公开(公告)号：US20210202284A1

公开(公告)日：2021-07-01

申请号：US17100218

申请日：2020-11-20

申请人： TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

发明人： Tzu-Yang LIN ,  Cheng-Han WU ,  Chen-Yu LIU ,  Kuo-Shu TSENG ,  Shang-Sheng LI ,  Chen Yi HSU ,  Yu-Cheng CHANG

IPC分类号： H01L21/67

摘要： A lithography includes a storage tank that stores process chemical fluid, an anti-collision frame, and an integrated sensor assembly. The storage tank includes a dispensing port positioned at a lowest part of the storage tank in a gravity direction. The anti-collision frame is coupled to the storage tank. An integrated sensor assembly is disposed on at least one of the anti-collision frame and the storage tank to measure a variation in fluid quality in response to fluid quality measurement of fluid.

公开(公告)号：US20200174372A1

公开(公告)日：2020-06-04

申请号：US16691052

申请日：2019-11-21

申请人： TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

发明人： Chen Yi HSU ,  Shang-Sheng LI ,  Yung-Yao LEE

IPC分类号： G03F7/16

摘要： A resist material dispensing system includes a resist supply and a resist filter connected to the resist supply downstream from the resist supply. The resist material dispensing system includes a resist tank structure connected to the resist filter downstream from the resist filter and a resist pump device connected to the resist tank structure downstream from the resist tank structure. The resist tank structure is vertically arranged so that a resist material flows in a continuous downward flow from where the resist material enters the resist tank structure until the resist material exits the resist tank structure.