公开(公告)号：US20200064745A1

公开(公告)日：2020-02-27

申请号：US16672787

申请日：2019-11-04

Applicant: TEXAS INSTRUMENTS INCORPORATED

Inventor： Lucius M. Sherwin ,  Song Zheng ,  Chris Murray Beard ,  Noppawan Boorananut

IPC: G03F7/20 ,  G03F1/44 ,  H01L21/027 ,  B81C1/00 ,  G03F7/00 ,  G03F1/50

Abstract: A die includes a resist layer located over a semiconductor substrate, and a pattern developed in the resist layer. The pattern includes a plurality of locations of developed photoresist, each location of developed photoresist separated from a neighboring location of developed photoresist by a portion of undeveloped photoresist, and the developed photoresist at each location having a corresponding different thickness.

公开(公告)号：US20190129298A1

公开(公告)日：2019-05-02

申请号：US15800868

申请日：2017-11-01

Applicant: TEXAS INSTRUMENTS INCORPORATED

Inventor： Lucius M. Sherwin ,  Song Zheng ,  Chris Murray Beard ,  Noppawan Boorananut

IPC: G03F1/44 ,  H01L21/027 ,  B81C1/00 ,  G03F7/20

Abstract: Methods and apparatus to control grayscale lithography are disclosed. A disclosed example apparatus for adjusting a grayscale lithography process includes an optical measurement device to optically measure portions of a patterned wafer, and a processor to calculate a profile based on the measured portions, and to determine an adjustment of the grayscale lithography process based on the calculated profile. The disclosed apparatus also includes an adjuster to control the grayscale lithography process based on the adjustment.

公开(公告)号：US10466597B2

公开(公告)日：2019-11-05

申请号：US15800868

申请日：2017-11-01

Applicant: TEXAS INSTRUMENTS INCORPORATED

Inventor： Lucius M. Sherwin ,  Song Zheng ,  Chris Murray Beard ,  Noppawan Boorananut

IPC: G03F7/20 ,  G03F1/44 ,  H01L21/027 ,  B81C1/00

Abstract: Methods and apparatus to control grayscale lithography are disclosed. A disclosed example apparatus for adjusting a grayscale lithography process includes an optical measurement device to optically measure portions of a patterned wafer, and a processor to calculate a profile based on the measured portions, and to determine an adjustment of the grayscale lithography process based on the calculated profile. The disclosed apparatus also includes an adjuster to control the grayscale lithography process based on the adjustment.