CVD APPARATUS, METHOD OF MANUFACTURING SUSCEPTOR USING THE CVD APPARATUS, AND SUSCEPTOR
    1.
    发明申请
    CVD APPARATUS, METHOD OF MANUFACTURING SUSCEPTOR USING THE CVD APPARATUS, AND SUSCEPTOR 审中-公开
    CVD装置,使用CVD装置制造SUSCEPTOR的方法和SUSCEPTOR

    公开(公告)号:US20140245956A1

    公开(公告)日:2014-09-04

    申请号:US14351003

    申请日:2012-10-12

    Abstract: A masking portion (recessed portion) 20 is provided at the center of a rear surface of a carbonaceous substrate 10. The masking portion 20 includes a first bore portion 20a and a second bore portion 20b. The first bore portion 20a has an inner wall in which a female screw portion 21 is formed. A male screw portion 7a of a masking jig 7 is screw-fitted to the female screw portion 21. The masking jig 7 is fixed to a film forming jig 2. The carbonaceous substrate is thus supported in a standing posture, and the carbonaceous substrate is provided, on a surface, with a firm such as a SiC film or a TaC film except for the recessed portion by introducing gas into the apparatus in this supported state.

    Abstract translation: 掩模部分(凹部)20设置在碳质基材10的后表面的中心。掩模部分20包括第一孔部分20a和第二孔部分20b。 第一孔部20a具有形成有内螺纹部21的内壁。 掩模夹具7的外螺纹部分7a螺纹配合到阴螺纹部分21.掩模夹具7固定在成膜夹具2上。因此,碳质基底以站立姿态被支撑,碳质基底是 在该支撑状态下,通过将气体引入到装置中,在表面上提供除了凹部之外的诸如SiC膜或TaC膜之类的公司。

Patent Agency Ranking