公开(公告)号：US5565303A

公开(公告)日：1996-10-15

申请号：US875864

申请日：1992-05-04

申请人： Sonya Y. Shaw ,  Wayne A. Mitchell ,  David R. Beresford

发明人： Sonya Y. Shaw ,  Wayne A. Mitchell ,  David R. Beresford

IPC分类号： B41C1/10 ,  G03F7/34 ,  G03F7/00

CPC分类号： G03F7/34 ,  B41C1/1091 ,  B41C1/10

摘要： A method for producing a press-ready lithographic printing plate which comprises:(A) providing an uncoated lithographic substrate;(B) coating a photosensitive layer on one side of the lithographic substrate;(C) providing a flexible substrate;(D) coating an adhesive layer directly on the flexible substrate;(E) laminating the coated lithographic substrate to the coated flexible substrate;(F) imagewise exposing the laminated element of (E) to radiation to which the photosensitive layer is sensitive; and(G) peeling off the flexible substrate along with the nonimage areas of the photosensitive layer, leaving the press-ready image areas of the colored photosensitive layer and the adhesive layer on the lithographic substrate.

摘要翻译： 一种压制式平版印刷版的制造方法，其特征在于：（A）提供未涂布的平版印刷基板; （B）在光刻基板的一面上涂布感光层; （C）提供柔性基板; （D）直接在柔性基板上涂布粘合剂层; （E）将涂覆的平版印刷基板层压到涂覆的柔性基板上; （F）将（E）的叠层元件成像曝光于感光层敏感的辐射; 和（G）与感光层的非图像区域一起剥离柔性基板，留下着色感光层和粘合剂层的压制成像区域在光刻基板上。

公开(公告)号：US4980271A

公开(公告)日：1990-12-25

申请号：US762602

申请日：1985-08-05

申请人： Shane Hsieh ,  Wayne A. Mitchell

发明人： Shane Hsieh ,  Wayne A. Mitchell

IPC分类号： G03F7/30 ,  G03F7/32

CPC分类号： G03F7/32

摘要： A composition capable of removing the non-image areas of an imagewise exposed photographic element, consisting essentially of in admixture:(a) from at least about 5% to about 30% by weight benzyl alcohol; and(b) from about 1% to about 20% by weight of one or more compounds selected from the group consisting of sodium xylene sulfonate and sodium cumene sulfonate; and(c) from about 5% to about 40% by weight potassium toluene sulfonate; and(d) water.

摘要翻译： 能够去除成像曝光的照相元件的非图像区域的组合物，其基本上由以下物质组成：（a）至少约5％至约30％重量的苄醇; 和（b）约1％至约20％重量的一种或多种选自二甲苯磺酸钠和枯烯磺酸钠的化合物; 和（c）约5％至约40％（重量）的甲苯磺酸钾; 和（d）水。

公开(公告)号：US5066568A

公开(公告)日：1991-11-19

申请号：US587210

申请日：1990-09-24

申请人： Shane Hsieh ,  Wayne A. Mitchell

发明人： Shane Hsieh ,  Wayne A. Mitchell

IPC分类号： G03F7/32

CPC分类号： G03F7/32

摘要： The invention is a method for preparing a photographic element which comprises imagewise exposing a photographic element, and removing the non-image areas thereof by contacting said element with a composition consisting essentially of in admixture:a) from at least about 5% to about 30% by weight of the developer of benzyl alcohol; andb) from about 1% to about 20% by weight of the developer of one of more compound selected from the group consisting of sodium xylene sulfonate and sodium cumene sulfonate; andc) from about 5% to about 40% by weight of the developer of potassium toluene sulfonate; andd) water in sufficient amount of formulate effective developer for imagewise exposed photographic elements.

摘要翻译： 本发明是一种制备照相元件的方法，其包括成像曝光照相元件，并通过使所述元件与基本上由以下组合物组成的组合物接触来除去其非图像区域：a）至少约5％至约30 重量百分比的苯甲醇显影剂; 和b）约1重量％至约20重量％的选自二甲苯磺酸钠和枯烯磺酸钠的一种或多种化合物的显影剂; 和c）约5重量％至约40重量％的甲苯磺酸钾显影剂; 和d）足够量的水配制用于成像曝光的照相元件的有效显影剂。

公开(公告)号：US4786580A

公开(公告)日：1988-11-22

申请号：US566125

申请日：1983-12-27

申请人： Shane Hsieh ,  Wayne A. Mitchell

发明人： Shane Hsieh ,  Wayne A. Mitchell

IPC分类号： G03F7/32 ,  G03F7/08 ,  G03C5/18 ,  G03C5/34

CPC分类号： G03F7/32

摘要： The invention provides a method for developing negative working photographic elements using an aqueous developer comprising(a) a solvent composition consisting essentially of(i) n-propanol or isopropanol; and(ii) a glycol ether or acetate(b) a salt which is preferably magnesium sulfate; and(c) an ethoxylated alkyl phenol type non-ionic surfactant.

