公开(公告)号：US20190129298A1

公开(公告)日：2019-05-02

申请号：US15800868

申请日：2017-11-01

Applicant: TEXAS INSTRUMENTS INCORPORATED

Inventor： Lucius M. Sherwin ,  Song Zheng ,  Chris Murray Beard ,  Noppawan Boorananut

IPC: G03F1/44 ,  H01L21/027 ,  B81C1/00 ,  G03F7/20

Abstract: Methods and apparatus to control grayscale lithography are disclosed. A disclosed example apparatus for adjusting a grayscale lithography process includes an optical measurement device to optically measure portions of a patterned wafer, and a processor to calculate a profile based on the measured portions, and to determine an adjustment of the grayscale lithography process based on the calculated profile. The disclosed apparatus also includes an adjuster to control the grayscale lithography process based on the adjustment.

公开(公告)号：US10466597B2

公开(公告)日：2019-11-05

申请号：US15800868

申请日：2017-11-01

Applicant: TEXAS INSTRUMENTS INCORPORATED

Inventor： Lucius M. Sherwin ,  Song Zheng ,  Chris Murray Beard ,  Noppawan Boorananut

IPC: G03F7/20 ,  G03F1/44 ,  H01L21/027 ,  B81C1/00

Abstract: Methods and apparatus to control grayscale lithography are disclosed. A disclosed example apparatus for adjusting a grayscale lithography process includes an optical measurement device to optically measure portions of a patterned wafer, and a processor to calculate a profile based on the measured portions, and to determine an adjustment of the grayscale lithography process based on the calculated profile. The disclosed apparatus also includes an adjuster to control the grayscale lithography process based on the adjustment.

公开(公告)号：US12252396B2

公开(公告)日：2025-03-18

申请号：US17728844

申请日：2022-04-25

Applicant: TEXAS INSTRUMENTS INCORPORATED

Inventor： Christopher Murray Beard ,  Song Zheng ,  John Wesley Hamlin, III ,  Win-Jae Jessie Yuan ,  Kelly Jay Taylor ,  Jose Antonio Martinez Soto

IPC: B81C1/00

Abstract: In an example, a method includes depositing an organic polymer layer on one or more material layers. The method also includes thermally curing the organic polymer layer. The method includes depositing a hard mask on the organic polymer layer and depositing a photoresist layer on the hard mask. The method also includes patterning the photoresist layer to expose at least a portion of the hard mask. The method includes etching the exposed portion of the hard mask to expose at least a portion of the organic polymer layer. The method also includes etching the exposed portion of the organic polymer layer to expose at least a portion of the one or more material layers.

公开(公告)号：US12135415B2

公开(公告)日：2024-11-05

申请号：US17398907

申请日：2021-08-10

Applicant: TEXAS INSTRUMENTS INCORPORATED

Inventor： William Craig McDonald ,  James Norman Hall ,  Kelly Jay Taylor ,  Song Zheng

IPC: G02B26/08 ,  G02B7/182 ,  H02N1/00

Abstract: A system includes a hinge structure. The hinge structure includes four support posts and four hinges, each hinge coupled to an edge of a support post and to a plate of the hinge structure, where each hinge includes two 90° turns. The system also includes a mirror coupled to the hinge structure and an electrode structure coupled to the hinge structure.

公开(公告)号：US20200064745A1

公开(公告)日：2020-02-27

申请号：US16672787

申请日：2019-11-04

Applicant: TEXAS INSTRUMENTS INCORPORATED

Inventor： Lucius M. Sherwin ,  Song Zheng ,  Chris Murray Beard ,  Noppawan Boorananut

IPC: G03F7/20 ,  G03F1/44 ,  H01L21/027 ,  B81C1/00 ,  G03F7/00 ,  G03F1/50

Abstract: A die includes a resist layer located over a semiconductor substrate, and a pattern developed in the resist layer. The pattern includes a plurality of locations of developed photoresist, each location of developed photoresist separated from a neighboring location of developed photoresist by a portion of undeveloped photoresist, and the developed photoresist at each location having a corresponding different thickness.