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公开(公告)号：US20060186409A1
公开(公告)日：2006-08-24
申请号：US11351488
申请日：2006-02-09
申请人： Shigekazu Horino , Chun-hao Tung , Hsien-kai Tseng
发明人： Shigekazu Horino , Chun-hao Tung , Hsien-kai Tseng
IPC分类号： H01L29/04
CPC分类号： G02F1/136227 , G02F2001/136236 , H01L27/124 , H01L27/1288 , H01L29/78633
摘要： The invention provides a novel technology where a TFT array substrate for a display device is formed with three photomasks. The invention is achieved by using the novel technology in combination with a well-known four-masks process. For the novel technology, during the lithography process where a photosensitive acrylic resin film is used to make contacts, taper patterns required for general through holes are formed simultaneously with a fine pattern formed in a light shielding area that is tapered more approximately to vertical, using a photomask with phase-shift effect. Thus the pixel electrode pattern can be separated without using lithography process in subsequent processes.
摘要翻译： 本发明提供了一种新型技术，其中用于显示装置的TFT阵列基板由三个光掩模形成。 本发明通过结合众所周知的四掩模工艺使用新技术来实现。 对于新技术，在使用光敏丙烯酸树脂膜进行接触的光刻工艺期间，通用通孔所需的锥形图案与形成在更接近垂直的遮光区域的精细图案同时形成，使用 具有相移效应的光掩模。 因此，可以在随后的工艺中不使用光刻工艺来分离像素电极图案。
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公开(公告)号：US20100320466A1
公开(公告)日：2010-12-23
申请号：US12560428
申请日：2009-09-16
CPC分类号： H01L27/1288 , H01L27/1214 , H01L27/124 , H01L27/1248
摘要： A thin film transistor array substrate and a manufacturing method thereof are provided. In the manufacturing method, a first patterned conductive layer including a plurality of scan lines and a plurality of gates connected with the scan lines is formed on a substrate. A patterned gate insulating layer having a plurality of openings is then formed on the substrate to cover at least a portion of the first patterned conductive layer, and a plurality of dielectric patterns are formed in the openings. A plurality of semiconductor patterns are formed on the patterned gate insulating layer. A second patterned conductive layer is formed on the semiconductor patterns, the patterned gate insulating layer, and the dielectric patterns. A passivation layer is formed on the semiconductor patterns, the patterned gate insulating layer, and the dielectric patterns. A plurality of pixel electrodes are formed on the passivation layer.
摘要翻译： 提供薄膜晶体管阵列基板及其制造方法。 在制造方法中，在基板上形成包括多条扫描线的第一图案化导电层和与扫描线连接的多个栅极。 然后在衬底上形成具有多个开口的图案化栅极绝缘层，以覆盖第一图案化导电层的至少一部分，并且在开口中形成多个电介质图案。 在图案化的栅极绝缘层上形成多个半导体图案。 在半导体图案，图案化栅极绝缘层和电介质图案上形成第二图案化导电层。 在半导体图案，图案化栅绝缘层和电介质图案上形成钝化层。 在钝化层上形成多个像素电极。
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公开(公告)号：US07776497B2
公开(公告)日：2010-08-17
申请号：US12547765
申请日：2009-08-26
IPC分类号： G03F1/00
摘要： A mask including a transparent substrate, a non-transmitting layer, a first transmitting layer and a second transmitting layer is provided. The transparent substrate has a first region, a second region, and a third region. The non-transmitting layer is disposed in the first region of the transparent substrate. The first transmitting layer is disposed in the second region and the third region of the transparent substrate. The second transmitting layer is disposed on the first transmitting layer in the third region.
摘要翻译： 提供了包括透明衬底，非透射层，第一透射层和第二透射层的掩模。 透明基板具有第一区域，第二区域和第三区域。 非透射层设置在透明基板的第一区域中。 第一透射层设置在透明基板的第二区域和第三区域中。 第二发送层设置在第三区域的第一发送层上。
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公开(公告)号：US07704647B2
公开(公告)日：2010-04-27
申请号：US11444546
申请日：2006-05-31
IPC分类号： G03F1/00
摘要： A mask and a manufacturing method thereof are provided. A transparent substrate having three regions is provided first. A non-transmitting layer is formed in a first region of the transparent substrate. Then, a first photoresist layer is formed on the transparent substrate, and the first photoresist layer exposes a second region of the transparent substrate. Next, a first transmitting layer is formed on the transparent substrate and the first photoresist layer. Finally, the first photoresist layer is removed. The first transmitting layer on the first photoresist layer is removed at the same time and the first transmitting layer in the second region of the transparent substrate is remained and a third region of the transparent substrate is exposed. A lift-off process is used in the mask manufacturing method of the present invention to form the transmitting layer.
