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公开(公告)号:US20230127477A1
公开(公告)日:2023-04-27
申请号:US17728844
申请日:2022-04-25
Applicant: TEXAS INSTRUMENTS INCORPORATED
Inventor: Christopher Murray BEARD , Song ZHENG , John Wesley HAMLIN, III , Win-Jae Jessie YUAN , Kelly Jay TAYLOR , Jose Antonio MARTINEZ SOTO
IPC: B81C1/00
Abstract: In an example, a method includes depositing an organic polymer layer on one or more material layers. The method also includes thermally curing the organic polymer layer. The method includes depositing a hard mask on the organic polymer layer and depositing a photoresist layer on the hard mask. The method also includes patterning the photoresist layer to expose at least a portion of the hard mask. The method includes etching the exposed portion of the hard mask to expose at least a portion of the organic polymer layer. The method also includes etching the exposed portion of the organic polymer layer to expose at least a portion of the one or more material layers.
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公开(公告)号:US20230077129A1
公开(公告)日:2023-03-09
申请号:US17843816
申请日:2022-06-17
Applicant: TEXAS INSTRUMENTS INCORPORATED
Inventor: Sean Christopher O'BRIEN , Kelly Jay TAYLOR , John Wesley HAMLIN, III , Christopher Murray BEARD
Abstract: In an example, a method of manufacturing a MEMS device includes forming a via. The method also includes depositing metal in the via and depositing a first layer of a non-photoactive organic polymer on the metal. The method includes baking the first layer of the non-photoactive organic polymer. The method also includes depositing a second layer of the non-photoactive organic polymer on the first layer of the non-photoactive organic polymer after baking the first layer of the non-photoactive organic polymer. The method includes baking the second layer of the non-photoactive organic polymer. The method also includes etching the first layer and the second layer of the non-photoactive organic polymer.
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