公开(公告)号：US20120129679A1

公开(公告)日：2012-05-24

申请号：US13362852

申请日：2012-01-31

申请人： Shoichi KISHIMOTO ,  Haruki NIIDA ,  Akihiro KOYAMA ,  Yukihito NAGASHIMA

发明人： Shoichi KISHIMOTO ,  Haruki NIIDA ,  Akihiro KOYAMA ,  Yukihito NAGASHIMA

IPC分类号： C03C3/11

CPC分类号： C03C3/091 ,  G02F1/1333

摘要： A glass composition which is reduced in the amount of residual bubbles and is produced using smaller amounts of an environmentally unfriendly component such as arsenic oxide and antimony oxide. This glass composition contains, in terms of mass %: 40-70% SiO2; 5-20% B2O3; 10-25% Al2O3; 0-10% MgO; 0-20% CaO; 0-20% SrO; 0-10% BaO; 0-0.5% Li2O; 0-1.0% Na2O; 0-1.5% K2O; and 0-1.5%, excluding 0%, Cl, Li2O+Na2O+K2O exceeding 0.06%. The glass composition can be produced suitably using, for example, a chloride as part of the raw glass materials.

摘要翻译： 减少残留气泡量的玻璃组合物，并使用较少量的环境不友好的成分如砷氧化物和氧化锑来生产。 该玻璃组合物含有质量％：40-70％SiO 2; 5-20％B2O3; 10-25％Al2O3; 0-10％MgO; 0-20％CaO; 0-20％SrO; 0-10％BaO; 0-0.5％Li2O; 0-1.0％Na2O; 0-1.5％K2O; 和0-1.5％，不包括0％，Cl，Li2O + Na2O + K2O超过0.06％。 可以使用例如作为原料玻璃材料的一部分的氯化物适当地制造玻璃组合物。

公开(公告)号：US20100273634A1

公开(公告)日：2010-10-28

申请号：US12834486

申请日：2010-07-12

申请人： Shoichi KISHIMOTO ,  Haruki NIIDA ,  Akihiro KOYAMA ,  Yukihito NAGASHIMA

发明人： Shoichi KISHIMOTO ,  Haruki NIIDA ,  Akihiro KOYAMA ,  Yukihito NAGASHIMA

IPC分类号： C03C3/091

CPC分类号： C03C3/091 ,  G02F1/1333

摘要： A glass composition which is reduced in the amount of residual bubbles and is produced using smaller amounts of an environmentally unfriendly component such as arsenic oxide and antimony oxide. This glass composition contains, in terms of mass %: 40-70% SiO2; 5-20% B2O3; 10.25% Al2O3; 0-10% MgO; 0-20% CaO; 0-20% SrO; 0-10% BaO; 0-0.5% Li2O; 0-1.0% Na2O; 0-1.5% K2O; and 0-1.5%, excluding 0%, Cl, Li2O+Na2O+K2O exceeding 0.06%. The glass composition can be produced suitably using, for example, a chloride as part of the raw glass materials.

摘要翻译： 减少残留气泡量的玻璃组合物，并使用较少量的环境不友好的成分如砷氧化物和氧化锑来生产。 该玻璃组合物含有质量％：40-70％SiO 2; 5-20％B2O3; 10-25％Al2O3; 0-10％MgO; 0-20％CaO; 0-20％SrO; 0-10％BaO; 0-0.5％Li2O; 0-1.0％Na2O; 0-1.5％K2O; 和0-1.5％，不包括0％，Cl，Li2O + Na2O + K2O超过0.06％。 可以使用例如作为原料玻璃材料的一部分的氯化物适当地制造玻璃组合物。

