公开(公告)号：US11955360B2

公开(公告)日：2024-04-09

申请号：US17642083

申请日：2020-12-24

Applicant: TOCALO Co., Ltd. ,  HITACHI HIGH-TECH CORPORATION

Inventor： Takeshi Takabatake ,  Tomohiro Nakasuji ,  Akira Itoh ,  Kentaro Seto ,  Yutaka Omoto ,  Hiroho Kitada ,  Kazuumi Tanaka

IPC: H01L21/683 ,  H01J37/32 ,  H01L21/687

CPC classification number: H01L21/6833 ,  H01J37/32715 ,  H01L21/68757

Abstract: A Johnsen-Rahbek force type electrostatic chuck including: a metal substrate; an electrode for electrostatic attraction provided on the metal substrate with an insulating layer interposed between the metal substrate and the electrode for electrostatic attraction; and a dielectric layer constituting an electrostatic attraction surface in contact with a workpiece. The dielectric layer includes a ceramic spray coating and a sealing component with which pores of the ceramic spray coating are filled, and the sealing component contains a metal organic salt containing a rare earth element.

公开(公告)号：US11482435B2

公开(公告)日：2022-10-25

申请号：US16563075

申请日：2019-09-06

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Masatoshi Kawakami ,  Tsutomu Nakamura ,  Hideki Kihara ,  Hiroho Kitada ,  Hidenobu Tanimura ,  Hironori Kusumoto

IPC: H01L21/67 ,  G01J5/08 ,  H01J37/32 ,  G01J5/0875

Abstract: In a plasma processing apparatus, an additional viewing window is disposed between an infrared temperature sensor and a view window, and the additional viewing window is cooled to be retained at room temperature (20° C. to 25° C.), to reduce and to stabilize electromagnetic waves emitted from the viewing window. By correcting the value of the electromagnetic waves, the measurement precision of the temperature monitor is increased and it is possible to measure and to control the dielectric window temperature in a stable state.