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公开(公告)号:US11486088B2
公开(公告)日:2022-11-01
申请号:US17144253
申请日:2021-01-08
发明人: Chen-Shou Hsu , Sun-Wen Juan , Chun-Hung Lin
IPC分类号: D06N3/12 , C08G65/333 , C09D175/12 , C08G18/08 , C08G18/28 , C08G18/80 , C08G18/32 , C08G18/48 , C08G18/79
摘要: An anti-staining fabric includes a base cloth and an anti-staining resin. The anti-staining resin is disposed on the base cloth, in which a method of fabricating the anti-staining resin includes the following steps. A first thermal process is performed to mix a polyol, a cross-linking agent, and a choline to form a first mixture, in which a reaction temperature of the first thermal process is between 90° C. and 120° C. A second thermal process is performed to mix the first mixture and a chain extender to form the anti-staining resin, in which the chain extender includes a first reagent and a second reagent, and a reaction temperature of the second thermal process is between 120° C. and 150° C.
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公开(公告)号:US12043696B2
公开(公告)日:2024-07-23
申请号:US17856136
申请日:2022-07-01
发明人: Chen-Shou Hsu , Sun-Wen Juan , Chun-Hung Lin
IPC分类号: C08G18/32 , C08G18/10 , C08G18/79 , D06M15/61 , D06M101/32
CPC分类号: C08G18/791 , C08G18/10 , C08G18/324 , C08G18/329 , D06M15/61 , D06M2101/32 , D06M2200/01
摘要: A zwitterionic resin is manufactured by a manufacturing method which includes the following steps. A first thermal process is performed on a first crosslinking agent and a choline having hydroxyl group or amino group to form a first mixture, in which the first crosslinking agent includes an isocyanate group. A second thermal process is performed on the first mixture, a second crosslinking agent, a chain extender, and an amino acid to form the zwitterionic resin, in which the chain extender includes a polyol.
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公开(公告)号:US11746466B2
公开(公告)日:2023-09-05
申请号:US17567503
申请日:2022-01-03
发明人: Chen-Shou Hsu , Sun-Wen Juan , Chun-Hung Lin
IPC分类号: D06N3/12 , C08G65/333
CPC分类号: D06N3/12 , C08G65/33375 , D06N2209/142 , D10B2401/021
摘要: A water-repellent fabric includes a base cloth and a water-repellent resin. The water-repellent resin is disposed on the base cloth, in which a method of fabricating the water-repellent resin includes the following steps. A first thermal process is performed to mix a polyol, a cross-linking agent, and a choline to form a first mixture, in which a reaction temperature of the first thermal process is between 90° C. and 120° C. A second thermal process is performed to mix the first mixture and a water repellent to form the water-repellent resin, in which the water repellent includes a hydroxyl group, an amino group, or combinations thereof, and a reaction temperature of the second thermal process is between 120° C. and 150° C.
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