公开(公告)号：US20110207594A1

公开(公告)日：2011-08-25

申请号：US13099023

申请日：2011-05-02

申请人： Haruki NIIDA ,  Akihiro KOYAMA ,  Yukihito NAGASHIMA ,  Satoshi FURUSAWA

发明人： Haruki NIIDA ,  Akihiro KOYAMA ,  Yukihito NAGASHIMA ,  Satoshi FURUSAWA

IPC分类号： C03C3/11

CPC分类号： C03C4/20 ,  C03C3/11 ,  G02F1/1333

摘要： A glass composition which is reduced in the amount of residual bubbles and is produced using smaller amounts of an environmentally unfriendly component such as arsenic oxide and antimony oxide. This glass composition comprises, in terms of mass %; 40-70% SiO2; 5-20% B2O3; 10-25% Al2O3; 0-10% MgO; 0-20% CaO; 0-20% SrO; 0-10% BaO; 0.001-0.5% Li2O; 0.01-0.5% Na2O; 0.002-0.5% K2O; and 0-1.0%, excluding 0%, Cl

摘要翻译： 减少残留气泡量的玻璃组合物，并使用较少量的环境不友好的成分如砷氧化物和氧化锑来生产。 该玻璃组合物以质量％表示; 40-70％SiO2; 5-20％B2O3; 10-25％Al2O3; 0-10％MgO; 0-20％CaO; 0-20％SrO; 0-10％BaO; 0.001-0.5％Li2O; 0.01-0.5％Na2O; 0.002-0.5％K2O; 和0-1.0％，不包括0％，Cl

公开(公告)号：US20130023400A1

公开(公告)日：2013-01-24

申请号：US13537579

申请日：2012-06-29

申请人： Akihiro KOYAMA ,  Satoshi Ami ,  Manabu Ichikawa

发明人： Akihiro KOYAMA ,  Satoshi Ami ,  Manabu Ichikawa

IPC分类号： C03C3/091 ,  C03C3/066 ,  C03C3/093 ,  C03B25/00 ,  C03C3/064

CPC分类号： C03C3/091 ,  C03C3/093 ,  G02F2001/133302 ,  H01L51/0096

摘要： A flat panel display glass substrate according to the present invention includes a glass comprising, as expressed in mol %, 55-80% SiO2, 3-20% Al2O3, 3-15% B2O3, 3-25% RO (the total amount of MgO, CaO, SrO, and BaO), and substantially no As2O3 and Sb2O3. The devitrification temperature of the glass is 1250° C. or less. The glass substrate has a heat shrinkage rate of 75 ppm or less. The heat shrinkage rate is calculated from the amount of shrinkage of the glass substrate measured after a heat treatment which is performed at a temperature rising and falling rate of 10° C./min and at 550° C. for 2 hours by the heat shrinkage rate (ppm)={the amount of shrinkage of the glass substrate after the heat treatment/the length of the glass substrate before the heat treatment}×106.

摘要翻译： 根据本发明的平板显示器玻璃基板包括玻璃，其以摩尔％表示，55-80％SiO 2，3-20％Al 2 O 3，3-15％B 2 O 3，3-25％RO（总量 MgO，CaO，SrO和BaO），并且基本上不含As2O3和Sb2O3。 玻璃的失透温度为1250℃以下。 玻璃基板的热收缩率为75ppm以下。 热收缩率由热处理后测定的玻璃基板的收缩量，以10℃/分钟和550℃的升温和降温率通过热收缩率进行2小时计算 速率（ppm）= {热处理后的玻璃基板的收缩量/热处理前的玻璃基板的长度}×106。

公开(公告)号：US20120083401A1

公开(公告)日：2012-04-05

申请号：US13247627

申请日：2011-09-28

申请人： Akihiro KOYAMA ,  Mikiko MORISHITA ,  Satoshi AMI ,  Kazuaki HASHIMOTO ,  Tetsuo TAKANO

发明人： Akihiro KOYAMA ,  Mikiko MORISHITA ,  Satoshi AMI ,  Kazuaki HASHIMOTO ,  Tetsuo TAKANO

