公开(公告)号：US20220221784A1

公开(公告)日：2022-07-14

申请号：US17615083

申请日：2020-05-28

Applicant: TOPPAN INC.

Inventor： Ayumi GODA ,  Norihito FUKUGAMI

IPC: G03F1/24 ,  G03F1/54

Abstract: There are provided a reflective photomask blank and a reflective photomask, which are compatibly capable of suppressing a shadowing effect and improving the life of a mask. A reflective photomask blank (10) includes a substrate (1), a reflection part (7) provided on the substrate (1) and configured to reflect incident light, and a low reflection part (8) provided on the reflection part (7) and configured to absorb incident light. The low reflection part (8) has a multi layer structure of at least two layers or more layers. An outermost layer (5) of the low reflection part (8) has a refractive index n equal to or more than 0.90 and an extinction coefficient k equal to or less than 0.02 with respect to extreme ultraviolet (EUV) light (where a wavelength is 13.5 nm).

公开(公告)号：US20240165609A1

公开(公告)日：2024-05-23

申请号：US18425328

申请日：2024-01-29

Applicant: TOPPAN Inc.

Inventor： Hidemitsu HAKII ,  Norihito FUKUGAMI

IPC: B01L3/00

CPC classification number: B01L3/502707 ,  B01L3/502723 ,  B01L2200/12 ,  B01L2300/048 ,  B01L2300/123 ,  B01L2300/161

Abstract: A microfluidic chip includes a substrate, a partition layer including a resin material and provided on the substrate to form a channel, and a cover layer provided on the surface of the partition layer facing away from the substrate, where the partition layer has an elastic modulus in the range of 1 MPa or more and 10 GPa or less.