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公开(公告)号：US20240162076A1
公开(公告)日：2024-05-16
申请号：US18549177
申请日：2022-02-28
发明人： Kiyoshi MORI
IPC分类号： H01L21/687 , G05B19/4155
CPC分类号： H01L21/68764 , G05B19/4155 , G05B2219/50156
摘要： A vacuum processing apparatus includes: a processing container having top and bottom walls, a sidewall, and an interior that is kept in a vacuum atmosphere; a stage provided inside the processing container to hold a substrate placed on the stage so as to face the top wall; a support member penetrating the bottom wall to support the stage from below; a tilt changer provided at an end portion of the support member located outside the processing container to change a tilt of the stage relative to the top wall; at least one distance meter configured to measure a distance between the top wall and the stage at a measurement position on a surface of the top wall facing the stage; and a controller that controls the tilt changer to make the top wall and the stage parallel to each other based on the distance between the top wall and the stage.
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公开(公告)号：US20160340634A1
公开(公告)日：2016-11-24
申请号：US15228210
申请日：2016-08-04
发明人： Kiyoshi MORI
摘要： A culturing device includes an incubator part. The incubator part includes an internal housing, a mounting part installed within the internal housing and configured to mount thereon a container which stores cells, a plurality of heating parts installed within the internal housing and disposed in a symmetrical relationship with respect to an axis of rotational symmetry extending in an up-down direction, a gas circulation part installed in an upper central position within the internal housing and configured to draw a gas existing within the internal housing and to discharge the gas thus drawn; and a diffusion member configured to diffuse the gas discharged from the gas circulation part within the internal housing in a symmetrical relationship with respect to the axis of rotational symmetry.
摘要翻译： 培养装置包括培养箱部分。 培养箱部分包括内部壳体，安装部分安装在内部壳体内并且构造成在其上安装储存细胞的容器，多个加热部件安装在内部壳体内并且相对于旋转轴线对称地设置 对称性在上下方向上延伸，气体循环部件安装在内部壳体内的上部中心位置，并且构造成抽吸存在于内部壳体内的气体并排出如此拉出的气体; 以及扩散构件，其被构造成以相对于所述旋转对称轴线对称的关系将从所述内部壳体内的所述气体循环部排出的气体扩散。
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公开(公告)号：US20240242988A1
公开(公告)日：2024-07-18
申请号：US18404980
申请日：2024-01-05
发明人： Kiyoshi MORI
IPC分类号： H01L21/67 , H01L21/687
CPC分类号： H01L21/67259 , H01L21/68707
摘要： A processing apparatus includes: a processing container having a plurality of processing spaces formed in the processing container; a rotary arm including a rotational shaft located at a central portion of the processing container and a plurality of end effectors configured to rotate around the rotational shaft and to hold a plurality of wafers which is equal in number to the plurality of processing spaces; and a sensor configured to detect positions of the plurality of end effectors. Among the plurality of end effectors, at least one end effector at a position corresponding to the sensor has a different shape from shapes of other end effectors at the position corresponding to the sensor.
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公开(公告)号：US20230207376A1
公开(公告)日：2023-06-29
申请号：US18145885
申请日：2022-12-23
发明人： Kiyoshi MORI , Haruhiko FURUYA
IPC分类号： H01L21/683 , H01L21/687 , H01L21/677
CPC分类号： H01L21/6838 , H01L21/68764 , H01L21/67742
摘要： A substrate processing method includes: a substrate processing process performing a substrate processing on a substrate in a state in which a stage is tilted by a drive mechanism so that a central axis of the stage, which passes through a center of a mounting surface mounted with the substrate and extends in a direction perpendicular to the mounting surface, forms a first angle other than 0° with respect to a predetermined reference axis of a shower plate, which extends in a vertical direction, while changing a position of the stage by the drive mechanism so that the central axis rotates around the reference axis while maintaining the first angle with respect to the reference axis.
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公开(公告)号：US20220293399A1
公开(公告)日：2022-09-15
申请号：US17689659
申请日：2022-03-08
发明人： Kiyoshi MORI
IPC分类号： H01J37/32
摘要： A substrate processing apparatus includes: a processing container having a plurality of processing spaces formed therein; a substrate stage arranged in each of the plurality of processing spaces; a rotary arm including at least one end effector capable of holding a substrate and having a rotation axis located at a position equidistant from the plurality of processing spaces; a sensor provided on a back surface of the at least one end effector of the rotary arm, which is opposite to a substrate holding surface of the at least one end effector; and a rotation mechanism configured to rotate the rotary arm so that the sensor is moved to a position facing the substrate stage or the substrate placed on the substrate stage inside the processing container.
