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    Contamination control system and air-conditioning system of a substrate processing apparatus using the same
    1.
    发明授权
    Contamination control system and air-conditioning system of a substrate processing apparatus using the same 失效
    使用其的基板处理装置的污染控制系统和空调系统

    公开(公告)号：US07326284B2

    公开(公告)日：2008-02-05

    申请号：US10883584

    申请日：2004-07-01

    申请人： Tae-Jin Hwang ,  Jae-Hyun Yang ,  Jung-Sung Hwang ,  Hyun-Joon Kim ,  Yo-Han Ahn

    发明人： Tae-Jin Hwang ,  Jae-Hyun Yang ,  Jung-Sung Hwang ,  Hyun-Joon Kim ,  Yo-Han Ahn

    IPC分类号： B01D47/00

    CPC分类号： F24F3/161 ,  B01D53/14 ,  B01D53/78 ,  B01D2255/802 ,  B01D2257/106 ,  B01D2257/302 ,  B01D2257/404 ,  B01D2257/406 ,  B01D2257/70 ,  F24F2003/1617 ,  F24F2006/006 ,  Y02A50/21

    摘要： An air-conditioning system of a substrate processing apparatus includes an air inlet line for providing air to a clean room. A contamination control apparatus for removing contaminants in the air is connected to the air inlet line. A controller controls temperature and humidity of the air without the contaminants. An air outlet line provides the air having the controlled temperature and humidity to a substrate processing chamber that is disposed in the clean room. The contamination control apparatus includes a spray unit having at least one nozzle that sprays water. At least one eliminator that traps the water for capturing contaminants in the air and drops the trapped water into a tank. A water circulation unit provides the water that includes an additive for controlling pH of the water to the spray unit.

    摘要翻译： 基板处理装置的空调系统包括用于向洁净室提供空气的进气管线。 用于除去空气中的污染物的污染控制装置连接到进气管线。 控制器控制空气的温度和湿度，没有污染物。 空气出口管路将具有受控温度和湿度的空气提供给设置在洁净室中的基板处理室。 污染控制装置包括具有喷射水的至少一个喷嘴的喷射单元。 至少一个消除器捕获水以捕获空气中的污染物并将被捕获的水滴入罐中。 水循环单元提供包括用于控制喷雾单元的水的pH的添加剂的水。

    Device for cleaning reticle box
    3.
    发明申请
    Device for cleaning reticle box 审中-公开
    用于清洁标线盒的装置

    公开(公告)号：US20050091781A1

    公开(公告)日：2005-05-05

    申请号：US10980020

    申请日：2004-11-03

    申请人： Jae-Hyun Yang ,  Yo-Han Ahn ,  Tae-Jin Hwang

    发明人： Jae-Hyun Yang ,  Yo-Han Ahn ,  Tae-Jin Hwang

    IPC分类号： H01L21/027 ,  B08B5/00 ,  B08B5/02 ,  B08B11/00 ,  G03F7/20

    CPC分类号： G03F1/66 ,  B08B5/00 ,  B08B5/02 ,  G03F7/70741 ,  G03F7/70933

    摘要： The present invention relates to a reticule storage device. After the reticule storage device influxes external airs using a motor and a fan, it provides the external airs filtered by a filter to a reticule storage shelf in a chamber. According to the present invention, a nitrogen gas supply pipe is installed on one end of the chamber. In addition, the nitrogen gas supplier is installed to be connected from the nitrogen gas supplier to the reticule storage shelf. Several nitrogen gas supply nozzles are installed on an end portion of the nitrogen gas supply pipe, so that nitrogen gas is supplied to maintain a regular pressure in the chamber when a motor inflowing external airs is stopped. As a result, in case that an apparatus is stopped due to a problem of the apparatus for many hours, or an external voltage is not supplied due to a problem of the external problem, nitrogen gases may be purged in the apparatus. Accordingly, the purity in the apparatus can be maintained, so that it is possible to prevent a reticule kept in the apparatus from a particle contamination.

