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公开(公告)号:US20200381266A1
公开(公告)日:2020-12-03
申请号:US16997092
申请日:2020-08-19
Applicant: TDK CORPORATION
Inventor: Takashi DAITOKU , Susumu TANIGUCHI , Akiko SEKI , Atsushi SATO , Yuhei HORIKAWA , Makoto ORIKASA , Hisayuki ABE
Abstract: A method of producing an electroconductive substrate including a base material, and an electroconductive pattern disposed on one main surface side of the base material includes: a step of forming a trench including a bottom surface to which a foundation layer is exposed, and a lateral surface which includes a surface of a trench formation layer, according to an imprint method; and a step of forming an electroconductive pattern layer by growing metal plating from the foundation layer which is exposed to the bottom surface of the trench.
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公开(公告)号:US20210265256A1
公开(公告)日:2021-08-26
申请号:US17314187
申请日:2021-05-07
Applicant: TDK CORPORATION
Inventor: Takashi DAITOKU , Susumu TANIGUCHI , Akiko SEKI , Atsushi SATO , Yuhei HORIKAWA , Makoto ORIKASA , Hisayuki ABE
Abstract: An electroconductive substrate, including: a base material; a foundation layer disposed on the base material; a trench formation layer disposed on the foundation layer, and an electroconductive pattern layer including metal plating. A trench including a bottom surface to which the foundation layer is exposed, is formed. The trench is filled with the electroconductive pattern layer. The foundation layer includes a mixed region which is formed from a surface of the foundation layer on the electroconductive pattern layer side towards the inside thereof, and contains metal particles which contain a metal configuring the electroconductive pattern layer, and enter the foundation layer.
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公开(公告)号:US20190043736A1
公开(公告)日:2019-02-07
申请号:US16038711
申请日:2018-07-18
Applicant: TDK CORPORATION
Inventor: Takashi DAITOKU , Susumu TANIGUCHI , Akiko SEKI , Atsushi SATO , Yuhei HORIKAWA , Makoto ORIKASA , Hisayuki ABE
IPC: H01L21/48 , H01L33/62 , H01L25/075
Abstract: A method of producing an electroconductive substrate including a base material, and an electroconductive pattern disposed on one main surface side of the base material includes: a step of forming a trench including a bottom surface to which a foundation layer is exposed, and a lateral surface which includes a surface of a trench formation layer, according to an imprint method; and a step of forming an electroconductive pattern layer by growing metal plating from the foundation layer which is exposed to the bottom surface of the trench.
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公开(公告)号:US20200211951A1
公开(公告)日:2020-07-02
申请号:US16811018
申请日:2020-03-06
Applicant: TDK CORPORATION
Inventor: Takashi DAITOKU , Susumu TANIGUCHI , Akiko SEKI , Atsushi SATO , Yuhei HORIKAWA , Makoto ORIKASA , Hisayuki ABE
Abstract: An electroconductive substrate, including: a base material; a foundation layer disposed on the base material; a trench formation layer disposed on the foundation layer, and an electroconductive pattern layer including metal plating. A trench including a bottom surface to which the foundation layer is exposed, is formed. The trench is filled with the electroconductive pattern layer. The foundation layer includes a mixed region which is formed from a surface of the foundation layer on the electroconductive pattern layer side towards the inside thereof, and contains metal particles which contain a metal configuring the electroconductive pattern layer, and enter the foundation layer.
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公开(公告)号:US20190035719A1
公开(公告)日:2019-01-31
申请号:US16038491
申请日:2018-07-18
Applicant: TDK CORPORATION
Inventor: Takashi DAITOKU , Susumu TANIGUCHI , Akiko SEKI , Atsushi SATO , Yuhei HORIKAWA , Makoto ORIKASA , Hisayuki ABE
IPC: H01L23/498 , H01L33/62 , H05K1/09 , H05K3/40 , H01L21/48
Abstract: An electroconductive substrate, including: a base material; a foundation layer disposed on the base material; a trench formation layer disposed on the foundation layer, and an electroconductive pattern layer including metal plating. A trench including a bottom surface to which the foundation layer is exposed, is formed. The trench is filled with the electroconductive pattern layer. The foundation layer includes a mixed region which is formed from a surface of the foundation layer on the electroconductive pattern layer side towards the inside thereof, and contains metal particles which contain a metal configuring the electroconductive pattern layer, and enter the foundation layer.
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