专利检索 ap:("Stephan SIX" OR "Michael Lill" OR "Ruediger Duesing" OR "Bernhard Gellrich" OR "Michael Widmann" OR "Andreas Schubert" OR "Tilmann Von Papen" OR "Thomas Ihl") AND inv:"Michael Widmann" 第 1 页

1.

发明授权
Optical arrangement for immersion lithography with a hydrophobic coating, as well as projection exposure apparatus comprising the same 有权
标题翻译：用于具有疏水性涂层的浸没式光刻的光学布置，以及包括其的投影曝光设备

公开(公告)号：US08279402B2

公开(公告)日：2012-10-02

申请号：US12403132

申请日：2009-03-12

申请人： Stephan Six , Michael Lill , Ruediger Duesing , Bernhard Gellrich , Michael Widmann , Andreas Schubert , Tilmann Von Papen , Thomas Ihl

发明人： Stephan Six , Michael Lill , Ruediger Duesing , Bernhard Gellrich , Michael Widmann , Andreas Schubert , Tilmann Von Papen , Thomas Ihl

IPC分类号： G03F7/207

CPC分类号： G03F7/70958 , G03F7/70341 , G03F7/706

摘要： An optical arrangement for immersion lithography, having at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) includes at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.

摘要翻译： 一种用于浸没光刻的光学装置，其具有至少一个施加有疏水涂层（6,7）的组分（1），所述疏水涂层（6,7）在投影透镜的操作期间暴露于UV辐射，并且至少一个部件（1）在投影透镜的操作期间至少部分地被浸没流体润湿。疏水涂层（6,7）包括吸收和/或反射波长小于260nm的UV辐射的至少一个抗紫外线层（6）。

2.

发明申请
OPTICAL ARRANGEMENT FOR IMMERSION LITHOGRAPHY WITH A HYDROPHOBIC COATING, AS WELL AS PROJECTION EXPOSURE APPARATUS COMPRISING THE SAME 有权
标题翻译：用于疏水涂层的光学装置，作为包括其的投影曝光装置

公开(公告)号：US20090233233A1

公开(公告)日：2009-09-17

申请号：US12403132

申请日：2009-03-12

申请人： Stephan SIX , Michael Lill , Ruediger Duesing , Bernhard Gellrich , Michael Widmann , Andreas Schubert , Tilmann Von Papen , Thomas Ihl

发明人： Stephan SIX , Michael Lill , Ruediger Duesing , Bernhard Gellrich , Michael Widmann , Andreas Schubert , Tilmann Von Papen , Thomas Ihl

IPC分类号： G03F7/20 , G03B27/54 , G03F7/004

CPC分类号： G03F7/70958 , G03F7/70341 , G03F7/706

摘要： An optical arrangement for immersion lithography, having at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) includes at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.

摘要翻译： 一种用于浸没光刻的光学装置，其具有至少一个施加有疏水涂层（6,7）的组分（1），所述疏水涂层（6,7）在投影透镜的操作期间暴露于UV辐射，并且至少一个部件（1）在投影透镜的操作期间至少部分地被浸没流体润湿。疏水涂层（6,7）包括吸收和/或反射波长小于260nm的UV辐射的至少一个抗紫外线层（6）。

3.

发明申请
Coupling Unit 审中-公开

公开(公告)号：US20200180374A1

公开(公告)日：2020-06-11

申请号：US16709496

申请日：2019-12-10

申请人： Wolfgang Gentner , Alexander Kaufmann , Michael Widmann

发明人： Wolfgang Gentner , Alexander Kaufmann , Michael Widmann

IPC分类号： B60D1/54 , B60D1/06 , B60D1/62

摘要： In order to improve a coupling unit that is mountable on the rear end of a vehicle body and comprises a carrier unit which, for its part, is mountable on the vehicle body hidden by a bumper unit and which comprises a coupling arm held on the carrier unit for coupling a trailer or a rear load carrier, in such a way that detection of the mechanical loads on the coupling unit is possible in a simple way, it is proposed that there be provided at least one force detecting region on sections of the coupling unit that are mechanically loaded by the coupled trailer or the coupled rear load carrier, in which a sensor associated with this force detecting region detects the mechanical load acting on this force detecting region by means of the magneto-elastic effect.