栅电极; 设置在栅电极上的栅极绝缘膜; 设置在栅极绝缘膜上的半导体层; 设置在半导体层上的源电极和漏电极; 设置在源电极和漏电极上的保护绝缘膜; 设置在所述保护绝缘膜上的像素电极，通过形成在所述保护绝缘膜上的接触孔与所述源电极和所述漏电极中的一方连接; 以及设置在保护绝缘膜上的屏蔽层，该屏蔽层不与像素电极电连接。
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公开(公告)号：US07776497B2
公开(公告)日：2010-08-17
申请号：US12547765
申请日：2009-08-26
IPC分类号： G03F1/00
摘要： A mask including a transparent substrate, a non-transmitting layer, a first transmitting layer and a second transmitting layer is provided. The transparent substrate has a first region, a second region, and a third region. The non-transmitting layer is disposed in the first region of the transparent substrate. The first transmitting layer is disposed in the second region and the third region of the transparent substrate. The second transmitting layer is disposed on the first transmitting layer in the third region.
摘要翻译： 提供了包括透明衬底，非透射层，第一透射层和第二透射层的掩模。 透明基板具有第一区域，第二区域和第三区域。 非透射层设置在透明基板的第一区域中。 第一透射层设置在透明基板的第二区域和第三区域中。 第二发送层设置在第三区域的第一发送层上。
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公开(公告)号：US20060186409A1
公开(公告)日：2006-08-24
申请号：US11351488
申请日：2006-02-09
申请人： Shigekazu Horino , Chun-hao Tung , Hsien-kai Tseng
发明人： Shigekazu Horino , Chun-hao Tung , Hsien-kai Tseng
IPC分类号： H01L29/04
CPC分类号： G02F1/136227 , G02F2001/136236 , H01L27/124 , H01L27/1288 , H01L29/78633
摘要： The invention provides a novel technology where a TFT array substrate for a display device is formed with three photomasks. The invention is achieved by using the novel technology in combination with a well-known four-masks process. For the novel technology, during the lithography process where a photosensitive acrylic resin film is used to make contacts, taper patterns required for general through holes are formed simultaneously with a fine pattern formed in a light shielding area that is tapered more approximately to vertical, using a photomask with phase-shift effect. Thus the pixel electrode pattern can be separated without using lithography process in subsequent processes.
摘要翻译： 本发明提供了一种新型技术，其中用于显示装置的TFT阵列基板由三个光掩模形成。 本发明通过结合众所周知的四掩模工艺使用新技术来实现。 对于新技术，在使用光敏丙烯酸树脂膜进行接触的光刻工艺期间，通用通孔所需的锥形图案与形成在更接近垂直的遮光区域的精细图案同时形成，使用 具有相移效应的光掩模。 因此，可以在随后的工艺中不使用光刻工艺来分离像素电极图案。
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公开(公告)号：US20090317731A1
公开(公告)日：2009-12-24
申请号：US12547765
申请日：2009-08-26
IPC分类号： G03F1/00
摘要： A mask including a transparent substrate, a non-transmitting layer, a first transmitting layer and a second transmitting layer is provided. The transparent substrate has a first region, a second region, and a third region. The non-transmitting layer is disposed in the first region of the transparent substrate. The first transmitting layer is disposed in the second region and the third region of the transparent substrate. The second transmitting layer is disposed on the first transmitting layer in the third region.
摘要翻译： 提供了包括透明衬底，非透射层，第一透射层和第二透射层的掩模。 透明基板具有第一区域，第二区域和第三区域。 非透射层设置在透明基板的第一区域中。 第一透射层设置在透明基板的第二区域和第三区域中。 第二发送层设置在第三区域的第一发送层上。
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公开(公告)号：US07553707B2
公开(公告)日：2009-06-30
申请号：US11351488
申请日：2006-02-09
申请人： Shigekazu Horino , Chun-hao Tung , Hsien-kai Tseng
发明人： Shigekazu Horino , Chun-hao Tung , Hsien-kai Tseng
CPC分类号： G02F1/136227 , G02F2001/136236 , H01L27/124 , H01L27/1288 , H01L29/78633
摘要： The invention provides a novel technology where a TFT array substrate for a display device is formed with three photomasks. The invention is achieved by using the novel technology in combination with a well-known four-masks process. For the novel technology, during the lithography process where a photosensitive acrylic resin film is used to make contacts, taper patterns required for general through holes are formed simultaneously with a fine pattern formed in a light shielding area that is tapered more approximately to vertical, using a photomask with phase-shift effect. Thus the pixel electrode pattern can be separated without using lithography process in subsequent processes.
摘要翻译： 本发明提供了一种新型技术，其中用于显示装置的TFT阵列基板由三个光掩模形成。 本发明通过结合众所周知的四掩模工艺使用新技术来实现。 对于新技术，在使用光敏丙烯酸树脂膜进行接触的光刻工艺期间，通用通孔所需的锥形图案与形成在更接近垂直的遮光区域的精细图案同时形成，使用 具有相移效应的光掩模。 因此，可以在随后的工艺中不使用光刻工艺来分离像素电极图案。
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