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1.发明授权公开(公告)号：US07288779B2
公开(公告)日：2007-10-30
申请号：US10736911
申请日：2003-12-17
IPC分类号： G01N21/86
CPC分类号： G03F7/70633
摘要： A method for optimizing an alignment condition of a lithographic projection apparatus. This method comprises projecting a beam of radiation on a target portion of a substrate and measuring a plurality of diffracted signals emitted by the target portion. This method further comprises calculating a variance for each of the plurality of diffracted signals, such that a plurality of variances of the diffracted signals is determined, and adjusting the alignment condition of the lithographic projection apparatus based on analysis of the plurality of variances.
摘要翻译： 一种用于优化光刻投影设备的对准状态的方法。 该方法包括将辐射束投射在基板的目标部分上并测量由目标部分发射的多个衍射信号。 该方法还包括计算多个衍射信号中的每一个的方差，使得确定衍射信号的多个方差，并且基于多个方差的分析来调整光刻投影设备的对准状态。
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公开(公告)号：US07880880B2
公开(公告)日：2011-02-01
申请号：US11294367
申请日：2005-12-06
申请人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
发明人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
IPC分类号： G01B11/00 , H01L23/544 , H01L21/76 , G01D5/36
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
摘要翻译： 用于光刻设备的对准系统具有对准辐射源; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。 位置确定单元被构造成以组合方式处理来自所述第一和第二检测器通道的信息，以确定工件上的对准标记的位置，该组合考虑到工件的制造过程。 光刻设备具有上述对准系统。 使用光刻设备对准和制造器件的方法分别使用上述对准系统和光刻设备。
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公开(公告)号：US20110128520A1
公开(公告)日：2011-06-02
申请号：US12977541
申请日：2010-12-23
申请人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
发明人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
摘要翻译： 用于光刻设备的对准系统具有对准辐射源; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。 位置确定单元被构造成以组合方式处理来自所述第一和第二检测器通道的信息，以确定工件上的对准标记的位置，该组合考虑到工件的制造过程。 光刻设备具有上述对准系统。 使用光刻设备对准和制造器件的方法分别使用上述对准系统和光刻设备。
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公开(公告)号：US07439531B2
公开(公告)日：2008-10-21
申请号：US11643772
申请日：2006-12-22
申请人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
发明人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
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公开(公告)号：US07297971B2
公开(公告)日：2007-11-20
申请号：US11294559
申请日：2005-12-06
申请人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
发明人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
摘要翻译： 用于光刻设备的对准系统具有对准辐射源; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。 位置确定单元被构造成以组合方式处理来自所述第一和第二检测器通道的信息，以确定工件上的对准标记的位置，该组合考虑到工件的制造过程。 光刻设备具有上述对准系统。 使用光刻设备对准和制造器件的方法分别使用上述对准系统和光刻设备。
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公开(公告)号：US07329888B2
公开(公告)日：2008-02-12
申请号：US11294476
申请日：2005-12-06
申请人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
发明人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
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公开(公告)号：US08139217B2
公开(公告)日：2012-03-20
申请号：US12977541
申请日：2010-12-23
申请人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
发明人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
IPC分类号： G01B11/00
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
摘要翻译： 用于光刻设备的对准系统具有对准辐射源; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。 位置确定单元被构造成以组合方式处理来自所述第一和第二检测器通道的信息，以确定工件上的对准标记的位置，该组合考虑到工件的制造过程。 光刻设备具有上述对准系统。 使用光刻设备对准和制造器件的方法分别使用上述对准系统和光刻设备。
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公开(公告)号：US07332732B2
公开(公告)日：2008-02-19
申请号：US10665404
申请日：2003-09-22
申请人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
发明人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
摘要翻译： 用于光刻设备的对准系统具有对准辐射源; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。 位置确定单元被构造成以组合方式处理来自所述第一和第二检测器通道的信息，以确定工件上的对准标记的位置，该组合考虑到工件的制造过程。 光刻设备具有上述对准系统。 使用光刻设备对准和制造器件的方法分别使用上述对准系统和光刻设备。
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