公开(公告)号：US20170170044A1

公开(公告)日：2017-06-15

申请号：US15373210

申请日：2016-12-08

申请人： TDK CORPORATION

发明人： Tsutomu OKABE ,  Hidetoshi HORIBE

IPC分类号： H01L21/677 ,  H01L21/02

CPC分类号： H01L21/67703 ,  H01L21/02046 ,  H01L21/67017 ,  H01L21/67393 ,  H01L21/67772 ,  H01L21/67775

摘要： A controlling method for a wafer transportation part and a load port part on an EFEM includes a fixing step of fixing a container on an installation stand of the load port part, a first cleaning step of connecting a bottom nozzle of the load port part to multiple bottom holes formed on a bottom surface of the container and introducing a cleaning gas into the container and discharging a gas from the container via the nozzle, a connection step of connecting the container and the transportation room, and a wafer transportation step of transporting the wafer from the container to a processing room via the opening and the transportation room and transporting the wafer from the processing room to the container via the transportation room and the opening.

公开(公告)号：US20170170033A1

公开(公告)日：2017-06-15

申请号：US15377393

申请日：2016-12-13

申请人： TDK CORPORATION

发明人： Tsutomu OKABE ,  Hidetoshi HORIBE

IPC分类号： H01L21/67 ,  F24F3/16 ,  H01L21/677 ,  H01L21/673 ,  H01L21/687

CPC分类号： H01L21/67017 ,  F24F3/161 ,  F24F2003/1614 ,  F24F2003/1621 ,  H01L21/67028 ,  H01L21/67196 ,  H01L21/67386 ,  H01L21/67389 ,  H01L21/67393 ,  H01L21/67769 ,  H01L21/67775 ,  H01L21/68707

摘要： A mini-environment apparatus includes a wafer transportation machine transporting a wafer, a wafer transportation room having the machine and passed by the wafer transported to a processing room, a circulating passage where a gas detoured from the transportation room flows, a blowing means forming a circulating current falling in the transportation room and rising in the passage, a current member arranged in a ceiling part of the transportation room and laminarizing the current and introducing this laminarized current into the transportation room, a particle removal filter arranged in either the ceiling part of the transportation room or the passage, and a chemical filter arranged in the passage detachably and separately from the removal filter. The chemical filter is arranged at a position lower than a lowest position where the wafer may pass through in the transportation room.

公开(公告)号：US20170170042A1

公开(公告)日：2017-06-15

申请号：US15372756

申请日：2016-12-08

申请人： TDK CORPORATION

发明人： Tsutomu OKABE ,  Hidetoshi HORIBE

IPC分类号： H01L21/673 ,  H01L21/02

CPC分类号： H01L21/67353 ,  B65G2201/0297 ,  H01L21/02046 ,  H01L21/67017 ,  H01L21/67393 ,  H01L21/67772 ,  H01L21/67775

摘要： An EFEM includes a wafer transportation part having a wafer transportation room passed by a wafer transported to a processing room and a load port part airtightly connecting a main opening formed on a container housing the wafer to the room. The transportation part includes a downward current forming device for forming a downward current in the room and a current plate arranged in the room and partly introducing the current into the container connected to the room via the opening. The load port part includes an installation stand for installing the container, a bottom nozzle for communicating with a bottom hole formed at a position distant from the opening more than a bottom surface middle on a bottom surface of the container, and a gas discharge passage for discharging a gas in the container to an outside thereof via the nozzle.