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34 条记录 (耗时 0.029 秒)

    Method of forming resist pattern
    2.
    发明授权
    Method of forming resist pattern 有权

    公开(公告)号：US09690194B2

    公开(公告)日：2017-06-27

    申请号：US14088775

    申请日：2013-11-25

    申请人： Tokyo Ohka Kogyo Co., Ltd.

    发明人： Tsuyoshi Nakamura ,  Takahiro Dazai ,  Masatoshi Arai

    IPC分类号： G03F7/004 ,  G03F7/038

    CPC分类号： G03F7/0382 ,  G03F7/0397 ,  G03F7/325

    摘要： A method of forming a resist pattern using a resist composition containing a base component (A) which exhibits reduced solubility in an organic solvent under action of an acid and an acid-generator component (B) which generates an acid upon exposure, the base component (A) including a resin component (A1) having a structural unit (a0) derived from a compound represented by general formula (a0-1) shown below and a structural unit (a2) containing a lactone-containing cyclic group or the like (in formula (a0-1), Ra1 represents a monovalent substituent having a polymerizable group, La1 represents O, S or a methylene group, R1 represents a linear or branched hydrocarbon group of 2 to 20 carbon atoms which may have a substituent, or a cyclic hydrocarbon group which may have a hetero atom, and n represents an integer of 0 to 5).

    Resist composition, method of forming resist pattern, polymeric compound and compound
    3.
    发明授权
    Resist composition, method of forming resist pattern, polymeric compound and compound 有权

    公开(公告)号：US09606433B2

    公开(公告)日：2017-03-28

    申请号：US13895087

    申请日：2013-05-15

    申请人： Tokyo Ohka Kogyo Co., Ltd.

    发明人： Yoshiyuki Utsumi ,  Masatoshi Arai ,  Takahiro Dazai ,  Yoshitaka Komuro

    IPC分类号： G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/004 ,  G03F7/0045 ,  G03F7/0397

    摘要： There is provided a resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution by the action of acid, including a base component (A) which exhibits changed solubility in a developing solution by the action of acid, wherein the base component (A) contains a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0) shown below. In the formula, A″ represents an oxygen atom, a sulfur atom or an alkylene group of 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom; R1 represents a lactone-containing cyclic group, an —SO2— containing cyclic group or a carbonate-containing cyclic group; and W2 represents a group which is formed by polymerization reaction of a group containing a polymerizable group.

    Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern
    4.
    发明授权
    Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern 有权
    含有相分离结构的结构的制造方法，形成图案的方法和形成精细图案的方法

    公开(公告)号：US09206307B2

    公开(公告)日：2015-12-08

    申请号：US14447376

    申请日：2014-07-30

    申请人： Tokyo Ohka Kogyo Co., Ltd.

    发明人： Tasuku Matsumiya ,  Takehiro Seshimo ,  Ken Miyagi ,  Takaya Maehashi ,  Takahiro Dazai ,  Yoshiyuki Utsumi

    IPC分类号： B05D3/10 ,  B44C1/22 ,  C08L53/00 ,  B82B3/00 ,  C09D153/00 ,  B05D1/18

    CPC分类号： C08L53/00 ,  B05D1/185 ,  B81C1/00031 ,  B81C2201/0149 ,  B82B3/00 ,  C09D153/00

    摘要： A method of producing a structure containing a phase-separated structure, including: forming a layer including a neutralization film on a substrate; forming a layer containing a block copolymer on the layer including the neutralization film, the PA block and PB block being mutually bonded in the block copolymer, and the PB block including a structural unit other than a structural unit constituting the PA block; and subjecting the layer containing the block copolymer to an annealing treatment, such that, in the case where a surface free energy of the PA block, a surface free energy of the PB block and a surface free energy of the neutralization film are represented by a coordinate point A of the PA block, a coordinate point B of the PB block and a coordinate point N of the neutralization film, respectively in the plane of coordinates, the coordinate point N of the neutralization film is within the predetermined range.

    摘要翻译： 一种制造包含相分离结构的结构的方法，包括：在基板上形成包含中和膜的层; 在包含中和膜的层上形成包含嵌段共聚物的层，PA嵌段和PB嵌段相互结合在嵌段共聚物中，PB组分包括构成PA嵌段的结构单元以外的结构单元; 并使含有嵌段共聚物的层进行退火处理，使得在PA嵌段的表面自由能，PB嵌段的表面自由能和中和膜的表面自由能由 PA块的坐标点A，PB块的坐标点B和中和膜的坐标点N分别在坐标平面中，中和膜的坐标点N在预定范围内。

    METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE AND METHOD OF FORMING TOP COAT FILM
    5.
    发明申请
    METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE AND METHOD OF FORMING TOP COAT FILM 有权
    生产包含相分离结构的结构的方法和形成顶层薄膜的方法

    公开(公告)号：US20150291832A1

    公开(公告)日：2015-10-15

    申请号：US14674515

    申请日：2015-03-31

    申请人： Tokyo Ohka Kogyo Co., Ltd.