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6.发明公开公开(公告)号：US20240145278A1
公开(公告)日：2024-05-02
申请号：US18384115
申请日：2023-10-26
发明人： Kiyoshi MORI
IPC分类号： H01L21/67 , H01L21/687
CPC分类号： H01L21/67259 , H01L21/68764
摘要： A method of measuring a positional deviation of a substrate stage in a substrate processing apparatus provided rotatably inside a processing container, includes: detecting an initial position of a substrate transferred by an arm that transfers the substrate; placing the substrate on the substrate stage; rotating the substrate by a predetermined rotational angle by rotating the substrate stage; delivering the substrate after rotation from the substrate stage to the arm; detecting a position of the substrate after rotation transferred by the arm; and calculating the positional deviation amount of the substrate stage with respect to the initial position of the substrate based on the initial position of the substrate, the position of the substrate after rotation, and the rotational angle.
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公开(公告)号：US20230128473A1
公开(公告)日：2023-04-27
申请号：US17969923
申请日：2022-10-20
发明人： Kiyoshi MORI , Haruhiko FURUYA
IPC分类号： B23Q1/44
摘要： A method of transporting a workpiece includes steps of: (a) adjusting an inclination of a stage including a placement surface on which the workpiece is to be placed such that the placement surface is inclined with respect to a horizontal plane; (b) receiving the workpiece from a transport apparatus configured to transport the workpiece by raising lift pins provided in the stage, before or after step (a); (c) placing the workpiece on the inclined placement surface by performing at least one of lowering the lift pins and raising the stage; and (d) adjusting the inclination of the stage such that the placement surface on which the workpiece is placed is parallel to the horizontal plane.
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8.发明公开公开(公告)号：US20240194507A1
公开(公告)日：2024-06-13
申请号：US18585466
申请日：2024-02-23
IPC分类号： H01L21/67 , G06N20/00 , H01L21/687
CPC分类号： H01L21/67253 , G06N20/00 , H01L21/67207 , H01L21/67259 , H01L21/68764
摘要： The storage is configured to store model data generated based on data including, in patterns, a processing condition for substrate processing, an attitude of a movable part that affects a processing result of the substrate processing, and the processing result of the substrate processing. The processing controller is configured to use the model data stored in the storage to control the substrate processing, including control of the processing condition for the substrate processing and control of the attitude of the movable part, according to a condition to be satisfied by the processing result of the substrate processing.
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公开(公告)号：US20240141494A1
公开(公告)日：2024-05-02
申请号：US18491848
申请日：2023-10-23
发明人： Kiyoshi MORI
IPC分类号： C23C16/458
CPC分类号： C23C16/4584
摘要： A substrate processing apparatus includes: a processing container; a stage provided inside the processing container to place a substrate; a support member penetrating a through-hole of a bottom portion of the processing container to support the stage from below; a movable member located outside the processing container, connected to an end portion of the support member to move integrally with the stage; a fixed member fixed around the through-hole outside the processing container; and actuators provided in parallel with each other between the fixed member and the movable member to move the movable member and the stage. Each actuator includes a motor and a rod, and expands and contracts the rod by rotation of a rotary shaft of the motor to move the movable member and the stage, and two or more actuators having a predetermined positional relationship are opposite in rotational directions of the rotary shafts of the motors.
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公开(公告)号：US20230203651A1
公开(公告)日：2023-06-29
申请号：US18146569
申请日：2022-12-27
发明人： Kiyoshi MORI , Haruhiko FURUYA
IPC分类号： C23C16/44 , C23C16/455 , C23C16/458
CPC分类号： C23C16/4412 , C23C16/45587 , C23C16/4585
摘要： A substrate processing method includes: exhausting a first space in a processing container by an exhaust mechanism, which is configured to exhaust the first space via a gap by exhausting a second space in the processing container, or configured to exhaust the first space in a state in which a seal gas is caused to flow from the second space to the first space via the gap; and executing the substrate processing on a substrate while causing, by a driving mechanism configured to move a stage, a position of the stage to be changed such that a width of the gap becomes uniform in a time average.
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