摘要翻译： 本发明提供一种使用含水显影剂显影负性照相元件的方法，该方法包括（a）基本上由（i）正丙醇或异丙醇组成的溶剂组合物; 和（ii）二醇醚或乙酸酯（b）优选硫酸镁的盐; 和（c）乙氧基化烷基酚型非离子表面活性剂。

公开(公告)号：US4783395A

公开(公告)日：1988-11-08

申请号：US117591

申请日：1987-11-05

申请人： Shane Hsieh ,  Wayne A. Mitchell

发明人： Shane Hsieh ,  Wayne A. Mitchell

IPC分类号： B41N3/08 ,  G03C7/02

CPC分类号： B41N3/08

摘要： The invention provides an organic solvent free, phosphate free, lithographic desensitizing composition which comprises:(a) from about 0.1% to about 20.0% by weight of the composition of a copolymer of polymethyl vinyl ether and maleic acid having the formula ##STR1## which has a molecular weight in an amount of from about 20,000 to about 70,000; and(b) from about 0.1% to about 20.0% by weight of the composition of a desensitizing component comprising one or more hydroxy carboxylic acids or salts; and(c) sufficient water to formulate a desensitizing composition; and(d) sufficient base to adjust the pH of the composition into the range of from about 6.5 to about 7.5.

公开(公告)号：US4728597A

公开(公告)日：1988-03-01

申请号：US14968

申请日：1987-02-17

申请人： Shane Hsieh ,  Wayne A. Mitchell

发明人： Shane Hsieh ,  Wayne A. Mitchell

IPC分类号： B41N3/08 ,  G03F7/00

CPC分类号： B41N3/08

摘要： The invention provides an organic solvent free, phosphate free, lithographic desensitizing composition which comprises:(a) from about 0.1% to about 20.0% by weight of the composition of a copolymer of polymethyl vinyl ether and maleic acid having the formula ##STR1## which has a molecular weight in an amount of from about 20,000 to about 70,000; and(b) from about 0.1% to about 20.0% by weight of the composition of a desensitizing component comprising one or more hydroxy carboxylic acids or salts; and(c) sufficient water to formulate a desensitizing composition; and(d) sufficient base to adjust the pH of the composition into the range of from about 6.5 to about 7.5.

摘要翻译： 本发明提供了一种无机溶剂，无磷酸盐，光刻脱敏组合物，其包含：（a）组合物的约0.1％至约20.0％的聚甲基乙烯基醚和马来酸的共聚物，其具有式“IMAGE”，其中 其分子量为约20,000至约70,000; 和（b）组合物的约0.1重量％至约20.0重量％的包含一种或多种羟基羧酸或盐的脱敏组分; 和（c）足够的水以配制脱敏组合物; 和（d）足够的碱以将组合物的pH调节至约6.5至约7.5的范围内。

公开(公告)号：US4717542A

公开(公告)日：1988-01-05

申请号：US6393

申请日：1987-01-23

申请人： Wayne A. Mitchell

发明人： Wayne A. Mitchell

IPC分类号： C23F11/167 ,  C23F11/10 ,  C23F11/173 ,  C23F11/16

CPC分类号： C23F11/10

摘要： A process and composition using hydroxyphosphonoacetic acid or its water-soluble salts in combination with certain copolymers, such as water-soluble 1-acrylamido-2-methylpropane sulfonic acid copolymers with acrylic acid or methacrylic acid, provide improved corrosion protection for iron based metal in contact with the system water of aqueous systems.

