公开(公告)号：US20220334490A1

公开(公告)日：2022-10-20

申请号：US17855591

申请日：2022-06-30

申请人： Taiwan Semiconductor Manufacturing Co., Ltd.

发明人： Min-Cheng WU ,  Chi-Hung LIAO

IPC分类号： G03F7/20 ,  G03F1/42 ,  G03F9/00

摘要： Embodiments of the present disclosure provide a substrate measuring device in a lithography projection apparatus that provides multiple light sources having different wavelengths. In some embodiments, a lithography projection apparatus includes a substrate measuring system disposed proximate to a substrate stage, the substrate measuring system further including an emitter including multiple light sources configured to provide multiple beams of light, each of at least some of the multiple beams of light having a different wavelength, at least one optical fiber, wherein each of respective portions of the at least one optical fiber is configured to pass a respective one of the multiple beams of light, and a receiver positioned to collected light emitted from the emitter and reflected off of a substrate disposed on the substrate stage.

公开(公告)号：US20210341841A1

公开(公告)日：2021-11-04

申请号：US17374647

申请日：2021-07-13

申请人： Taiwan Semiconductor Manufacturing Co., Ltd.

发明人： Min-Cheng WU ,  Chi-Hung LIAO

IPC分类号： G03F7/20 ,  G03F1/42 ,  G03F9/00

摘要： Embodiments of the present disclosure provide a substrate measuring device in a lithography projection apparatus that provides multiple light sources having different wavelengths. In some embodiments, a lithography projection apparatus includes a substrate measuring system disposed proximate to a substrate stage, the substrate measuring system further including an emitter including multiple light sources configured to provide multiple beams of light, each of at least some of the multiple beams of light having a different wavelength, at least one optical fiber, wherein each of respective portions of the at least one optical fiber is configured to pass a respective one of the multiple beams of light, and a receiver positioned to collected light emitted from the emitter and reflected off of a substrate disposed on the substrate stage.

公开(公告)号：US20200103765A1

公开(公告)日：2020-04-02

申请号：US16143715

申请日：2018-09-27

申请人： TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

发明人： Chi-Hung LIAO ,  Min-Cheng WU

IPC分类号： G03F7/20 ,  G02B27/09 ,  G02F1/1343

摘要： A method of lithography includes obtaining a profile of a single field of a substrate that having a photoresist layer thereon, in which the profile includes a first feature and a second feature having different heights. A depth of focus distribution map is generated according to the profile. A project lens is tuned based on the generated depth of focus distribution map, such that the project lens provides a first focus length in a first project pixel of the project lens and a second focus length in a second project pixel of the project lens, wherein the first focus length and the second focus lengths. The single field of the substrate is exposed by using the tuned project lens.

公开(公告)号：US20200057367A1

公开(公告)日：2020-02-20

申请号：US16172075

申请日：2018-10-26

申请人： TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

发明人： Wei-Chang CHENG ,  Chi-Hung LIAO

IPC分类号： G03F1/82 ,  B08B3/04 ,  G01R29/12

摘要： A method for cleaning a reticle includes rotating the reticle, providing a cleaning liquid to clean the reticle, detecting a static charge value on the reticle during rotating the reticle, and reducing static charges on the reticle in response to the detected static charge value. Hence, the electrostatic discharge (ESD) occurred to the reticle can be prevented.

公开(公告)号：US20200057364A1

公开(公告)日：2020-02-20

申请号：US16410426

申请日：2019-05-13

申请人： TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

发明人： Chi-Hung LIAO ,  Min-Cheng WU

IPC分类号： G03F1/24 ,  G03F7/20

摘要： A method including steps as follows is provided. A primary droplet and a satellite droplet are shot toward an excitation zone. The satellite droplet is deflected away from the excitation zone. A laser beam is emitted toward the excitation zone to excite the primary droplet to generate an extreme ultraviolet (EUV) light. The EUV light is directed onto a reticle using a first optical reflector, such that the EUV light is imparted with a pattern of the reticle. The EUV light with the pattern is directed onto a wafer using a second optical reflector.

公开(公告)号：US20160124323A1

公开(公告)日：2016-05-05

申请号：US14706871

申请日：2015-05-07

申请人： Taiwan Semiconductor Manufacturing Co., Ltd.

