公开(公告)号：US07744328B2

公开(公告)日：2010-06-29

申请号：US11324609

申请日：2006-01-04

申请人： Sung Wha Jung ,  Sang Jin Han ,  Eu Gene Kang

发明人： Sung Wha Jung ,  Sang Jin Han ,  Eu Gene Kang

IPC分类号： B65G53/46

CPC分类号： C23C14/042

摘要： An apparatus for aligning a tray and tray holder, including a vertically positioned tray formed with coupling holes and a tray holder having coupling arms to couple with the coupling holes, and to prevent the bending of the tray and the tray holder. The tray includes a substrate frame that can receive a substrate, and the tray holder is coupled with a drive shaft for transferring the tray in the vertical position to a mask for vapor deposition. One end of a plurality of guide shafts securely contacts the rear side of the tray holder to prevent bending of the tray holder. The tray can have magnetic attaching members and the tray holder can have supporting members corresponding to the attaching members. The supporting members can magnetically couple with the attaching members in a position determined by corresponding grooves or protrusions to align the tray and tray holder.

摘要翻译： 用于对准托盘和托盘保持器的装置，包括形成有联接孔的垂直定位的托盘和具有联接臂以与联接孔联接的托盘保持器，并且防止托盘和托盘托架的弯曲。 托盘包括可接收基底的基底框架，并且托盘保持器与用于将托盘在垂直位置转移到用于气相沉积的掩模的驱动轴联接。 多个引导轴的一端牢固地接触托盘保持器的后侧，以防止托架保持器的弯曲。 托盘可以具有磁性附接构件，并且托盘保持器可以具有对应于附接构件的支撑构件。 支撑构件可以通过相应的凹槽或突出部分确定的位置与附接构件磁耦合，以对准托盘和托盘支架。

公开(公告)号：US08366832B2

公开(公告)日：2013-02-05

申请号：US11324346

申请日：2006-01-04

申请人： Sung Wha Jung ,  Eu Gene Kang

发明人： Sung Wha Jung ,  Eu Gene Kang

IPC分类号： C23C16/00

CPC分类号： C30B23/002 ,  C23C14/042 ,  C23C14/24 ,  C30B29/54

摘要： Apparatus for a deposition system includes a sealing apparatus that seals the drive shaft from the deposition material to prevent the deposition material from adhering to the drive shaft, a moving apparatus to reduce the weight of a shelf on the drive shaft, and a collision-preventing apparatus that measures the distance between a shelf and an adjacent article.

摘要翻译： 用于沉积系统的装置包括密封装置，其将驱动轴与沉积材料密封以防止沉积材料粘附到驱动轴上，移动装置减小驱动轴上的搁架的重量和防碰撞 测量货架和相邻物品之间距离的装置。

公开(公告)号：US07486397B2

公开(公告)日：2009-02-03

申请号：US11324247

申请日：2006-01-04

申请人： Sung Wha Jung ,  Sang Jin Han ,  Eu Gene Kang

发明人： Sung Wha Jung ,  Sang Jin Han ,  Eu Gene Kang

IPC分类号： G01B11/00 ,  G01B9/02

CPC分类号： G03F9/7038 ,  G03F7/70791 ,  G03F9/7088

摘要： A device for aligning a substrate and a mask, and a method using the same, where the device includes aligning marks in unused portions of the substrate and the mask, a sensing unit for determining overlap of the aligning marks when the substrate is aligned with the mask, and a control unit for controlling an aligning process to be repeated on the basis of data sensed and determined by the sensing unit. The sensing unit may include a camera positioned in photographic range to determine any alignment error in the alignment marks. According to another embodiment of the present invention, the alignment error between the substrate and the mask is sensed to determine whether it is acceptable or not. When the alignment error is unacceptable, the operations for aligning the substrate with the mask are repeated until the alignment error is acceptable.

摘要翻译： 用于对准衬底和掩模的装置及其使用方法，其中所述装置包括对准所述衬底和所述掩模的未使用部分中的标记;感测单元，用于当所述衬底与所述掩模对准时确定所述对准标记的重叠 掩模和控制单元，用于基于由感测单元感测和确定的数据来控制要重复的对准处理。 感测单元可以包括位于照相范围中的摄像机，以确定对准标记中的任何对准误差。 根据本发明的另一实施例，感测基板和掩模之间的对准误差以确定其是否可接受。 当对准误差不可接受时，重复对准衬底与掩模的操作，直到对准误差是可接受的。

公开(公告)号：US07765669B2

公开(公告)日：2010-08-03

申请号：US11325312

申请日：2006-01-05

申请人： Jin Kyoo Kim ,  Sang Jin Han ,  Hee Cheol Kang ,  Eu Gene Kang ,  Tae Hyung Kim

发明人： Jin Kyoo Kim ,  Sang Jin Han ,  Hee Cheol Kang ,  Eu Gene Kang ,  Tae Hyung Kim

IPC分类号： B23P11/02 ,  H01L21/00

CPC分类号： C23C14/042 ,  H01L51/0011 ,  Y10T29/49867

摘要： Disclosed is a method of forming a pattern on a mask sheet including an attaching portion to be attached to a mask frame, and a pattern area in which the pattern is formed. The method includes positioning the mask sheet on an auxiliary sheet with a thickness greater than the thickness of the mask sheet, fastening the auxiliary sheet to the mask frame, applying a stretching force to the mask sheet and the auxiliary sheet, and forming the pattern on the pattern area of the mask sheet. Thus, a predetermined pattern is formed on a mask sheet while a uniformly distributed external force is applied to the mask sheet, so that bending or deflecting out of plane by the mask sheet is prevented, thereby forming a precise mask pattern.

摘要翻译： 公开了一种在掩模板上形成图案的方法，该掩模板包括附着到掩模框架的附接部分和形成图案的图案区域。 该方法包括将掩模片定位在厚度大于掩模片的厚度的辅助片上，将辅助片固定到掩模框架上，向掩模片和辅助片施加拉伸力，并将形状形成在 掩模片的图案区域。 因此，在均匀分布的外力施加到掩模片上时，在掩模板上形成预定图案，从而防止由掩模片弯曲或偏转出平面，从而形成精确的掩模图案。