公开(公告)号：US20180188651A1

公开(公告)日：2018-07-05

申请号：US15450036

申请日：2017-03-06

Applicant: TAIFLEX Scientific Co., Ltd.

Inventor： Shih-Chang Lin ,  Yi-Ming Chen ,  Chiu-Feng Chen ,  Chun-Yi Kuo

IPC: G03F7/038 ,  C08G73/10

CPC classification number: G03F7/0387 ,  C08G73/08 ,  C08G73/101 ,  C08G73/1042 ,  C08G73/1082 ,  C08G73/1085 ,  C09D179/08 ,  G03F7/027 ,  G03F7/029 ,  G03F7/031 ,  G03F7/038 ,  G03F7/0388 ,  G03F7/0751 ,  G03F7/085

Abstract: A photosensitive composition is provided. The photosensitive composition includes a composition for forming polyimide, a photoinitiator, a photo cross-linking agent, and a thermal cross-linking agent. The composition for forming polyimide includes a diamine monomer component, an anhydride monomer component, and a polyimide modifier. The diamine monomer component includes a long-chain aliphatic diamine monomer, a carboxylic acid-containing diamine monomer, and a triazole compound. The anhydride monomer component includes a dianhydride monomer and a monoanhydride monomer. The polyimide modifier has a double bond and an epoxy group.