发明人： Hsueh-Yi CHUNG ,  Yung-Cheng CHEN ,  Fei-Gwo TSAI ,  Chi-Hung LIAO ,  Shih-Chi FU ,  Wei-Ti HSU ,  Jui-Ping CHUANG ,  Tzong-Sheng CHANG ,  Kuei-Shun CHEN ,  Meng-Wei CHEN

IPC分类号： G03F7/20 ,  H01L21/66

CPC分类号： G03F7/70433 ,  G03F1/50 ,  G03F1/68 ,  G03F1/70 ,  G03F1/78 ,  G03F7/20 ,  G03F7/70141 ,  G03F7/70158 ,  G03F7/70716 ,  H01L22/30

摘要： A method for exposing a wafer substrate includes forming a reticle having a device pattern. A relative orientation between the device pattern and a mask field of an exposure tool is determined based on mask field utilization. The reticle is loaded on the exposure tool. The wafer substrate is rotated based on an orientation of the device pattern. Radiation is projected through the reticle onto the rotated wafer substrate by the exposure tool, thereby imaging the device pattern onto the rotated wafer substrate.

摘要翻译： 曝光晶片衬底的方法包括形成具有器件图案的掩模版。 基于掩模场利用率确定曝光工具的装置图案和掩模场之间的相对取向。 掩模版装载在曝光工具上。 基于装置图案的取向旋转晶片基板。 通过曝光工具将辐射通过掩模版投影到旋转的晶片衬底上，从而将器件图案成像到旋转的晶片衬底上。

公开(公告)号：US20240012324A1

公开(公告)日：2024-01-11

申请号：US18472981

申请日：2023-09-22

申请人： TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

发明人： Yu-Yu CHEN ,  Chi-Hung LIAO

IPC分类号： G03F1/76 ,  H01L21/308 ,  H01L21/027 ,  G03F7/20 ,  G03F1/00 ,  G03F7/16 ,  G03F7/30

CPC分类号： G03F1/76 ,  H01L21/3086 ,  H01L21/0274 ,  G03F7/20 ,  G03F1/00 ,  G03F7/162 ,  G03F7/30

摘要： A photomask includes a substrate, an opaque filling formed embedded in the substrate, and an opaque main feature over the substrate. The opaque filling has a first width. The opaque main has a second width greater than the first width of the opaque filling. The opaque filling and the opaque main feature comprise same material.

公开(公告)号：US20220357677A1

公开(公告)日：2022-11-10

申请号：US17871869

申请日：2022-07-22

申请人： TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

发明人： Chi-Hung LIAO ,  Min-Cheng WU

IPC分类号： G03F7/20

摘要： A lithography system includes a collector having a mirror surface, a laser generator aiming at an excitation zone in front of the mirror surface of the collector, a droplet generator, and a droplet deflector operative to apply a force at a position between the droplet generator and the excitation zone.

公开(公告)号：US20210389675A1

公开(公告)日：2021-12-16

申请号：US16902085

申请日：2020-06-15

申请人： Taiwan Semiconductor Manufacturing Co., Ltd.

发明人： Po-Ming SHIH ,  Chi-Hung LIAO

IPC分类号： G03F7/20

摘要： A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become energized and emit extreme ultraviolet radiation. A collector reflects the extreme ultraviolet radiation toward a photolithography target. The photolithography system reduces splashback of the tin droplets onto the receiver by generating a net electric charge within the droplets using a charge electrode and decelerating the droplets by applying an electric field with a counter electrode.

公开(公告)号：US20210327743A1

公开(公告)日：2021-10-21

申请号：US17365878

申请日：2021-07-01

申请人： TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

发明人： Yueh-Lin YANG ,  Chi-Hung LIAO

IPC分类号： H01L21/683 ,  B08B7/00 ,  H01L21/67 ,  C23C14/50 ,  B08B3/04

摘要： A method includes transmitting a radiation toward an electrostatic chuck, receiving a reflection of the radiation, analyzing the reflection of the radiation, determining whether a particle is present on the electrostatic chuck based on the analyzing the reflection of the radiation, and moving a cleaning tool to a location of the particle on the electrostatic chuck when the determination determines that the particle is present.