公开(公告)号：US20070077672A1

公开(公告)日：2007-04-05

申请号：US11449620

申请日：2006-06-09

申请人： Su Kang ,  Dai Lee ,  Yong Park ,  Young Kim

发明人： Su Kang ,  Dai Lee ,  Yong Park ,  Young Kim

IPC分类号： H01L21/00

CPC分类号： H01L29/42384 ,  G02F1/13454 ,  H01L27/124 ,  H01L27/14621 ,  H01L29/78621

摘要： An array substrate for an LCD device includes a first TFT including a first semiconductor layer, a first gate electrode, wherein the first gate electrode is directly over the first semiconductor layer; a first protrusion extending from the first gate electrode along an edge of the first semiconductor layer; a second TFT including a second semiconductor layer, a second gate electrode, wherein the second gate electrode is directly over the second semiconductor layer; a second protrusion extending from the second gate electrode along an edge of the second semiconductor layer; a third TFT connected to crossed data and gate lines including a third semiconductor layer, a third gate electrode, wherein the third gate electrode is directly over the third semiconductor layer; a third protrusion extending from the third gate electrode along an edge of the third semiconductor layer; and a pixel electrode.

摘要翻译： 用于LCD器件的阵列衬底包括：第一TFT，包括第一半导体层，第一栅电极，其中第一栅电极直接位于第一半导体层上; 从所述第一栅电极沿着所述第一半导体层的边缘延伸的第一突起; 包括第二半导体层的第二TFT，第二栅电极，其中所述第二栅电极直接在所述第二半导体层上; 从所述第二栅电极沿着所述第二半导体层的边缘延伸的第二突起; 连接到交叉数据的第三TFT和包括第三半导体层，第三栅电极的栅极线，其中第三栅极直接在第三半导体层上方; 从所述第三栅电极沿着所述第三半导体层的边缘延伸的第三突起; 和像素电极。

公开(公告)号：US20060172223A1

公开(公告)日：2006-08-03

申请号：US11287103

申请日：2005-11-23

申请人： James Cameron ,  Su Kang ,  Jin Sung

发明人： James Cameron ,  Su Kang ,  Jin Sung

IPC分类号： G03C1/76

CPC分类号： G03F7/0392 ,  G03F7/0045

摘要： Chemically-amplified positive photoresist compositions are provided that contain an additive with acetal and alicyclic groups. Preferred photoresists of the invention comprise a resin component that includes a polymer with one or more photoacid-labile moieties, one or more photoacid generator compounds, and an additive that contains one or more alicyclic groups such as adamantyl and the like.

摘要翻译： 提供化学扩增的正性光致抗蚀剂组合物，其含有具有缩醛和脂环族基团的添加剂。 本发明优选的光致抗蚀剂包括树脂组分，其包括具有一个或多个光致酸不稳定部分的聚合物，一种或多种光酸产生剂化合物，和含有一种或多种脂环族基团如金刚烷基等的添加剂。