摘要:
Photopolymerisable systems for coatings or photolithography comprising radically photopolimerisable oligomers and/or monomers having ethylenically unsaturated groups and, as photoinitiator, at least one compound of formula (I).
摘要:
The present invention concerns photopolymerisable systems comprising reactive oligomers and/or monomers having ethylenically unsaturated groups and as photoinitiator at least one hydroxamic ester of Formula (I) or (II) or (III).
摘要:
The present invention relates to clear photopolymerisable systems for the preparation of high thickness coatings, to a procedure for their application and to the solid surfaces coated with them.
摘要:
A composition for positive heat sensitive computer-to-plate (CTP) lithographic printing plates comprising a phenolic resin and an IR absorber characterized by the fact that the composition contains from 1 to 30% w/w of an organic oxygenated phosphorous compound chosen from the group of general formula (I): wherein R1, R2, and R3 are independently a C4–C8 alkyl group or an aryl group.
摘要:
The present invention relates to clear photopolymerisable systems for the preparation of high thickness coatings, to a procedure for their application and to the solid surfaces coated with them.
摘要:
The invention relates to a composition for positive heat sensitive CTP lithographic printing plates comprising a phenolic resin and an IR absorber characterized by the fact that it contains from 1 to 30% w/w of an organic oxygenated phosphorous compound chosen from the group of general formula (I): wherein R1, R2, R3 are independently: C3-C12 linear or branched alkyl; phenyl or heteroaryl eventually substituted with R4, wherein R4 is halogen, C1-C12 linear or branched alkyl, C1-C12 linear or branched alkoxyl; OR5 wherein R5 is C3-C12 linear or branched alkyl, phenyl or heteroaryl eventually substituted with R4, wherein R4 is halogen, C1-C12 linear or branched alkyl, C1-C12 linear or branched alkoxyl.
摘要:
The present invention refers to solid mixtures of alpha hydroxycarbonyl derivatives of alpha-methylstyrene oligomers containing at least 90% of the dimer isomers, the dimer isomer ratio being between 2.5 and 7, to their preparation and to their use as photoinitiators in photopolymerisation.
摘要:
This invention concerns photopolymerizable systems containing ethylenically unsaturated reactive oligomers and/or monomers comprising at least one photoinitiator and at least one coinitiator having low-extractability and low-volatility; the photopolymerizable systems of the invention are particularly suited for the preparation of food-packaging coatings.
摘要:
The present invention relates to sulfonium salts, to methods for their preparation and to radiation curable compositions containing them as photoinitiators.
摘要:
This invention concerns photopolymerisable systems containing ethylenically unsaturated reactive oligomers and/or monomers comprising at least one photoinitiator and at least one coinitiator having low-extractability and low-volatility; the photopolymerisable systems of the invention are particularly suited for the preparation of food-packaging coatings.