    发明人： Takehiro Seshimo ,  Takaya Maehashi ,  Takahiro Dazai ,  Yoshiyuki Utsumi

    IPC分类号： C09D153/00

    CPC分类号： C09D153/00 ,  B82Y40/00 ,  C09D183/00 ,  G03F7/0002 ,  G03F7/11

    摘要： A method of producing a structure containing a phase-separated structure, including forming a layer containing a block copolymer on a substrate; applying a top coat material to the layer containing the block copolymer to form a top coat film; and subjecting the layer including the block copolymer having the top coat film formed thereon to annealing treatment so as to conduct a phase separation of the layer, the top coat material including an organic solvent component and a polymeric compound containing a structural unit having either a dicarboxylic acid or a salt of a dicarboxylic acid, and the organic solvent component containing water and an alcohol having 3 or more carbon atoms.

    摘要翻译： 一种制备包含相分离结构的结构的方法，包括在基材上形成含有嵌段共聚物的层; 将面漆材料涂布在含有嵌段共聚物的层上以形成顶涂膜; 对包含形成在其上的顶涂层的嵌段共聚物层进行退火处理，以使层的相分离，包括有机溶剂组分的顶涂层材料和含有具有二羧酸的结构单元的高分子化合物 酸或二羧酸的盐，以及含有水和具有3个或更多个碳原子的醇的有机溶剂组分。

    UNDERCOAT AGENT AND METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE
    7.
    发明申请
    UNDERCOAT AGENT AND METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE 有权
    UNDERCOAT代理和生产包含相分离结构的结构的方法

    公开(公告)号：US20150030773A1

    公开(公告)日：2015-01-29

    申请号：US14324493

    申请日：2014-07-07

    申请人： Tokyo Ohka Kogyo Co., Ltd.

    发明人： Takehiro Seshimo ,  Tasuku Matsumiya ,  Takaya Maehashi ,  Takahiro Dazai ,  Yoshiyuki Utsumi

    IPC分类号： C09D133/12 ,  B05D3/00 ,  C09D125/14 ,  B05D1/00 ,  C09D125/08 ,  C09D125/16

    CPC分类号： C09D133/12 ,  C08F212/08 ,  C08F230/08 ,  C09D125/14 ,  C09D125/16 ,  C09D153/02 ,  C08F220/14 ,  C08F220/06 ,  C08F212/12

    摘要： An undercoat agent used for phase separating a layer containing a block copolymer having a block of a structural unit derived from an (α-substituted) acrylate ester on a substrate, and which contains a resin component including a structural unit represented by formula (ba0-1), and/or a structural unit represented by formula (ba0-2), and a structural unit (ba0-3) having a substrate interacting group, wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R1 and R2 represent a halogen atom or an organic group of 1 to 20 carbon atoms which may contain an oxygen atom, a halogen atom, or a silicon atom, and n is 1 to 5.

    摘要翻译： 一种底涂剂，用于在基材上相分离含有由（α-取代）丙烯酸酯衍生的结构单元的嵌段的嵌段共聚物的层，并含有包含由式（ba0- 1）和/或由式（ba0-2）表示的结构单元和具有底物相互作用基团的结构单元（ba0-3），其中R表示氢原子，1至5个碳原子的烷基或 1至5个碳原子的卤代烷基，R 1和R 2表示可以含有氧原子，卤素原子或硅原子的卤素原子或1-20个碳原子的有机基团，n为1至5 。

    METHOD OF FORMING POLYMERIC COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
    8.
    发明申请
    METHOD OF FORMING POLYMERIC COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
    形成聚合物的方法，耐蚀组合物和形成耐蚀图案的方法

    公开(公告)号：US20130137049A1

    公开(公告)日：2013-05-30

    申请号：US13683263

    申请日：2012-11-21

    申请人： Tokyo Ohka Kogyo Co., Ltd.

    发明人： Daiju Shiono ,  Tomoyuki Hirano ,  Takahiro Dazai

    IPC分类号： G03F7/004

    CPC分类号： G03F7/004 ,  C08F28/06 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041

    摘要： A method of producing a polymeric compound, including: copolymerizing a monomer containing an —SO2— containing cyclic group with a monomer containing an acid decomposable group which exhibits increased polarity by the action of acid, thereby obtaining the polymeric compound, provided that the polymeric compound comprises no structural unit derived from a monomer that generates acid upon exposure, wherein the copolymerizing is conducted in the presence of 0.001 to 1.0 mol % of a basic compound, based on the monomer containing an —SO2— containing cyclic group.

    摘要翻译： 一种高分子化合物的制造方法，其特征在于，含有含-SO 2 - 的环状基团的单体与含有酸分解基团的单体共聚，所述单酸可通过酸作用而显示出极性增加，得到高分子化合物 不包含衍生自暴露时产生酸的单体的结构单元，其中基于含有-SO 2 - 的环状基团的单体，在0.001〜1.0摩尔％的碱性化合物的存在下进行共聚。