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公开(公告)号:US20230365768A1
公开(公告)日:2023-11-16
申请号:US18222691
申请日:2023-07-17
Applicant: TOPPAN INC.
Inventor: Seiji TAKIZAWA , Masaki MAEDA
CPC classification number: C08J7/048 , C23C16/407 , C08J7/0423 , C09D133/08 , C09D7/61 , C09D7/63 , C09D7/20 , C08J2323/00 , C08J2333/08
Abstract: A coating liquid for producing a gas barrier laminate, the coating liquid containing a carboxyl group-containing polymer (a), polyvalent metal-containing particles (b), a surfactant (c), a specific silicon-containing compound (d), and an organic solvent (e). In the coating liquid: the equivalence ratio (bt/at) of the product (bt) of the number of moles and the valency of the polyvalent metal contained in the polyvalent metal-containing particles (b) relative to the number of moles (at) of carboxyl groups contained in the carboxyl group-containing polymer (a) is 0.45 or more and 0.9 or less; and the molar ratio (dt/at) of the number of moles (dt) of the silicon-containing compound (d) relative to the number of moles (at) of the carboxyl groups is 0.7% or more and 7.5% or less.
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公开(公告)号:US20230048009A1
公开(公告)日:2023-02-16
申请号:US17964192
申请日:2022-10-12
Applicant: TOPPAN INC.
Inventor: Masaki MAEDA , Tetsuya OKANO
Abstract: Deterioration of gas barrier properties due to sedimentation of aggregates in a coating liquid is decreased or minimized. A coating liquid for producing a gas barrier laminate contains a carboxy group-containing polymer, polyvalent metal-containing particles, a high molecular weight dispersant with an acidic group, and an organic solvent, and has a pH in a range of 4 to 6 at 25° C.
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公开(公告)号:US20230303788A1
公开(公告)日:2023-09-28
申请号:US18199343
申请日:2023-05-18
Applicant: TOPPAN INC.
Inventor: Masaki MAEDA
CPC classification number: C08J7/0423 , C08K3/34 , C08K5/541 , C08J7/048 , C08J2333/08
Abstract: A gas barrier laminate including a substrate, an inorganic deposition layer containing an inorganic oxide, and a coating layer, arranged in this order, the coating layer contains a carboxy group-containing polymer (a), polyvalent metal-containing particles (b), a surfactant (c), and a silicon-containing compound (d), the silicon-containing compound (d) is at least one selected from the group consisting of a silane coupling agent having certain structures, hydrolysates thereof, and condensates thereof, a molar ratio (dt)/(at) represented by [the number of moles (dt) of the silicon-containing compound (d)/the number of moles (at) of carboxy groups of the carboxy group-containing polymer (a)] is 0.15% or more and 6.10% or less, and the coating layer has a film thickness of 230 nm or more and 600 nm or less, with (d) in the molar ratio (d)/(a) is the mass of the silicon-containing compound (d) converted into an equivalent mass of the silane coupling agent.
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公开(公告)号:US20230115899A1
公开(公告)日:2023-04-13
申请号:US18080895
申请日:2022-12-14
Applicant: TOPPAN INC.
Inventor: Tetsuya OKANO , Masaki MAEDA
IPC: C09D133/02
Abstract: A gas barrier laminate in which separation between a coating layer having gas barrier properties and a layer adjacent to the coating layer is less likely to occur. A coating solution for producing a gas barrier laminate contains a carboxyl group-containing polymer (A), polyvalent metal-containing particles (B), a surfactant (C), an organic solvent (D), and at least one silicon-containing compound (E) selected from the group consisting of a silane coupling agent represented by the following general formula (1), a silane coupling agent represented by the following general formula (2), hydrolysates thereof, and condensates thereof, wherein the mass ratio of the silicon-containing compound (E) to the carboxyl group-containing polymer (A) is 0.5% or more. Si(OR1)3Z1 . . . (1); Si(R2)(OR3)2Z2 . . . (2). (R1 and R3 are alkyl groups having 1 to 6 carbon atoms, R2 is a methyl group, and Z1 and Z2 are a group containing an epoxy group.)
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