IPC分类号： C03C3/087 ,  C03C21/00 ,  C03C3/083 ,  C03C15/00

CPC分类号： C03C21/002 ,  C03C3/083 ,  C03C3/085 ,  C03C3/087 ,  C03C15/00 ,  C03C15/02

摘要： The disclosed cover glass is produced by etching a glass substrate that has been formed by a down-drawing process, and chemically strengthening the glass substrate to provide the glass substrate with a compressive-stress layer on the principal surfaces thereof. The glass substrate contains, as components thereof, 50% to 70% by mass of SiO2, 5% to 20% by mass of Al2O3, 6% to 30% by mass of Na2O, and 0% to less than 8% by mass of Li2O. The glass substrate may also contain 0% to 2.6% by mass of CaO, if necessary. The glass substrate has an etching characteristic in which the etching rate is at least 3.7 μm/minute in an etching environment having a temperature of 22° C. and containing hydrogen fluoride with a concentration of 10% by mass.

摘要翻译： 所公开的盖玻璃通过蚀刻通过下拉法形成的玻璃基板，并化学强化玻璃基板，以在玻璃基板的主表面上提供压应力层来制造。 玻璃基板作为其成分含有50〜70质量％的SiO 2，5〜20质量％的Al 2 O 3，6〜30质量％的Na 2 O，0〜8质量％ Li2O。 如果需要，玻璃基板也可以含有0〜2.6质量％的CaO。 玻璃基板具有蚀刻特性，其中在温度为22℃的蚀刻环境中蚀刻速率至少为3.7μm/分钟，并且含有浓度为10质量％的氟化氢。

公开(公告)号：US20080209950A1

公开(公告)日：2008-09-04

申请号：US12027911

申请日：2008-02-07

申请人： Takeshi HIDAKA ,  Hiroaki KASAI ,  Masamichi HIJINO ,  Yasushi NAKAMURA ,  Akihiro KOYAMA ,  Keiji TSUNETOMO ,  Junji KURACHI ,  Hirotaka KOYO ,  Shinya OKAMOTO ,  Yasuhiro SAITO

发明人： Takeshi HIDAKA ,  Hiroaki KASAI ,  Masamichi HIJINO ,  Yasushi NAKAMURA ,  Akihiro KOYAMA ,  Keiji TSUNETOMO ,  Junji KURACHI ,  Hirotaka KOYO ,  Shinya OKAMOTO ,  Yasuhiro SAITO

IPC分类号： C03B11/12

CPC分类号： C03C23/007 ,  C03C15/00 ,  C03C17/22 ,  C03C17/3411 ,  C03C19/00 ,  C03C2218/31 ,  C03C2218/32 ,  G11B5/7315 ,  G11B5/8404 ,  Y10T428/218 ,  Y10T428/24355

摘要： A processing method for glass substrate of the present invention includes: applying heat and external force to a glass substrate and then cooling it down to thereby form a compression stressed part having a different etching rate from that of other parts with respect to an etching reagent to be used, on the surface of the glass substrate and in the vicinity thereof; and performing chemical etching using the etching reagent on the glass substrate having the compression stressed part formed thereon, so as to form a relief on the surface of the glass substrate.

摘要翻译： 本发明的玻璃基板的加工方法包括：向玻璃基板施加热和外力，然后将其冷却，从而形成与蚀刻剂相对于其它部分的蚀刻速率不同的压缩应力部分， 在玻璃基板的表面及其附近使用; 并且在其上形成有压缩应力部分的玻璃基板上使用蚀刻剂进行化学蚀刻，以在玻璃基板的表面上形成凸版。

