专利检索 ap:("TOKYO OHKA KOGYO CO., LTD." OR "NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY") AND inv:"Shunma Tanaka" 第 1 页

1.

发明授权
Resin composition for forming phase-separated structure, method for producing structure including phase-separated structure, and block copolymer 有权

公开(公告)号：US11780948B2

公开(公告)日：2023-10-10

申请号：US17152258

申请日：2021-01-19

申请人： TOKYO OHKA KOGYO CO., LTD. , NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY

发明人： Ken Miyagi , Takahiro Dazai , Toshifumi Satoh , Takuya Isono , Shunma Tanaka

IPC分类号： B05D3/02 , C08F299/02 , C08L33/12 , C08L25/08 , G03F7/00 , C08F212/08 , C08L53/00

CPC分类号： C08F299/024 , B05D3/0254 , C08F212/08 , C08L25/08 , C08L33/12 , C08L53/00 , G03F7/0002

摘要： A resin composition for forming a phase-separated structure includes a block copolymer having a block (b1) formed of a repeating structure of styrene units, the block (b1) being partially substituted with a constituent unit represented by the following General Formula (c1) and a block (b2) having a repeating structure of methyl methacrylate units. In the formula, R is a hydrogen atom or a methyl group and Rc0 is a hydrophobic functional group