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1.
公开(公告)号:US20200312553A1
公开(公告)日:2020-10-01
申请号:US16823789
申请日:2020-03-19
Applicant: TDK Corporation
Inventor: Shirou OOTSUKI , Aiko TAKAHASHI , Yasunori HARADA , Shota SUZUKI , Yasunaga KAGAYA , Tomohiko KATO , Mirai ISHIDA
Abstract: A dielectric film, contains: (1) Bi and Ti; (2) at least one element E1 selected from the group consisting of Na and K; and (3) at least one element E2 selected from the group consisting of Ba, Sr, and Ca. The dielectric film has a main phase containing an oxide that contains Bi, Ti, the element E1, and the element E2 and has a perovskite structure, and a subphase that contains Bi and has an oxygen concentration lower than that of the main phase. In a sectional surface of the dielectric film, a ratio RS of an area of the subphase to a sum of an area of the main phase and the area of the subphase is greater than or equal to 0.03 and less than or equal to 0.3.
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2.
公开(公告)号:US20200312484A1
公开(公告)日:2020-10-01
申请号:US16819073
申请日:2020-03-14
Applicant: TDK Corporation
Inventor: Shirou OOTSUKI , Aiko TAKAHASHI , Wakiko SATO
Abstract: This dielectric film is a dielectric film comprising an oxide having a perovskite structure. The oxide comprises (1) Bi, Na and Ti, (2) at least one of Ba and Ca, and (3) at least one element Ln selected from the group consisting of La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Yb and Y. When ratios of the numbers of atoms of Bi, Ba and Ca to the total of the numbers of atoms of Bi, Na, Ba and Ca in the oxide are represented by XBi, XBa and XCa, respectively, the ratios satisfy 0.2≤XBi/(XBa+XCa)≤5.
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