公开(公告)号：US3843916A

公开(公告)日：1974-10-22

申请号：US26942172

申请日：1972-07-06

Applicant: THOMSON CSF

Inventor： TROTEL J ,  GUILLOT G ,  FAY B

IPC: H01J37/304 ,  H01J37/305 ,  H01J37/317 ,  H01L21/00 ,  G05B1/06

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3045 ,  H01J37/3056 ,  H01J37/3175 ,  H01J2237/31779 ,  H01L21/00 ,  Y10S148/006 ,  Y10S148/016 ,  Y10S148/106 ,  Y10S438/943

Abstract: An electronic apparatus for the mass production of masks for integrated circuits, comprises a master mask arranged in an evacuated chamber. In response to diffuse ultra-violet radiation, it emits from its transparent areas electrons which are focussed by uniform electric and magnetic fields which are parallel to one another. The master mask is positioned in relation to the wafer being printed, by means of piezoelectric elements which receive supply voltage increments produced following the illumination of two pairs of markers respectively arranged on the master mask and the wafer.

Abstract translation: 一种用于大规模生产用于集成电路的掩模的电子设备，包括布置在抽真空室中的主掩模。 响应于漫射的紫外线辐射，它从其透明区域发射的电子被彼此平行的均匀电场和磁场聚焦。 主掩模通过压电元件相对于正在印刷的晶片定位，压电元件接收在分别布置在主掩模和晶片上的两对标记的照明之后产生的电源电压增量。