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    POLYMER CARBON NITRIDE, SPECIFIC CRYSTAL FORM OF SAID POLYMER CARBON NITRIDE, AND ULTRAVIOLET RAY-BLOCKING USE THEREOF
    1.
    发明公开
    POLYMER CARBON NITRIDE, SPECIFIC CRYSTAL FORM OF SAID POLYMER CARBON NITRIDE, AND ULTRAVIOLET RAY-BLOCKING USE THEREOF 审中-公开

    公开(公告)号：US20240024222A1

    公开(公告)日：2024-01-25

    申请号：US18255536

    申请日：2021-12-06

    申请人： UNIST(ULSAN NATIONAL INSTITUTE OF SCIENCE AND TECHNOLOGY)

    发明人： Ji Wook Jang ,  Jae Sung Lee ,  Woo Jin Byun

    IPC分类号： A61K8/84 ,  C08G73/08 ,  A61Q17/04

    CPC分类号： A61K8/84 ,  C08G73/08 ,  A61Q17/04

    摘要： The present invention relates to a polymer carbon nitride, a specific crystal form of the polymer carbon nitride, and a cosmetic composition, an ultraviolet ray-blocking composition, and an external use skin preparation composition, which include the polymer carbon nitride. The polymer carbon nitride according to one aspect of the present invention and a crystal form produced by a specific preparation example thereof can absorb both UVA and UVB, and thus can effectively protect the skin from ultraviolet rays while also being non-toxic and thus suitable for living bodies and lacking photoactivity. Therefore, the polymer carbon nitride and the crystal form can be utilized in a cosmetic composition, an ultraviolet ray-blocking composition and an external use skin preparation composition, which are applied to the living body. Moreover, the specific crystal forms of the polymer carbon nitride have different characteristics according to the manufacturing method, and thus may be used in a variety of ways according to the characteristics. Particularly, the crystal form of the polymer carbon nitride according to one aspect can be adjusted to various colors according to the preparation method, and thus can be utilized to obtain a composition having a desired color. Therefore, the crystal form can be suitably utilized to produce products of various colors suitable for the skin tones of individuals.

    ANTIBACTERIAL POLMER MATERIAL, MANUFACTURING METHOD THEREOF, AND PRODUCT APPLYING THE SAME
    4.
    发明申请
    ANTIBACTERIAL POLMER MATERIAL, MANUFACTURING METHOD THEREOF, AND PRODUCT APPLYING THE SAME 审中-公开

    公开(公告)号：US20180072869A1

    公开(公告)日：2018-03-15

    申请号：US15700200

    申请日：2017-09-11

    申请人： Tse-Ming Hsin

    发明人： Tse-Ming Hsin

    IPC分类号： C08K5/31 ,  C08G69/26 ,  C08G63/00 ,  C08K5/092 ,  C07C63/26

    CPC分类号： C08K5/31 ,  C07C63/26 ,  C08G63/00 ,  C08G63/6856 ,  C08G69/265 ,  C08G73/028 ,  C08G73/08 ,  C08K5/0058 ,  C08K5/092

    摘要： An antibacterial polymer material includes a polymer body and plural antibacterial structures mixed with the polymer body and bonded with the polymer body, and the antibacterial structures have a content of 0.2%-8%. The antibacterial polymer material may be manufactured to form an antibacterial plastic product and an antibacterial fiber, and the antibacterial structures are mixed with the polymer body and bonded with the polymer body, so that the antibacterial ingredient is distributed more uniformly in the product or masterbatch to prevent the antibacterial ingredient from being just distributed on the surface or the antibacterial effect from being lessened or vanished due to a damage of the surface by an external force. Since the antibacterial ingredient is mixed with the masterbatch or product, the possibility of the antibacterial ingredient exuding a corroded or damaged surface is reduced to improve the effect of environmental protection.

    COMPOSITION FOR MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE COMPOSITION
    6.
    发明申请
    COMPOSITION FOR MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE COMPOSITION 有权
    用于制造半导体器件的组合物和使用该组合物制造半导体器件的方法

    公开(公告)号：US20170062217A1

    公开(公告)日：2017-03-02

    申请号：US15148622

    申请日：2016-05-06

    申请人： Samsung Electronics Co., Ltd.

    发明人： Jin PARK ,  Hyun-woo KIM ,  Myeong-koo KIM

    IPC分类号： H01L21/033 ,  C09D179/08 ,  G03F7/11 ,  H01L21/027 ,  H01L21/311

    CPC分类号： H01L21/0337 ,  C08G73/08 ,  C08G73/1042 ,  C08G73/1067 ,  C09D179/08 ,  G03F7/091 ,  G03F7/094 ,  G03F7/11 ,  H01L21/0276 ,  H01L21/0332

    摘要： A composition for manufacturing a semiconductor device includes at least one carbon-based compound that includes at least one of an alkyne group and an azide group, and a solvent. A method of manufacturing a semiconductor device includes forming a feature layer on a substrate, coating the feature layer with a composition including alkyne and azide, forming a carbon-containing layer including a triazole compound by performing a heat treatment on the coated composition, forming a photoresist film on the carbon-containing layer, forming photoresist patterns by exposing and developing the photoresist film, and patterning the carbon-containing layer and the feature layer using the photoresist patterns.

    摘要翻译： 用于制造半导体器件的组合物包括至少一种包含炔基和叠氮基中的至少一种的碳基化合物和溶剂。 一种制造半导体器件的方法包括在基片上形成特征层，用包含炔和叠氮化物的组合物涂覆该特征层，通过对涂覆组合物进行热处理形成包含三唑化合物的含碳层，形成 在含碳层上形成光致抗蚀剂膜，通过曝光和显影光致抗蚀剂膜形成光致抗蚀剂图案，并使用光致抗蚀剂图案图案化含碳层和特征层。