公开(公告)号：US07850449B2

公开(公告)日：2010-12-14

申请号：US11775640

申请日：2007-07-10

申请人： Jae-Hyun Yang ,  Yo-Han Ahn ,  Kun-Hyung Lee ,  Gui-Young Cho ,  Hong-Hee Jeong ,  Mi-Ae Kim

发明人： Jae-Hyun Yang ,  Yo-Han Ahn ,  Kun-Hyung Lee ,  Gui-Young Cho ,  Hong-Hee Jeong ,  Mi-Ae Kim

IPC分类号： F27B5/00 ,  F27B5/10

CPC分类号： F27B17/0025 ,  H01L21/67109 ,  H01L21/67253

摘要： In an embodiment, heat treatment equipment comprises a process tube, an exhaust duct connected to the process tube, and, during operation, exhausting gases present within the process tube. The heat treatment equipment also comprises a hollow pressure control member interposed between the process tube and the exhaust duct, the pressure control member being operatively connected to the process tube and the exhaust duct respectively, and including one or a number of openings. Negative pressure is avoided in the process tube during heat treatment processes so that unwanted gas and impurities cannot enter the process tube from outside.

摘要翻译： 在一个实施例中，热处理设备包括处理管，连接到处理管的排气管道，以及在操作期间排出存在于处理管内的气体。 热处理设备还包括插入处理管和排气管之间的中空压力控制构件，压力控制构件分别可操作地连接到处理管和排气管，并且包括一个或多个开口。 在热处理过程中，在处理管中避免负压，使得不需要的气体和杂质不能从外部进入工艺管。

公开(公告)号：US20050091781A1

公开(公告)日：2005-05-05

申请号：US10980020

申请日：2004-11-03

申请人： Jae-Hyun Yang ,  Yo-Han Ahn ,  Tae-Jin Hwang

发明人： Jae-Hyun Yang ,  Yo-Han Ahn ,  Tae-Jin Hwang

IPC分类号： H01L21/027 ,  B08B5/00 ,  B08B5/02 ,  B08B11/00 ,  G03F7/20

CPC分类号： G03F1/66 ,  B08B5/00 ,  B08B5/02 ,  G03F7/70741 ,  G03F7/70933

摘要： The present invention relates to a reticule storage device. After the reticule storage device influxes external airs using a motor and a fan, it provides the external airs filtered by a filter to a reticule storage shelf in a chamber. According to the present invention, a nitrogen gas supply pipe is installed on one end of the chamber. In addition, the nitrogen gas supplier is installed to be connected from the nitrogen gas supplier to the reticule storage shelf. Several nitrogen gas supply nozzles are installed on an end portion of the nitrogen gas supply pipe, so that nitrogen gas is supplied to maintain a regular pressure in the chamber when a motor inflowing external airs is stopped. As a result, in case that an apparatus is stopped due to a problem of the apparatus for many hours, or an external voltage is not supplied due to a problem of the external problem, nitrogen gases may be purged in the apparatus. Accordingly, the purity in the apparatus can be maintained, so that it is possible to prevent a reticule kept in the apparatus from a particle contamination.

摘要翻译： 本发明涉及网状存储装置。 在网状存储装置使用马达和风扇冲入外部空气之后，它将由过滤器过滤的外部空气提供到腔室中的网状物存放架。 根据本发明，氮气供给管安装在室的一端。 此外，氮气供应器安装成从氮气供应器连接到网状物存放架。 在氮气供给管的端部安装有若干个氮气供给喷嘴，在电动机流入外部空气停止时，供给氮气来维持室内的规定的压力。 结果，由于设备由于该设备的问题停止了许多小时，或由于外部问题而不提供外部电压的情况，在设备中可以清除氮气。 因此，可以保持装置中的纯度，使得可以防止保持在装置中的网状物免受颗粒污染。

公开(公告)号：US07326284B2

公开(公告)日：2008-02-05

申请号：US10883584

申请日：2004-07-01

申请人： Tae-Jin Hwang ,  Jae-Hyun Yang ,  Jung-Sung Hwang ,  Hyun-Joon Kim ,  Yo-Han Ahn

发明人： Tae-Jin Hwang ,  Jae-Hyun Yang ,  Jung-Sung Hwang ,  Hyun-Joon Kim ,  Yo-Han Ahn

IPC分类号： B01D47/00

CPC分类号： F24F3/161 ,  B01D53/14 ,  B01D53/78 ,  B01D2255/802 ,  B01D2257/106 ,  B01D2257/302 ,  B01D2257/404 ,  B01D2257/406 ,  B01D2257/70 ,  F24F2003/1617 ,  F24F2006/006 ,  Y02A50/21

摘要： An air-conditioning system of a substrate processing apparatus includes an air inlet line for providing air to a clean room. A contamination control apparatus for removing contaminants in the air is connected to the air inlet line. A controller controls temperature and humidity of the air without the contaminants. An air outlet line provides the air having the controlled temperature and humidity to a substrate processing chamber that is disposed in the clean room. The contamination control apparatus includes a spray unit having at least one nozzle that sprays water. At least one eliminator that traps the water for capturing contaminants in the air and drops the trapped water into a tank. A water circulation unit provides the water that includes an additive for controlling pH of the water to the spray unit.

