Abstract:
An electronic apparatus for the mass production of masks for integrated circuits, comprises a master mask arranged in an evacuated chamber. In response to diffuse ultra-violet radiation, it emits from its transparent areas electrons which are focussed by uniform electric and magnetic fields which are parallel to one another. The master mask is positioned in relation to the wafer being printed, by means of piezoelectric elements which receive supply voltage increments produced following the illumination of two pairs of markers respectively arranged on the master mask and the wafer.
Abstract:
A system is capable on the basis of data produced by a data processing machine of generating signals which can be applied to the horizontal and vertical deflection systems of an electronic device capable of producing predetermined traces. Each trace is broken down into elementary figures of three predetermined shapes, rectangle or parallelograms. The beam scans line-by-line, alternately from left to right and right to left, point by point, through each elementary figure, under the control of circuits supplied with the coordinates of a point in each figure, a number corresponding to the number of points to be scanned, the number of lines in each figure and a shape code.