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公开(公告)号:US20230365891A1
公开(公告)日:2023-11-16
申请号:US18360611
申请日:2023-07-27
Applicant: THE CLOROX COMPANY
Inventor: Nancy A. FALK , David R. SCHEUING , Heather L. DAY , Szu-Ying CHEN , Bryan K. PARRISH , Fanny FRAUSTO , Eric G. GHARAKHANIAN , William KING
IPC: C11D1/83 , C11D3/48 , C11D1/14 , C11D3/50 , C11D3/43 , C11D3/20 , C11D17/04 , C11D11/00 , C11D1/66 , C11D1/22 , C11D1/75
CPC classification number: C11D1/83 , C11D3/48 , C11D1/146 , C11D3/50 , C11D3/43 , C11D3/2086 , C11D17/049 , C11D11/0023 , C11D3/2044 , C11D3/2079 , C11D1/662 , C11D1/143 , C11D1/22 , C11D1/75
Abstract: The present invention is for an acidic cleaning composition which has excellent cleaning performance, low toxicity and good antimicrobial efficacy. The inventive acidic cleaning compositions are capable of sanitizing or disinfecting a variety of hard surfaces. The inventive acidic cleaning compositions can take a variety of forms, such as: disinfecting wipes, all-purpose disinfecting sprays, kitchen cleaners, bathroom cleaners, toilet cleaners, etc. The inventive acidic cleaning compositions have good cleaning properties and low residue.
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公开(公告)号:US20230301299A1
公开(公告)日:2023-09-28
申请号:US18179191
申请日:2023-03-06
Applicant: THE CLOROX COMPANY
Inventor: Nancy A. FALK , Crystal BELL , William KING , Marjan HASHEMI , Nipa MODI , Keith MAINQUIST , Xuanrong GUO , Walter SCHENCK , Ronald Thomas ANDERSON , Kelly DICKSON , Miguel LOPEZ , Giselle JANSSEN , Bryan K. PARRISH , Claire DENTINGER , Thomas FAHLEN
Abstract: Cleaning compositions that include carvacrol, in an amount sufficient to provide an antimicrobial effect. For example, the compositions can include 0.1% to 2% by weight of carvacrol. The cleaning compositions advantageously further include a surfactant, particularly an anionic surfactant, which enhances the antimicrobial efficacy characteristics of the carvacrol. For example, the composition can include at least 0.1%, at least 0.3%, or at least 0.5% of one or more anionic surfactants. Alkyl sulfates (e.g., C8 to C12 alkyl sulfates) are particularly suitable. A buffer may also be present. The compositions may have a relatively high pH, e.g., 9 to 12. The cleaning composition may exhibit a significant log reduction against a target microorganism (e.g., Staphylococcus aureus and/or others) within a given time period (e.g., 10 minutes, 5 minutes, or the like), when used on a target surface.
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公开(公告)号:US20250101342A1
公开(公告)日:2025-03-27
申请号:US18974388
申请日:2024-12-09
Applicant: THE CLOROX COMPANY
Inventor: Nancy A. FALK , David R. SCHEUING , Heather L. DAY , Szu-Ying CHEN , Bryan K. PARRISH , Fanny FRAUSTO , Eric G. GHARAKHANIAN , William KING
IPC: C11D1/83 , C11D1/14 , C11D1/22 , C11D1/66 , C11D1/75 , C11D3/20 , C11D3/43 , C11D3/48 , C11D3/50 , C11D17/04
Abstract: The present invention is for an acidic cleaning composition which has excellent cleaning performance, low toxicity and good antimicrobial efficacy. The inventive acidic cleaning compositions are capable of sanitizing or disinfecting a variety of hard surfaces. The inventive acidic cleaning compositions can take a variety of forms, such as: disinfecting wipes, all-purpose disinfecting sprays, kitchen cleaners, bathroom cleaners, toilet cleaners, etc. The inventive acidic cleaning compositions have good cleaning properties and low residue.
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公开(公告)号:US20220056370A1
公开(公告)日:2022-02-24
申请号:US17406461
申请日:2021-08-19
Applicant: THE CLOROX COMPANY
Inventor: Nancy A. FALK , David R. SCHEUING , Heather L. DAY , Szu-Ying CHEN , Bryan K. PARRISH , Fanny FRAUSTO , Eric G. GHARAKHANIAN , William KING
Abstract: The present invention is for an acidic cleaning composition which has excellent cleaning performance, low toxicity and good antimicrobial efficacy. The inventive acidic cleaning compositions are capable of sanitizing or disinfecting a variety of hard surfaces. The inventive acidic cleaning compositions can take a variety of forms, such as: disinfecting wipes, all-purpose disinfecting sprays, kitchen cleaners, bathroom cleaners, toilet cleaners, etc. The inventive acidic cleaning compositions have good cleaning properties and low residue.
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