公开(公告)号：US20240270919A1

公开(公告)日：2024-08-15

申请号：US18430987

申请日：2024-02-02

Applicant: TOKYO OHKA KOGYO CO., LTD.

Inventor： Takuya NOGUCHI ,  Satoshi AKIYAMA

IPC: C08J9/26 ,  C08J5/18

CPC classification number: C08J9/26 ,  C08J5/18 ,  C08J2201/0442 ,  C08J2377/00

Abstract: Provided are a composition for producing a porous film the composition enabling a decrease in a pore diameter of a produced porous film and improvement of a flow rate through the porous film, a method for producing a porous film, and a porous film. A composition for producing a porous film, the composition comprising at least one resin component (A) selected from a group consisting of polyamide acid, polyimide, a polyamide-imide precursor, polyamide-imide, and polyethersulfone, fine particles (B), and a solvent (S), the fine particles (B) comprising fine particles (B1) and fine particles (B2) having an average particle diameter larger than that of the fine particles (B1), the fine particles (B1) having an average particle diameter of smaller than 100 nm.

公开(公告)号：US20250110406A1

公开(公告)日：2025-04-03

申请号：US18894241

申请日：2024-09-24

Applicant: TOKYO OHKA KOGYO CO., LTD.

Inventor： Takuma KANAMARU ,  Kosuke WATAHIKI ,  Satoshi AKIYAMA

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/075

Abstract: A method of producing a resist composition purified product, the method including a step of filtering a resist composition through a filter having a porous structure in which adjacent spherical cells communicate with each other, in which the filter includes a porous membrane containing at least one resin selected from the group consisting of polyimide and polyamide-imide, the resist composition contains a resin component (A1) whose solubility in a developing solution is changed by an action of an acid and an organic solvent component, and the resin component (A1) contains a copolymer having a constitutional unit (a01) with an onium salt structure that generates sulfonic acid upon light exposure and a constitutional unit (a02) with an onium salt structure that generates a carboxylic acid upon light exposure.