摘要翻译： 基板处理装置的空调系统包括用于向洁净室提供空气的进气管线。 用于除去空气中的污染物的污染控制装置连接到进气管线。 控制器控制空气的温度和湿度，没有污染物。 空气出口管路将具有受控温度和湿度的空气提供给设置在洁净室中的基板处理室。 污染控制装置包括具有喷射水的至少一个喷嘴的喷射单元。 至少一个消除器捕获水以捕获空气中的污染物并将被捕获的水滴入罐中。 水循环单元提供包括用于控制喷雾单元的水的pH的添加剂的水。

公开(公告)号：US20050000243A1

公开(公告)日：2005-01-06

申请号：US10883584

申请日：2004-07-01

申请人： Tae-Jin Hwang ,  Jae-Hyun Yang ,  Jung-Sung Hwang ,  Hyun-Joon Kim ,  Yo-Han Ahn

发明人： Tae-Jin Hwang ,  Jae-Hyun Yang ,  Jung-Sung Hwang ,  Hyun-Joon Kim ,  Yo-Han Ahn

IPC分类号： H01L21/02 ,  B01D53/14 ,  B01D53/78 ,  F24F3/16 ,  C10K1/08 ,  F22D1/28 ,  B01D47/00 ,  F02M23/14 ,  F02M31/00 ,  F25D17/04

CPC分类号： F24F3/161 ,  B01D53/14 ,  B01D53/78 ,  B01D2255/802 ,  B01D2257/106 ,  B01D2257/302 ,  B01D2257/404 ,  B01D2257/406 ,  B01D2257/70 ,  F24F2003/1617 ,  F24F2006/006 ,  Y02A50/21

摘要： An air-conditioning system of a substrate processing apparatus includes an air inlet line for providing air to a clean room. A contamination control apparatus for removing contaminants in the air is connected to the air inlet line. A controller controls temperature and humidity of the air without the contaminants. An air outlet line provides the air having the controlled temperature and humidity to a substrate processing chamber that is disposed in the clean room. The contamination control apparatus includes a spray unit having at least one nozzle that sprays water. At least one eliminator that traps the water for capturing contaminants in the air and drops the trapped water into a tank. A water circulation unit provides the water that includes an additive for controlling pH of the water to the spray unit.

摘要翻译： 基板处理装置的空调系统包括用于向洁净室提供空气的进气管线。 用于除去空气中的污染物的污染控制装置连接到进气管线。 控制器控制空气的温度和湿度，没有污染物。 空气出口管路将具有受控温度和湿度的空气提供给设置在洁净室中的基板处理室。 污染控制装置包括具有喷射水的至少一个喷嘴的喷射单元。 至少一个消除器捕获水以捕获空气中的污染物并将被捕获的水滴入罐中。 水循环单元提供包括用于控制喷雾单元的水的pH的添加剂的水。

公开(公告)号：US08027017B2

公开(公告)日：2011-09-27

申请号：US12321102

申请日：2009-01-15

申请人： Ju-A Ryu ,  Jeong-Heung Kong ,  Yang-Koo Lee ,  Hun-Hwan Ha ,  Yo-Han Ahn ,  Hweon Jin ,  Myung-Ki Lee

发明人： Ju-A Ryu ,  Jeong-Heung Kong ,  Yang-Koo Lee ,  Hun-Hwan Ha ,  Yo-Han Ahn ,  Hweon Jin ,  Myung-Ki Lee

IPC分类号： G03B27/52

CPC分类号： B08B1/007 ,  B08B1/04 ,  B08B3/12 ,  H01L21/67028 ,  H01L21/67057

摘要： The present inventive concept provides a substrate treating apparatus and an exposing apparatus that a chuck member, a chuck cleaning member including a cleaning tool removing a foreign substance on a substrate loading surface of the chuck member and a tool cleaning member cleaning a cleaning tool are disposed to be adjacent to each other inside a treating room. The present inventive concept also provides a method of cleaning a cleaning tool using a tool cleaning member. According to the above the apparatuses and the method, contamination of a chuck member by a cleaning tool is prevented and a defocus phenomenon caused by a particle on a chuck member during an exposing process can be minimized.

