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1.发明授权公开(公告)号：US07288779B2
公开(公告)日：2007-10-30
申请号：US10736911
申请日：2003-12-17
IPC分类号： G01N21/86
CPC分类号： G03F7/70633
摘要： A method for optimizing an alignment condition of a lithographic projection apparatus. This method comprises projecting a beam of radiation on a target portion of a substrate and measuring a plurality of diffracted signals emitted by the target portion. This method further comprises calculating a variance for each of the plurality of diffracted signals, such that a plurality of variances of the diffracted signals is determined, and adjusting the alignment condition of the lithographic projection apparatus based on analysis of the plurality of variances.
摘要翻译： 一种用于优化光刻投影设备的对准状态的方法。 该方法包括将辐射束投射在基板的目标部分上并测量由目标部分发射的多个衍射信号。 该方法还包括计算多个衍射信号中的每一个的方差，使得确定衍射信号的多个方差，并且基于多个方差的分析来调整光刻投影设备的对准状态。
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2.发明授权Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby 失效光刻设备，确定模型参数的方法，器件制造方法以及由此制造的器件公开(公告)号：US07565219B2
公开(公告)日：2009-07-21
申请号：US10730254
申请日：2003-12-09
IPC分类号： G06F19/00
CPC分类号： G03F9/7092
摘要： A method according to one embodiment of the invention relates to determining at least one parameter of a model that provides information about a position of an object. The object has a plurality of alignment marks of which desired positions are known. The method includes measuring a plurality of positional parameters for each alignment mark. Based on the measured plurality of positional parameters, which are weighted with weighing coefficients, at least one parameter of the model of the object is determined. The numerical value of each weighing coefficient is determined together with the at least one parameter of the model.
摘要翻译： 根据本发明的一个实施例的方法涉及确定提供关于对象的位置的信息的模型的至少一个参数。 物体具有多个已知位置的对准标记。 该方法包括测量每个对准标记的多个位置参数。 基于所测量的多个位置参数，其被称重系数加权，确定对象的模型的至少一个参数。 每个称重系数的数值与模型的至少一个参数一起确定。
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3.发明申请公开(公告)号：US20050133743A1
公开(公告)日：2005-06-23
申请号：US10736911
申请日：2003-12-17
IPC分类号： G01B11/00 , G03F7/20 , G03F9/00 , H01L21/027 , G01N21/86
CPC分类号： G03F7/70633
摘要： A method for optimizing an alignment condition of a lithographic projection apparatus. This method comprises projecting a beam of radiation on a target portion of a substrate and measuring a plurality of diffracted signals emitted by the target portion. This method further comprises calculating a variance for each of the plurality of diffracted signals, such that a plurality of variances of the diffracted signals is determined, and adjusting the alignment condition of the lithographic projection apparatus based on analysis of the plurality of variances.
摘要翻译： 一种用于优化光刻投影设备的对准状态的方法。 该方法包括将辐射束投射在基板的目标部分上并测量由目标部分发射的多个衍射信号。 该方法还包括计算多个衍射信号中的每一个的方差，使得确定衍射信号的多个方差，并且基于多个方差的分析来调整光刻投影设备的对准状态。
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