公开(公告)号：US08723241B2

公开(公告)日：2014-05-13

申请号：US13946144

申请日：2013-07-19

Applicant: Texas Instruments Incorporated

Inventor： Kezhakkedath R. Udayakumar ,  Marie Denison ,  Theodore S. Moise

IPC: H01L41/04 ,  H01L27/20 ,  H01L41/08

CPC classification number: H01L41/08 ,  H01L27/20 ,  H01L41/0533 ,  H01L41/1134 ,  H01L41/1136 ,  H01L41/1138 ,  H01L41/22 ,  H01L41/318 ,  H01L2224/18

Abstract: A planar integrated MEMS device has a piezoelectric element on a dielectric isolation layer over a flexible element attached to a proof mass. The piezoelectric element contains a ferroelectric element with a perovskite structure formed over an isolation dielectric. At least two electrodes are formed on the ferroelectric element. An upper hydrogen barrier is formed over the piezoelectric element. Front side singulation trenches are formed at a periphery of the MEMS device extending into the semiconductor substrate. A DRIE process removes material from the bottom side of the substrate to form the flexible element, removes material from the substrate under the front side singulation trenches, and forms the proof mass from substrate material. The piezoelectric element overlaps the flexible element.

Abstract translation: 平面集成MEMS器件在连接到校准块的柔性元件上的介电隔离层上具有压电元件。 压电元件包含在隔离电介质上形成的具有钙钛矿结构的铁电元件。 在铁电元件上形成至少两个电极。 在压电元件上形成上部氢屏障。 在延伸到半导体衬底中的MEMS器件的周边形成有正面侧划分沟槽。 DRIE工艺从衬底的底侧去除材料以形成柔性元件，在正面单面沟槽之下从衬底去除材料，并从衬底材料形成校验物质。 压电元件与柔性元件重叠。

公开(公告)号：US20130307375A1

公开(公告)日：2013-11-21

申请号：US13946144

申请日：2013-07-19

Applicant: TEXAS INSTRUMENTS INCORPORATED

Inventor： Kezhakkedath R. Udayakumar ,  Marie Denison ,  Theodore S. Moise

IPC: H01L41/08

CPC classification number: H01L41/08 ,  H01L27/20 ,  H01L41/0533 ,  H01L41/1134 ,  H01L41/1136 ,  H01L41/1138 ,  H01L41/22 ,  H01L41/318 ,  H01L2224/18

Abstract: A planar integrated MEMS device has a piezoelectric element on a dielectric isolation layer over a flexible element attached to a proof mass. The piezoelectric element contains a ferroelectric element with a perovskite structure formed over an isolation dielectric. At least two electrodes are formed on the ferroelectric element. An upper hydrogen barrier is formed over the piezoelectric element. Front side singulation trenches are formed at a periphery of the MEMS device extending into the semiconductor substrate. A DRIE process removes material from the bottom side of the substrate to form the flexible element, removes material from the substrate under the front side singulation trenches, and forms the proof mass from substrate material. The piezoelectric element overlaps the flexible element.