公开(公告)号：US20170073833A1

公开(公告)日：2017-03-16

申请号：US15125314

申请日：2015-02-26

Applicant: THINK LABORATORY CO., LTD.

Inventor： Kazuhiro SUKENARI

IPC: C25D17/12 ,  C25D3/38 ,  C25D5/04 ,  C25D3/04 ,  C25D7/04 ,  C25D17/06

CPC classification number: C25D17/12 ,  C25D3/04 ,  C25D3/38 ,  C25D5/04 ,  C25D7/00 ,  C25D7/04 ,  C25D17/06

Abstract: Provided are a cylinder plating apparatus and a cylinder plating method, in which the distance between an insoluble electrode and a cylinder to be processed can be kept constant regardless of the diameter of the cylinder to be processed, and the surface area of the insoluble electrode is increased to reduce the current density of the insoluble electrode, thereby being capable of reducing burden on the insoluble electrode. The cylinder plating apparatus is configured to plate an outer peripheral surface of the cylinder to be processed in such a manner that a pair of the insoluble electrodes each having a shape in which at least a lower part thereof is curved inward and being constructed such that at least the lower part has a comb-like portion are brought close to both side surfaces of the cylinder to be processed with predetermined intervals. The insoluble electrodes face each other in a staggered pattern so that projections of the comb-like portion of one of the insoluble electrodes are located at positions of recesses of the comb-like portion of another one of the insoluble electrodes. The insoluble electrode is configured to rotate about an upper end of the insoluble electrode so that the distance of closeness of the insoluble electrode to the outer peripheral surface of the cylinder to be processed is adjustable depending on the diameter of the cylinder to be processed.

Abstract translation: 提供了一种圆筒镀覆装置和圆筒镀覆方法，其中不溶性电极和待处理圆筒之间的距离可以保持恒定，而不管待处理圆筒的直径如何，不溶性电极的表面积是 增加以降低不溶性电极的电流密度，从而能够减少不溶性电极的负担。 气缸电镀装置被构造成使待加工气缸的外周面以这样一种方式平板化：一对不溶性电极，每个不溶电极的至少其下部向内弯曲并被构造成使得在 至少下部具有梳状部分以预定的间隔靠近待处理气缸的两个侧表面。 不溶性电极以交错图案彼此面对，使得不溶性电极之一的梳状部分的突起位于另一个不溶性电极的梳状部分的凹部的位置。 不溶性电极被配置为围绕不溶性电极的上端旋转，使得不可溶电极与待处理气缸的外周表面的接近距离可根据待处理气缸的直径而调节。