公开(公告)号：US20030119333A1

公开(公告)日：2003-06-26

申请号：US10354079

申请日：2003-01-30

申请人： TOKYO ELECTRON LIMITED

发明人： Junichi Kitano ,  Yuji Matsuyama ,  Takahiro Kitano ,  Hidetami Yaegashi

IPC分类号： H01L021/31

CPC分类号： G03F7/168

摘要： The present invention relates to a method for performing coating and developing treatment for a substrate, which comprises the steps of: supplying a coating solution to the substrate to form a coating film on the substrate; performing heat treatment for the substrate on which the coating film is formed; cooling the substrate after the heat treatment; performing exposure processing for the coating film formed on the substrate; and developing the substrate after the exposure processing, and further comprises the step of supplying a treatment gas to form a treatment film on a surface of the coating film after the step of forming the coating film and before the step of performing the; exposure processing for the substrate. According to the present invention, the treatment gas is supplied to form the treatment film on the surface of the coating film after the step of forming the coating film and before the step of exposing the substrate, whereby the substrate can be protected from impurities such as oxygen and water vapor in an atmosphere by this treatment film.

摘要翻译： 本发明涉及对基材进行涂布和显影处理的方法，其特征在于包括以下步骤：向所述基材供给涂布溶液以在所述基材上形成涂膜; 对其上形成有涂膜的基板进行热处理; 热处理后冷却基板; 对形成在基板上的涂膜进行曝光处理; 并且在曝光处理之后显影衬底，并且还包括在形成涂膜的步骤之后和在执行步骤之前，在涂膜的表面上提供处理气体以形成处理膜的步骤; 底物的曝光处理。 根据本发明，在形成涂膜的步骤之后和暴露基板的步骤之前，供给处理气体以在涂膜的表面上形成处理膜，从而可以保护基板免受杂质如 通过该处理膜在大气中的氧气和水蒸汽。

公开(公告)号：US20030079687A1

公开(公告)日：2003-05-01

申请号：US10309273

申请日：2002-12-04

申请人： TOKYO ELECTRON LIMITED

发明人： Junichi Kitano ,  Yuji Matsuyama ,  Takahiro Kitano ,  Hidetami Yaegashi

IPC分类号： C23C016/00

CPC分类号： G03F7/168

摘要： The present invention relates to a method for performing coating and developing treatment for a substrate, which comprises the steps of: supplying a coating solution to the substrate to form a coating film on the substrate; performing heat treatment for the substrate on which the coating film is formed; cooling the substrate after the heat treatment; performing exposure processing for the coating film formed on the substrate; and developing the substrate after the exposure processing, and further comprises the step of supplying a treatment gas to form a treatment film on a surface of the coating film after the step of forming the coating film and before the step of performing the exposure processing for the substrate. According to the present invention, the treatment gas is supplied to form the treatment film on the surface of the coating film after the step of forming the coating film and before the step of exposing the substrate, whereby the substrate can be protected from impurities such as oxygen and water vapor in an atmosphere by this treatment film.

公开(公告)号：US20020006737A1

公开(公告)日：2002-01-17

申请号：US09851134

申请日：2001-05-09

申请人： TOKYO ELECTRON LIMITED

发明人： Junichi Kitano ,  Yuji Matsuyama ,  Takahiro Kitano ,  Hidetami Yaegashi

IPC分类号： H01L021/31 ,  H01L021/469

CPC分类号： G03F7/168

摘要： The present invention relates to a method for performing coating and developing treatment for a substrate, which comprises the steps of: supplying a coating solution to the substrate to form a coating film on the substrate; performing heat treatment for the substrate on which the coating film is formed; cooling the substrate after the heat treatment; performing exposure processing for the coating film formed on the substrate; and developing the substrate after the exposure processing, and further comprises the step of supplying a treatment gas to form a treatment film on a surface of the coating film after the step of forming the coating film and before the step of performing the exposure processing for the substrate. According to the present invention, the treatment gas is supplied to form the treatment film on the surface of the coating film after the step of forming the coating film and before the step of exposing the substrate, whereby the substrate can be protected from impurities such as oxygen and water vapor in an atmosphere by this treatment film.

摘要翻译： 本发明涉及对基材进行涂布和显影处理的方法，其特征在于包括以下步骤：向所述基材供给涂布溶液以在所述基材上形成涂膜; 对其上形成有涂膜的基板进行热处理; 热处理后冷却基板; 对形成在基板上的涂膜进行曝光处理; 并且在曝光处理之后显影衬底，并且还包括在形成涂膜的步骤之后并且在进行曝光处理的步骤之前，在涂膜的表面上提供处理气体以形成处理膜的步骤 基质。 根据本发明，在形成涂膜的步骤之后和暴露基板的步骤之前，供给处理气体以在涂膜的表面上形成处理膜，从而可以保护基板免受杂质如 通过该处理膜在大气中的氧气和水蒸汽。