公开(公告)号：US20140212795A1

公开(公告)日：2014-07-31

申请号：US14227705

申请日：2014-03-27

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Masahito TANABE ,  Norihito Fukugami ,  Yo Sakata ,  Tooru Komizo ,  Takashi Haraguchi

IPC: G03F1/24

CPC classification number: G03F1/24 ,  G03F1/146 ,  G03F1/38

Abstract: A reflective mask blank, a reflective mask, and methods for manufacturing those, which suppress reflectance at a light-shielding frame. The reflective mask includes a substrate, a multilayered reflective layer formed on the substrate, an absorption layer formed on the multilayered reflective layer, and a frame-shaped light-shielding frame area at which the absorption layer has a film thickness larger than a film thickness at other areas. The multilayered reflective layer is diffused and mixed at the light-shielding frame area through melting.

Abstract translation: 反射型掩模坯料，反射型掩模，以及抑制遮光框的反射率的制造方法。 反射掩模包括基板，形成在基板上的多层反射层，形成在多层反射层上的吸收层和吸收层的膜厚大于膜厚的框状遮光框区域 在其他地区。 多层反射层通过熔化在遮光框架区域扩散混合。