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公开(公告)号：US09285672B2
公开(公告)日：2016-03-15
申请号：US14187885
申请日：2014-02-24
Applicant: TOPPAN PRINTING CO., LTD.
Inventor： Norihito Fukugami , Yo Sakata , Kazuaki Matsui , Genta Watanabe
Abstract: A reflective mask having a light-shielding frame with high light-shielding performance, and a method for manufacturing thereof. In a reflective mask having a light-shielding frame dug into a multilayered reflective layer, when side etching is performed or processing to obtain a reverse tapered shape is performed only on the multilayered reflective layer, it becomes possible to suppress reflection of EUV light (extreme ultraviolet light) in the vicinity of the edge of the light-shielding frame, provide a reflective mask having high light-shielding ability, and form a transcription pattern with high accuracy.
Abstract translation: 具有遮光性能好的遮光框的反射罩及其制造方法。 在具有被切割成多层反射层的遮光框的反射掩模中，当进行侧面蚀刻时，仅在多层反射层上进行反转锥形形状的处理，可以抑制EUV光的反射（极端 紫外光）在遮光框的边缘附近，提供了具有高遮光能力的反射掩模，并且以高精度形成转录图案。
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公开(公告)号：US20140170536A1
公开(公告)日：2014-06-19
申请号：US14187885
申请日：2014-02-24
Applicant: TOPPAN PRINTING CO., LTD.
Inventor： Norihito Fukugami , Yo Sakata , Kazuaki Matsui , Genta Watanabe
IPC: G03F1/24
Abstract: A reflective mask having a light-shielding frame with high light-shielding performance, and a method for manufacturing thereof. In a reflective mask having a light-shielding frame dug into a multilayered reflective layer, when side etching is performed or processing to obtain a reverse tapered shape is performed only on the multilayered reflective layer, it becomes possible to suppress reflection of EUV light (extreme ultraviolet light) in the vicinity of the edge of the light-shielding frame, provide a reflective mask having high light-shielding ability, and form a transcription pattern with high accuracy.
Abstract translation: 具有遮光性能好的遮光框的反射罩及其制造方法。 在具有被切割成多层反射层的遮光框的反射掩模中，当进行侧面蚀刻时，仅在多层反射层上进行反转锥形形状的处理，可以抑制EUV光的反射（极端 紫外光）在遮光框的边缘附近，提供了具有高遮光能力的反射掩模，并且以高精度形成转录图案。
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