摘要翻译： 本发明构思提供了一种基板处理装置和曝光装置，其中，卡盘构件，包括清除卡盘构件的基板装载表面上的异物的清洁工具的清洁构件和清洁清洁工具的工具清洁构件 在处理室内彼此相邻。 本发明构思还提供了一种使用工具清洁构件清洁清洁工具的方法。 根据上述装置和方法，可以防止由清洁工具污染卡盘构件，并且可以使在曝光过程中由卡盘构件上的颗粒引起的散焦现象最小化。

公开(公告)号：US07065898B2

公开(公告)日：2006-06-27

申请号：US10763203

申请日：2004-01-26

申请人： Hyun-Joon Kim ,  Yo-Han Ahn ,  Dong-Seok Ham ,  Jae-Bong Kim

发明人： Hyun-Joon Kim ,  Yo-Han Ahn ,  Dong-Seok Ham ,  Jae-Bong Kim

IPC分类号： F26B21/06

CPC分类号： H01L21/67017 ,  H01L21/67772

摘要： A module for transferring a substrate includes a load port for supporting a container to receive a plurality of substrates, a substrate transfer chamber disposed between the load port and a substrate process module, a substrate transfer robot disposed in the substrate transfer chamber for transferring the substrates between the container and the substrate process module, a gas supply unit connected to the substrate transfer chamber for supplying a purge gas into the substrate transfer chamber to purge an interior of the substrate transfer chamber, and a contamination control unit connected to the substrate transfer chamber for circulating the purge gas supplied into the substrate transfer chamber, resupplying the circulated purge gas into the substrate transfer chamber and removing particles and airborne molecular contaminants from the purge gas being circulated. Contamination of a substrate may be prevented and a necessary amount of purge gas may be reduced.

摘要翻译： 用于转印衬底的模块包括用于支撑容器以容纳多个衬底的负载端口，设置在负载端口和衬底处理模块之间的衬底传送室，设置在衬底传送室中用于传送衬底的衬底传送机器人 在所述容器和所述基板处理模块之间，连接到所述基板传送室的气体供应单元，用于将净化气体供应到所述基板传送室中以净化所述基板传送室的内部;以及污染控制单元，连接到所述基板传送室 用于循环供给到基板传送室中的吹扫气体，将循环的净化气体再供给到基板传送室中，并从正在循环的吹扫气体中除去颗粒和空气传播的分子污染物。 可以防止基材的污染，并且可以减少必需量的吹扫气体。

公开(公告)号：US06996453B2

公开(公告)日：2006-02-07

申请号：US10684436

申请日：2003-10-15

申请人： Yo-Han Ahn ,  Ki-Doo Kim ,  Soo-Woong Lee ,  Jung-Sung Hwang ,  Hyeog-Ki Kim

发明人： Yo-Han Ahn ,  Ki-Doo Kim ,  Soo-Woong Lee ,  Jung-Sung Hwang ,  Hyeog-Ki Kim

IPC分类号： G06F7/00

CPC分类号： H01L21/00 ,  H01L21/67017 ,  Y10S414/139

摘要： A substrate processing apparatus for processing substrates prevents the substrates from contaminating as they are transferred. The apparatus includes a container, like a FOUP, for containing substrates, at least one processing chamber where the substrates are processed, a substrate transferring module including a substrate transfer chamber and at least one load port for supporting a container, and a contamination controlling system for the substrate transfer chamber. The contamination controlling system includes a purge gas supply inlet connected to the substrate transfer chamber, and a gas circulating tube for recycling the purging gas to circulate through the chamber. The substrate transfer chamber is purged using the purging gas to remove moisture and contaminating materials from the substrate transfer chamber. The formation of particles on the substrate otherwise caused by a reaction between the moisture and contaminating materials while the substrate is standing by in the container can be prevented.

