ARRAY SUBSTRATE, MANUFACTURING METHOD THEREFOR AND DISPLAY PANEL

    公开(公告)号:US20250118717A1

    公开(公告)日:2025-04-10

    申请号:US18523947

    申请日:2023-11-30

    Abstract: An array substrate and a manufacturing method therefor, and a display panel. The array substrate includes a substrate, a first transistor and a photosensitive element; the first transistor and the photosensitive element are disposed on the substrate; the first transistor and the photosensitive element are electrically connected; the first transistor includes a first gate, a first active layer, a second gate stacked, and a source and a drain; the source and the drain are electrically connected to the first active layer respectively; the photosensitive element includes a first electrode, a photosensitive layer, and a second electrode stacked; the first electrode is disposed in the same layer as the second gate, and are electrically connected to the source or drain.

    ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20230122931A1

    公开(公告)日:2023-04-20

    申请号:US17045186

    申请日:2020-06-05

    Inventor: Zhiwei TAN

    Abstract: The present disclosure provides an array substrate and a manufacturing method of the array substrate. In the manufacturing method of the array substrate, during performing a first wet etching and a second wet etching on a second metal layer, the wet etching is stopped when a copper conductive layer is merely etched completely. Because a wet etching speed of a liner layer is slow, an etching time of the wet etching and a CD loss of the copper conductive layer can be greatly reduced, and the CD loss is relatively small. Meanwhile, an entire CD loss of the second metal layer can be reduced, and an aperture ratio can be improved.

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