公开(公告)号：US20240213051A1

公开(公告)日：2024-06-27

申请号：US18389746

申请日：2023-12-19

Applicant: TES CO., LTD

Inventor： Sung-Ho KIM ,  Nam-Seo KIM ,  Yeong-Hyeon HWANG ,  Seung-Hwan JEON ,  Hye-Ok KIM ,  Du-Ho KANG

IPC: H01L21/67

CPC classification number: H01L21/67103 ,  H01L21/67017 ,  H01L21/67207 ,  H01L21/67248

Abstract: Provided is an insulator ring assembly and a substrate processing apparatus, and more particularly an insulator ring assembly and a substrate processing apparatus, for reducing a deviation of an extinction coefficient K between an edge and a central part of a substrate when a process is performed on the substrate.

公开(公告)号：US20240263311A1

公开(公告)日：2024-08-08

申请号：US18432288

申请日：2024-02-05

Applicant: TES Co., Ltd

Inventor： Seong-Pyo CHO ,  Seung-Hwan JEON ,  Nam-Seo KIM

IPC: C23C16/50 ,  C23C16/26 ,  C23C16/44 ,  C23C16/455 ,  C23C16/52

CPC classification number: C23C16/50 ,  C23C16/26 ,  C23C16/4408 ,  C23C16/45565 ,  C23C16/52

Abstract: Disclosed is a method for depositing an amorphous carbon film, the method including: (a) loading a substrate into a process chamber; (b) vacuumizing an inner space of the process chamber; and (c) converting hydrocarbon gas into plasma in the process chamber to deposit an amorphous carbon film on the substrate, wherein in the step (c), an oxygen-containing source is converted into plasma to dope oxygen into the deposited amorphous carbon film.