摘要翻译： 用于处理基板的基板处理装置防止基板在被转印时被污染。 该装置包括用于容纳衬底的容器，如FOUP，用于处理衬底的至少一个处理室，包括衬底传送室的衬底传送模块和用于支撑容器的至少一个负载端口，以及污染控制系统 用于衬底传送室。 污染控制系统包括连接到基板传送室的吹扫气体供给入口和用于使净化气体循环通过室的气体循环管。 使用净化气体清洗基板传送室，以从基板传送室去除水分和污染材料。 可以防止在衬底上的颗粒在容器中待机时由水分和污染物质之间的反应引起的颗粒的形成。

公开(公告)号：US07914594B2

公开(公告)日：2011-03-29

申请号：US12180289

申请日：2008-07-25

申请人： Chang-Min Cho ,  Joo-Young Kim ,  Ji-Young Kim ,  Ju-A Ryu ,  Yo-Han Ahn ,  Hyung-Seok Choi ,  Dong-Seok Ham

发明人： Chang-Min Cho ,  Joo-Young Kim ,  Ji-Young Kim ,  Ju-A Ryu ,  Yo-Han Ahn ,  Hyung-Seok Choi ,  Dong-Seok Ham

IPC分类号： B01D46/00

CPC分类号： B01D46/0058 ,  B01D46/002 ,  B01D46/24 ,  B01D46/4272 ,  Y10S55/31

摘要： An air filtering device and an air cleaning system of a semiconductor manufacturing apparatus to reduce cost and increase manufacturing productivity. The air filtering device may include a frame having an open aperture coupled to an air supply line. A buffer frame configured to be inserted into the frame may include a plurality of slot parts, each slot part having a plurality of air in/out apertures through which air may flow in or out from the buffer frame. A plurality of filters may be releasably fastened to the plurality of slot parts to filter pollution material contained in air flowing through the air in/out apertures. An air interrupter for interrupting air flowing through the air in/out apertures may be used when replacing the plurality of filters, thereby providing purified air to the semiconductor manufacturing apparatus during the replacement.

摘要翻译： 一种半导体制造装置的空气过滤装置和空气净化系统，以降低成本并提高制造生产率。 空气过滤装置可以包括具有联接到空气供应管线的开口孔的框架。 被构造成插入到框架中的缓冲框架可以包括多个狭槽部分，每个狭槽部分具有多个空气进/出孔，空气可以通过空气进入或离开缓冲器框架。 多个过滤器可以可释放地紧固到多个槽部分，以过滤包含在流过空气进/出孔的空气中的污染物质。 当更换多个过滤器时，可以使用用于中断通过空气入口/出口的空气的空气断路器，从而在更换期间向半导体制造装置提供净化的空气。

公开(公告)号：US20080196515A1

公开(公告)日：2008-08-21

申请号：US12031086

申请日：2008-02-14

申请人： Ok-Sun Lee ,  Hyung-Seok Choi ,  Yo-Han Ahn ,  Ji-Young Kim

发明人： Ok-Sun Lee ,  Hyung-Seok Choi ,  Yo-Han Ahn ,  Ji-Young Kim

IPC分类号： G01N1/14

CPC分类号： G03F1/82 ,  G01N2015/0687

摘要： A contamination analysis unit and method for inspecting pollutants remaining on a target side of an inspection object such as a reticle after cleaning the object is provided. After steeping the target side in a solution, a sampling liquid may be abstracted therefrom after a predetermined time and may be analyzed.

摘要翻译： 提供了一种污染分析单元和用于检查在清洁物体之后残留在诸如掩模版之类的检查对象的目标侧上的污染物的方法。 在将目标侧浸入溶液中之后，可以在预定时间之后从其中抽取取样液体并进行分析。

公开(公告)号：US07161660B2

公开(公告)日：2007-01-09

申请号：US11017783

申请日：2004-12-22

申请人： Yo-Han Ahn ,  Seok-Ryeul Lee ,  Jung-Sung Hwang ,  Tae-Jin Hwang ,  Byung-Moo Lee

发明人： Yo-Han Ahn ,  Seok-Ryeul Lee ,  Jung-Sung Hwang ,  Tae-Jin Hwang ,  Byung-Moo Lee

IPC分类号： G03B27/72

CPC分类号： G03F7/70558

摘要： A management system and method of a reticle in an exposing process are disclosed. A calculator calculates an accumulated dosage of an illuminating light irradiated onto a reticle used in a photolithography process. The calculator is connected to an exposing apparatus to expose photoresist on a semiconductor substrate. A comparator compares the calculated accumulated dosage with a preset reference dosage. When the calculated accumulated dosage is greater than or equal to the reference dosage, a controller suspends the photolithography process. Minimizing haze contamination on the reticle, thus preventing process failures.

摘要翻译： 公开了一种在曝光过程中的掩模版的管理系统和方法。 计算器计算照射到光刻工艺中使用的掩模版上的照射光的累积剂量。 计算器连接到曝光装置以暴露半导体衬底上的光致抗蚀剂。 比较器将计算的累积剂量与预设的参考剂量进行比较。 当计算的累积剂量大于或等于参考剂量时，控制器暂停光刻工艺。 最小化掩模版上的雾度污染，从而防止过程故障。