    摘要翻译： 本发明涉及网状存储装置。 在网状存储装置使用马达和风扇冲入外部空气之后，它将由过滤器过滤的外部空气提供到腔室中的网状物存放架。 根据本发明，氮气供给管安装在室的一端。 此外，氮气供应器安装成从氮气供应器连接到网状物存放架。 在氮气供给管的端部安装有若干个氮气供给喷嘴，在电动机流入外部空气停止时，供给氮气来维持室内的规定的压力。 结果，由于设备由于该设备的问题停止了许多小时，或由于外部问题而不提供外部电压的情况，在设备中可以清除氮气。 因此，可以保持装置中的纯度，使得可以防止保持在装置中的网状物免受颗粒污染。

    Heat treatment equipment
    4.
    发明授权
    Heat treatment equipment 有权
    热处理设备

    公开(公告)号：US07850449B2

    公开(公告)日：2010-12-14

    申请号：US11775640

    申请日：2007-07-10

    申请人： Jae-Hyun Yang ,  Yo-Han Ahn ,  Kun-Hyung Lee ,  Gui-Young Cho ,  Hong-Hee Jeong ,  Mi-Ae Kim

    发明人： Jae-Hyun Yang ,  Yo-Han Ahn ,  Kun-Hyung Lee ,  Gui-Young Cho ,  Hong-Hee Jeong ,  Mi-Ae Kim

    IPC分类号： F27B5/00 ,  F27B5/10

    CPC分类号： F27B17/0025 ,  H01L21/67109 ,  H01L21/67253

    摘要： In an embodiment, heat treatment equipment comprises a process tube, an exhaust duct connected to the process tube, and, during operation, exhausting gases present within the process tube. The heat treatment equipment also comprises a hollow pressure control member interposed between the process tube and the exhaust duct, the pressure control member being operatively connected to the process tube and the exhaust duct respectively, and including one or a number of openings. Negative pressure is avoided in the process tube during heat treatment processes so that unwanted gas and impurities cannot enter the process tube from outside.

    摘要翻译： 在一个实施例中，热处理设备包括处理管，连接到处理管的排气管道，以及在操作期间排出存在于处理管内的气体。 热处理设备还包括插入处理管和排气管之间的中空压力控制构件，压力控制构件分别可操作地连接到处理管和排气管，并且包括一个或多个开口。 在热处理过程中，在处理管中避免负压，使得不需要的气体和杂质不能从外部进入工艺管。

    Grating and clean room system comprising the same
    5.
    发明申请
    Grating and clean room system comprising the same 审中-公开
    包括它的光栅和洁净室系统

    公开(公告)号：US20060003684A1

    公开(公告)日：2006-01-05

    申请号：US11143589

    申请日：2005-06-03

    申请人： Jung-Sung Hwang ,  Chang-Min Cho ,  Jae-Hyun Yang ,  Sang-Mun Chon ,  Jae-Bong Kim

    发明人： Jung-Sung Hwang ,  Chang-Min Cho ,  Jae-Hyun Yang ,  Sang-Mun Chon ,  Jae-Bong Kim

    IPC分类号： F24F7/007

    CPC分类号： F24F13/068 ,  F24F3/161

    摘要： Grating forming the floor of a clean room minimizes turbulence and enhances the rate at which air is discharged therethrough. The grate includes a base plate having a plurality of through-holes. Each of the through-holes includes a receiving portion through which the air is received and an exhausting portion through which the air is exhausted. The cross-sectional area of the receiving decreases toward the exhausting portion, and the cross-sectional area of the exhausting portion decreases toward the receiving portion.

    摘要翻译： 形成洁净室的地板的光栅使湍流最小化，并提高空气通过其排出的速率。 格栅包括具有多个通孔的基板。 每个通孔包括容纳空气的容纳部分和空气排出的排气部分。 接收部的截面积朝向排气部减小，排气部的截面积朝向接收部减小。