公开(公告)号：US6010639A

公开(公告)日：2000-01-04

申请号：US974360

申请日：1997-11-19

申请人： Wayne A. Mitchell ,  Kurt D. Heinz ,  Clifford Alvin Ferrin, Jr. ,  Narender Pal Luthra

发明人： Wayne A. Mitchell ,  Kurt D. Heinz ,  Clifford Alvin Ferrin, Jr. ,  Narender Pal Luthra

IPC分类号： C09K5/00 ,  C09K5/08 ,  C09K5/14 ,  C23F11/00 ,  C09K3/18

CPC分类号： C09K5/00 ,  C09K5/08 ,  C09K5/14 ,  C23F11/00 ,  Y10T428/2998

摘要： A controlled-release supplement coolant additive for use in diesel engine coolant systems comprising a core containing at least one supplemental coolant additive (SCA) active component and a polymeric coating material encapsulating said core. The controlled released supplement coolant additive slowly releases the SCA active components to a diesel engine coolant system, thereby delivering an effective concentration level of SCA active components over an extended period. The controlled-release supplement coolant additive maintains a minimum concentration level of active SCA components in the coolant system. Additionally, the controlled-release supplemental coolant additive prevents overdosing the coolant system with particular SCA active components such as nitrates.

摘要翻译： 一种用于柴油发动机冷却剂系统的控制释放补充剂冷却剂添加剂，其包含含有至少一种补充冷却剂添加剂（SCA）活性组分的核心和封装所述核心的聚合物涂层材料。 受控释放的补充剂冷却剂添加剂将SCA活性组分缓慢释放到柴油发动机冷却剂系统，从而在长时间内递送有效浓度的SCA活性组分。 控制释放补充剂冷却剂添加剂在冷却剂系统中保持活性SCA组分的最低浓度水平。 此外，控制释放补充的冷却剂添加剂防止了具有特定SCA活性组分（例如硝酸盐）的过量给冷却剂系统。

公开(公告)号：US4780396A

公开(公告)日：1988-10-25

申请号：US14969

申请日：1987-02-17

申请人： Shane Hsieh ,  Wayne A. Mitchell

发明人： Shane Hsieh ,  Wayne A. Mitchell

IPC分类号： G03F7/30 ,  G03F7/32 ,  G03C5/18

CPC分类号： G03F7/322

摘要： An organic solvent free developer composition having a pH in the range of from about 6.5 to about 7.5 comprising in admixture:(a) from about 0.1% to about 20% by weight of the developer of one or more compounds selected from the group consisting of sodium octyl sulfate, sodium tetradecyl sulfate, sodium 2-ethyl hexyl sulfate and ammonium lauryl sulfate; and(b) from about 0.1% to about 30% by weight of the developer of one or more components selected from the group consisting of lithium salts of hydroxy, aryl and alkyl carboxylic acids; and(c) from about 0.1% to about 30% by weight of the developer of one or more compounds selected from the group consisting of potassium salts of hydroxy, aryl and alkyl carboxylic acids; and(d) an optional compatible organic or inorganic acid or base in an amount sufficient to adjust the pH of the developer composition into the range of from about 6.5 to about 7.5; and(e) an optional anti-foam component in an amount of from about 0.02 to about 0.05% by weight of the developer; and(f) sufficient water to formulate an effective developer.

摘要翻译： 一种具有约6.5至约7.5范围内的pH的无机溶剂显影剂组合物，其包含：（a）约0.1％至约20％重量的一种或多种选自以下的化合物的显影剂： 辛基硫酸钠，十四烷基硫酸钠，2-乙基己基硫酸钠和月桂基硫酸铵; 和（b）约0.1％至约30％重量的选自羟基，芳基和烷基羧酸的锂盐的一种或多种组分的显色剂; 和（c）约0.1％至约30％重量的一种或多种选自羟基，芳基和烷基羧酸的钾盐的化合物的显影剂; 和（d）任选相容的有机或无机酸或碱，其量足以将显影剂组合物的pH调节至约6.5至约7.5; 和（e）任选的抗泡沫组分，其量为显影剂重量的约0.02至约0.05％; 和（f）足够的水来配制有效的显影剂。

公开(公告)号：US4649025A

公开(公告)日：1987-03-10

申请号：US776311

申请日：1985-09-16

申请人： Chih M. Hwa ,  Wayne A. Mitchell

发明人： Chih M. Hwa ,  Wayne A. Mitchell

IPC分类号： C10M173/02 ,  C10N10/02 ,  C10N10/04 ,  C10N10/08 ,  C10N10/16 ,  C10N30/12 ,  C10N40/30 ,  C23F11/10 ,  C23F11/14 ,  C23F11/167 ,  C23F11/16

CPC分类号： C23F11/1676 ,  C23F11/10

摘要： Composition for inhibition of ferrous metal corrosion consisting essentially of (a) HEDPA compound and (b) HPAA compound. Optionally the composition may also include (c) an azole.

摘要翻译： 用于抑制黑色金属腐蚀的组合物，其基本上由（a）HEDPA化合物和（b）HPAA化合物组成。 任选地，组合物还可以包括（c）唑。