公开(公告)号：US20130059718A1

公开(公告)日：2013-03-07

申请号：US13537906

申请日：2012-06-29

申请人： Akihiro KOYAMA ,  Satoshi AMI ,  Manabu ICHIKAWA

发明人： Akihiro KOYAMA ,  Satoshi AMI ,  Manabu ICHIKAWA

IPC分类号： C03C3/091 ,  C03B25/00

CPC分类号： C03C3/091 ,  C03B25/00

摘要： A substrate for p-Si TFT flat panel displays made of a glass having a high low-temperature-viscosity characteristic temperature and manufactured while avoiding erosion/wear of a melting tank during melting through direct electrical heating. The glass substrate comprises 52-78 mass % of SiO2, 3-25 mass % of Al2O3, 3-15 mass % of B2O3, 3-20 mass % of RO, wherein RO is total amount of MgO, CaO, SrO, and BaO, 0.01-0.8 mass % of R2O, wherein R2O is total amount of Li2O, Na2O, and K2O, and 0-0.3 mass % of Sb2O3, and substantially does not comprise As2O3, wherein the mass ratio CaO/RO is equal to or greater than 0.65, the mass ratio (SiO2+Al2O3)/B2O3 is in a range of 7-30, and the mass ratio (SiO2+Al2O3)/RO is equal to or greater than 5. A related method involves melting glass raw materials blended to provide the glass composition; a forming step of forming the molten glass into a flat-plate glass; and an annealing step of annealing the flat-plate glass.

公开(公告)号：US20120052275A1

公开(公告)日：2012-03-01

申请号：US13219255

申请日：2011-08-26

申请人： Kazuaki HASHIMOTO ,  Tetsuo TAKANO ,  Akihiro KOYAMA ,  Mikiko MORISHITA

发明人： Kazuaki HASHIMOTO ,  Tetsuo TAKANO ,  Akihiro KOYAMA ,  Mikiko MORISHITA

IPC分类号： C03C3/093 ,  C03C3/091 ,  C03B17/06 ,  B32B17/00 ,  C03C21/00 ,  C03C15/00 ,  C03C3/087 ,  B32B7/02

CPC分类号： C03C3/087 ,  B32B2457/20 ,  C03C15/00 ,  C03C21/002 ,  Y10T428/24967

摘要： Provided is a cover glass having a down-drawable composition including, in mass percent: 50%-70% SiO2, 5%-20% Al2O3, 6%-20% Na2O, 0%-10% K2O, 0%-10% MgO, above 2%-20% CaO, and 0%-4.8% ZrO2 wherein, (i) 46.5%≦(SiO2−½Al2O3)≦59%, (ii) 0.3

摘要翻译： 本发明提供一种具有下拉组合物的覆盖玻璃，其质量百分比为：50％-70％SiO 2，5％-20％Al 2 O 3，6％-20％Na 2 O，0％-10％K 2 O，0％-10％ MgO，高于2％-20％的CaO和0％-4.8％的ZrO 2，其中，（i）46.5％＆lt;（SiO2-1 / Al2O3）＆lt; 59％，（ii）0.3

公开(公告)号：US20110143908A1

公开(公告)日：2011-06-16

申请号：US12969080

申请日：2010-12-15

申请人： Akihiro KOYAMA ,  Mikiko HASHIMOTO

发明人： Akihiro KOYAMA ,  Mikiko HASHIMOTO

IPC分类号： C03C3/091 ,  C03B17/06

CPC分类号： C03C3/091

摘要： Provided is a glass composition suitable for a glass substrate for a flat panel display such as a liquid crystal display. This glass composition has high thermal stability, and is substantially free of BaO but has a low devitrification temperature. It is suitable for the production of a glass substrate by a downdraw process. This glass composition contains, in terms of mass %; 54 to 62% of SiO2; 4 to 11% of B2O3; 15 to 20% of Al2O3; 2 to 5% of MgO; 0 to 7% of CaO; 0 to 13.5% of SrO; 0 to 1% of K2O; 0 to 1% of SnO2; and 0 to 0.2% of Fe2O3, and is substantially free of BaO. In this glass composition, the total content of alkaline earth metal oxides (MgO+CaO+SrO) is 10 to 18.5 mass %. The devitrification temperature of the glass composition is 1200° C. or lower.

