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1.发明授权Optical arrangement for immersion lithography with a hydrophobic coating, as well as projection exposure apparatus comprising the same 有权用于具有疏水性涂层的浸没式光刻的光学布置，以及包括其的投影曝光设备公开(公告)号：US08279402B2
公开(公告)日：2012-10-02
申请号：US12403132
申请日：2009-03-12
申请人： Stephan Six , Michael Lill , Ruediger Duesing , Bernhard Gellrich , Michael Widmann , Andreas Schubert , Tilmann Von Papen , Thomas Ihl
发明人： Stephan Six , Michael Lill , Ruediger Duesing , Bernhard Gellrich , Michael Widmann , Andreas Schubert , Tilmann Von Papen , Thomas Ihl
IPC分类号： G03F7/207
CPC分类号： G03F7/70958 , G03F7/70341 , G03F7/706
摘要： An optical arrangement for immersion lithography, having at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) includes at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.
摘要翻译： 一种用于浸没光刻的光学装置，其具有至少一个施加有疏水涂层（6,7）的组分（1），所述疏水涂层（6,7）在投影透镜的操作期间暴露于UV辐射，并且 至少一个部件（1）在投影透镜的操作期间至少部分地被浸没流体润湿。 疏水涂层（6,7）包括吸收和/或反射波长小于260nm的UV辐射的至少一个抗紫外线层（6）。
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2.发明申请公开(公告)号：US20090233233A1
公开(公告)日：2009-09-17
申请号：US12403132
申请日：2009-03-12
申请人： Stephan SIX , Michael Lill , Ruediger Duesing , Bernhard Gellrich , Michael Widmann , Andreas Schubert , Tilmann Von Papen , Thomas Ihl
发明人： Stephan SIX , Michael Lill , Ruediger Duesing , Bernhard Gellrich , Michael Widmann , Andreas Schubert , Tilmann Von Papen , Thomas Ihl
CPC分类号： G03F7/70958 , G03F7/70341 , G03F7/706
摘要： An optical arrangement for immersion lithography, having at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) includes at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.
摘要翻译： 一种用于浸没光刻的光学装置，其具有至少一个施加有疏水涂层（6,7）的组分（1），所述疏水涂层（6,7）在投影透镜的操作期间暴露于UV辐射，并且 至少一个部件（1）在投影透镜的操作期间至少部分地被浸没流体润湿。 疏水涂层（6,7）包括吸收和/或反射波长小于260nm的UV辐射的至少一个抗紫外线层（6）。
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3.发明授权公开(公告)号：US07738187B2
公开(公告)日：2010-06-15
申请号：US12134062
申请日：2008-06-05
IPC分类号： G02B13/14
CPC分类号： G02B21/33 , G03F7/70341 , G03F7/70958
摘要： An optical element (1) made of a material that is transparent to wavelengths in the UV region, which optical element (1) includes an oleophobic coating (6, 7) outside of its optically free diameter whose disperse component of the surface energy is preferably 25 mN/m or less, particularly preferably 20 mN/m or less, in particular 15 mN/m or less. In addition or as an alternative, the optical element (1) within its optically free diameter comprises an oleophilic coating (9b, 9c) that is transparent to wavelengths in the UV region, with the disperse component of the surface energy of this coating preferably being more than 25 mN/m, particularly preferably more than 30 mN/m, in particular more than 40 mN/m. The optical element may be provided in an arrangement in which it dips at least partially into an organic liquid.
摘要翻译： 一种光学元件（1），其由对UV区域中的波长透明的材料制成，该光学元件（1）包括其光学自由直径外的疏油涂层（6,7），其表面能的分散分量优选为 25mN / m以下，特别优选为20mN / m以下，特别优选为15mN / m以下。 另外或作为替代，光学元件（1）在其光学自由直径内包括对UV区域中的波长透明的亲油涂层（9b，9c），该涂层的表面能的分散组分优选为 超过25mN / m，特别优选大于30mN / m，特别是大于40mN / m。 光学元件可以以其至少部分地浸入有机液体的布置来设置。
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4.发明申请公开(公告)号：US20080304035A1
公开(公告)日：2008-12-11
申请号：US12134062
申请日：2008-06-05
CPC分类号： G02B21/33 , G03F7/70341 , G03F7/70958
摘要： An optical element (1) made of a material that is transparent to wavelengths in the UV region, which optical element (1) includes an oleophobic coating (6, 7) outside of its optically free diameter whose disperse component of the surface energy is preferably 25 mN/m or less, particularly preferably 20 mN/m or less, in particular 15 mN/m or less. In addition or as an alternative, the optical element (1) within its optically free diameter comprises an oleophilic coating (9b, 9c) that is transparent to wavelengths in the UV region, with the disperse component of the surface energy of this coating preferably being more than 25 mN/m, particularly preferably more than 30 mN/m, in particular more than 40 mN/m. The optical element may be provided in an arrangement in which it dips at least partially into an organic liquid.
摘要翻译： 一种光学元件（1），其由对UV区域中的波长透明的材料制成，该光学元件（1）包括其光学自由直径外的疏油涂层（6,7），其表面能的分散分量优选为 25mN / m以下，特别优选为20mN / m以下，特别优选为15mN / m以下。 另外或作为替代，光学元件（1）在其光学自由直径内包括对UV区域中的波长透明的亲油涂层（9b，9c），该涂层的表面能的分散组分优选为 超过25mN / m，特别优选大于30mN / m，特别是大于40mN / m。 光学元件可以以其至少部分地浸入有机液体的布置来设置。
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