摘要翻译： 提供了一种掩模及其制造方法。 首先设置具有三个区域的透明基板。 在透明基板的第一区域中形成非透光层。 然后，在透明基板上形成第一光致抗蚀剂层，第一光致抗蚀剂层露出透明基板的第二区域。 接下来，在透明基板和第一光致抗蚀剂层上形成第一透光层。 最后，去除第一光致抗蚀剂层。 同时去除第一光致抗蚀剂层上的第一透射层，并且保留透明基板的第二区域中的第一透射层，并露出透明基板的第三区域。 在本发明的掩模制造方法中使用剥离处理来形成透射层。
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公开(公告)号：US08314423B2
公开(公告)日：2012-11-20
申请号：US12560428
申请日：2009-09-16
IPC分类号： H01L29/786
CPC分类号： H01L27/1288 , H01L27/1214 , H01L27/124 , H01L27/1248
摘要： A thin film transistor array substrate and a manufacturing method thereof are provided. In the manufacturing method, a first patterned conductive layer including a plurality of scan lines and a plurality of gates connected with the scan lines is formed on a substrate. A patterned gate insulating layer having a plurality of openings is then formed on the substrate to cover at least a portion of the first patterned conductive layer, and a plurality of dielectric patterns are formed in the openings. A plurality of semiconductor patterns are formed on the patterned gate insulating layer. A second patterned conductive layer is formed on the semiconductor patterns, the patterned gate insulating layer, and the dielectric patterns. A passivation layer is formed on the semiconductor patterns, the patterned gate insulating layer, and the dielectric patterns. A plurality of pixel electrodes are formed on the passivation layer.
摘要翻译： 提供薄膜晶体管阵列基板及其制造方法。 在制造方法中，在基板上形成包括多条扫描线的第一图案化导电层和与扫描线连接的多个栅极。 然后在衬底上形成具有多个开口的图案化栅极绝缘层，以覆盖第一图案化导电层的至少一部分，并且在开口中形成多个电介质图案。 在图案化的栅极绝缘层上形成多个半导体图案。 在半导体图案，图案化栅极绝缘层和电介质图案上形成第二图案化导电层。 在半导体图案，图案化栅绝缘层和电介质图案上形成钝化层。 在钝化层上形成多个像素电极。
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公开(公告)号：US20070059611A1
公开(公告)日：2007-03-15
申请号：US11444546
申请日：2006-05-31
摘要： A mask and a manufacturing method thereof are provided. A transparent substrate having three regions is provided first. A non-transmitting layer is formed in a first region of the transparent substrate. Then, a first photoresist layer is formed on the transparent substrate, and the first photoresist layer exposes a second region of the transparent substrate. Next, a first transmitting layer is formed on the transparent substrate and the first photoresist layer. Finally, the first photoresist layer is removed. The first transmitting layer on the first photoresist layer is removed at the same time and the first transmitting layer in the second region of the transparent substrate is remained and a third region of the transparent substrate is exposed. A lift-off process is used in the mask manufacturing method of the present invention to form the transmitting layer.
摘要翻译： 提供了一种掩模及其制造方法。 首先设置具有三个区域的透明基板。 在透明基板的第一区域中形成非透光层。 然后，在透明基板上形成第一光致抗蚀剂层，第一光致抗蚀剂层露出透明基板的第二区域。 接下来，在透明基板和第一光致抗蚀剂层上形成第一透光层。 最后，去除第一光致抗蚀剂层。 同时去除第一光致抗蚀剂层上的第一透射层，并且保留透明基板的第二区域中的第一透射层，并露出透明基板的第三区域。 在本发明的掩模制造方法中使用剥离处理来形成透射层。
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公开(公告)号：US20090317731A1
公开(公告)日：2009-12-24
申请号：US12547765
申请日：2009-08-26
IPC分类号： G03F1/00
摘要： A mask including a transparent substrate, a non-transmitting layer, a first transmitting layer and a second transmitting layer is provided. The transparent substrate has a first region, a second region, and a third region. The non-transmitting layer is disposed in the first region of the transparent substrate. The first transmitting layer is disposed in the second region and the third region of the transparent substrate. The second transmitting layer is disposed on the first transmitting layer in the third region.
摘要翻译： 提供了包括透明衬底，非透射层，第一透射层和第二透射层的掩模。 透明基板具有第一区域，第二区域和第三区域。 非透射层设置在透明基板的第一区域中。 第一透射层设置在透明基板的第二区域和第三区域中。 第二发送层设置在第三区域的第一发送层上。
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公开(公告)号：US07553707B2
公开(公告)日：2009-06-30
申请号：US11351488
申请日：2006-02-09
申请人： Shigekazu Horino , Chun-hao Tung , Hsien-kai Tseng
发明人： Shigekazu Horino , Chun-hao Tung , Hsien-kai Tseng
CPC分类号： G02F1/136227 , G02F2001/136236 , H01L27/124 , H01L27/1288 , H01L29/78633
摘要： The invention provides a novel technology where a TFT array substrate for a display device is formed with three photomasks. The invention is achieved by using the novel technology in combination with a well-known four-masks process. For the novel technology, during the lithography process where a photosensitive acrylic resin film is used to make contacts, taper patterns required for general through holes are formed simultaneously with a fine pattern formed in a light shielding area that is tapered more approximately to vertical, using a photomask with phase-shift effect. Thus the pixel electrode pattern can be separated without using lithography process in subsequent processes.
摘要翻译： 本发明提供了一种新型技术，其中用于显示装置的TFT阵列基板由三个光掩模形成。 本发明通过结合众所周知的四掩模工艺使用新技术来实现。 对于新技术，在使用光敏丙烯酸树脂膜进行接触的光刻工艺期间，通用通孔所需的锥形图案与形成在更接近垂直的遮光区域的精细图案同时形成，使用 具有相移效应的光掩模。 因此，可以在随后的工艺中不使用光刻工艺来分离像素电极图案。
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