摘要翻译： 提供一种适用于液晶显示器等平板显示器的玻璃基板的玻璃组合物。 该玻璃组合物具有高的热稳定性，并且基本上不含BaO但具有低失透温度。 适用于通过下拉工艺生产玻璃基板。 该玻璃组合物以质量％计含有 54〜62％的SiO2; 4〜11％的B2O3; 15〜20％的Al2O3; 2〜5％的MgO; 0〜7％的CaO; 0〜13.5％的SrO; 0〜1％K2O; 0〜1％的SnO2; 和0〜0.2％的Fe 2 O 3，并且基本上不含BaO。 在该玻璃组合物中，碱土类金属氧化物（MgO + CaO + SrO）的总含量为10〜18.5质量％。 玻璃组合物的失透温度为1200℃以下。

公开(公告)号：US20130029830A1

公开(公告)日：2013-01-31

申请号：US13537774

申请日：2012-06-29

申请人： Akihiro KOYAMA ,  Satoshi AMI ,  Manabu ICHIKAWA

发明人： Akihiro KOYAMA ,  Satoshi AMI ,  Manabu ICHIKAWA

IPC分类号： C03C3/091 ,  C03B25/00 ,  C03C3/093

CPC分类号： C03C3/091 ,  C03C3/093 ,  G02F2001/133302 ,  G02F2202/104

摘要： Provided are: a glass substrate for p-Si TFT flat panel displays that is composed of a glass having high characteristic temperatures in the low-temperature viscosity range, typified by the strain point and glass transition point, having a small heat shrinkage rate, and being capable of avoiding the occurrence of the problem regarding the erosion/wear of a melting tank at the time of melting through direct electrical heating; and a method for manufacturing same. The present glass substrate is composed of a glass comprising 52-78 mass % of SiO2, 3-25 mass % of Al2O3, 3-15 mass % of B2O3, 3-25 mass % of RO, wherein RO is total amount of MgO, CaO, SrO, and BaO, 0.01-1 mass % of Fe2O3, and 0-0.3 mass % of Sb2O3, and substantially not comprising As2O3, the glass having a mass ratio (SiO2+Al2O3)/B2O3 in a range of 7-30 and a mass ratio (SiO2+Al2O3)/RO equal to or greater than 6. The present method for manufacturing a glass substrate involves: a melting step of obtaining a molten glass by melting, by employing at least direct electrical heating, glass raw materials blended so as to provide the aforementioned glass composition; a forming step of forming the molten glass into a flat-plate glass; and an annealing step of annealing the flat-plate glass.

摘要翻译： 本发明提供：一种用于p-Si TFT平板显示器的玻璃基板，其由在低温粘度范围内具有高特征温度的玻璃构成，以应变点和玻璃化转变点为代表，具有小的热收缩率，以及 能够避免在通过直接电加热熔化时熔融槽的侵蚀/磨损的问题的发生; 及其制造方法。 本发明的玻璃基板由SiO 2为52〜78质量％，Al 2 O 3为3〜25质量％，B 2为3〜15质量％，RO为3〜25质量％的玻璃构成，其中，RO为MgO的总量， CaO，SrO，BaO，0.01〜1质量％的Fe 2 O 3和0〜0.3质量％的Sb 2 O 3，实质上不含有As 2 O 3，玻璃的质量比（SiO 2 + Al 2 O 3）/ B 2 O 3的范围为7〜30 以及等于或大于6的质量比（SiO 2 + Al 2 O 3）/ RO。本发明的玻璃基板的制造方法包括：通过使用至少直接电加热获得熔融玻璃的熔融步骤，玻璃原料 混合以提供上述玻璃组合物; 将熔融玻璃形成平板玻璃的成形工序; 以及退火平板玻璃的退火步骤。