公开(公告)号：US6093229A

公开(公告)日：2000-07-25

申请号：US172152

申请日：1998-10-14

申请人： Kun-hyung Lee ,  Jung-sung Hwang ,  Yo-han Ahn ,  Jae-heung Choi

发明人： Kun-hyung Lee ,  Jung-sung Hwang ,  Yo-han Ahn ,  Jae-heung Choi

IPC分类号： F24F7/06 ,  B01D46/00 ,  B01D46/44 ,  F24F11/00 ,  F24F11/02 ,  B01D35/143

CPC分类号： B01D46/0086 ,  B01D46/444 ,  B01D2273/18 ,  B01D2273/30 ,  B01D2279/51 ,  Y10S55/34

摘要： A fan drive checking system, for an air conditioning system in a clean room having a fan filter unit (FFU), includes a flow sensor for sensing air flow inside a housing of a FFU. The sensor provides a sensor signal indicative of normal and adverse flow conditions in the housing. A control portion in data communication with the sensor outputs a control signal responsive to the sensing signal. An alarm in data communication with the control portion provides a warning when the control signal indicates the adverse flow condition.

摘要翻译： 在具有风扇过滤器单元（FFU）的洁净室中的空调系统的风扇驱动器检查系统包括用于感测FFU的壳体内的空气流的流量传感器。 传感器提供表示壳体中正常和不利流动条件的传感器信号。 与传感器进行数据通信的控制部分响应于感测信号输出控制信号。 当控制信号指示不利流动状况时，与控制部分的数据通信中的警报提供警告。

公开(公告)号：US5984775A

公开(公告)日：1999-11-16

申请号：US953380

申请日：1997-10-17

申请人： Kun-hyung Lee ,  Tae-jin Hwang

发明人： Kun-hyung Lee ,  Tae-jin Hwang

IPC分类号： F24F7/06 ,  F24F13/08 ,  F24F13/12 ,  H01L21/02

CPC分类号： F24F13/12

摘要： An apparatus for controlling air flow includes a grating having a plurality of air vents, a shutter assembly composed of a shutter fixed plate, having a plurality of first openings, attached to a lower surface of the grating, and a shutter moving plate, having a plurality of second openings corresponding to the first openings, movably disposed between the grating and the fixed plate. An opening-ratio controller moves the moving plate with respect to the fixed plate whereby an opening ratio defined by relative positions of the first openings and the second openings is controlled. The separation between the grating and the shutter fixed plate may be the thickness of the shutter moving plate. The opening-ratio controller may include an opening-ratio controlling screw having a pinion attached to the screw end.

摘要翻译： 用于控制空气流的装置包括具有多个通风口的光栅，由快门固定板组成的快门组件，其具有附接到光栅的下表面的多个第一开口，以及快门移动板，具有 对应于第一开口的多个第二开口，可移动地设置在光栅和固定板之间。 打开比控制器相对于固定板移动移动板，由此控制由第一开口和第二开口的相对位置限定的开口率。 光栅和快门固定板之间的间隔可以是快门移动板的厚度。 打开比控制器可以包括开口比控制螺钉，其具有附接到螺钉端的小齿轮。

公开(公告)号：US20120009792A1

公开(公告)日：2012-01-12

申请号：US13240059

申请日：2011-09-22

申请人： Jung-Dae Park ,  Young You ,  Tae-Hyo Choi ,  Hun-Jung Yi ,  Kun-Hyung Lee

发明人： Jung-Dae Park ,  Young You ,  Tae-Hyo Choi ,  Hun-Jung Yi ,  Kun-Hyung Lee

IPC分类号： H01L21/308 ,  H01L21/306

CPC分类号： H01L21/02087 ,  C09K13/08 ,  H01L21/0209 ,  H01L21/31111 ,  H01L21/32134

摘要： A semiconductor wet etchant includes deionized water, a fluorine-based compound, an oxidizer and an inorganic salt. A concentration of the fluorine-based compound is 0.25 to 10.0 wt % based on a total weight of the etchant, a concentration of the oxidizer is 0.45 to 3.6 wt % based on a total weight of the etchant, and a concentration of the inorganic salt is 1.0 to 5.0 wt % based on a total weight of the etchant. The inorganic salt comprises at least one of an ammonium ion (NH4+) and a chlorine ion (Cl−).

摘要翻译： 半导体湿蚀刻剂包括去离子水，氟基化合物，氧化剂和无机盐。 基于蚀刻剂的总重量，氟系化合物的浓度为0.25〜10.0重量％，氧化剂的浓度相对于蚀刻剂的总重量为0.45〜3.6重量％，无机盐的浓度 相对于蚀刻剂的总重量为1.0〜5.0重量％。 无机盐包括铵离子（NH 4 +）和氯离子（Cl - ）中的至少一种。

公开(公告)号：US08043974B2

公开(公告)日：2011-10-25

申请号：US12168952

申请日：2008-07-08

申请人： Jung-Dae Park ,  Young You ,  Tae-Hyo Choi ,  Hun-Jung Yi ,  Kun-Hyung Lee

发明人： Jung-Dae Park ,  Young You ,  Tae-Hyo Choi ,  Hun-Jung Yi ,  Kun-Hyung Lee

IPC分类号： H01L21/302

CPC分类号： H01L21/02087 ,  C09K13/08 ,  H01L21/0209 ,  H01L21/31111 ,  H01L21/32134

摘要： A semiconductor wet etchant includes deionized water, a fluorine-based compound, an oxidizer and an inorganic salt. A concentration of the fluorine-based compound is 0.25 to 10.0 wt % based on a total weight of the etchant, a concentration of the oxidizer is 0.45 to 3.6 wt % based on a total weight of the etchant, and a concentration of the inorganic salt is 1.0 to 5.0 wt % based on a total weight of the etchant. The inorganic salt comprises at least one of an ammonium ion (NH4+) and a chlorine ion (Cl−).

摘要翻译： 半导体湿蚀刻剂包括去离子水，氟基化合物，氧化剂和无机盐。 基于蚀刻剂的总重量，氟系化合物的浓度为0.25〜10.0重量％，氧化剂的浓度相对于蚀刻剂的总重量为0.45〜3.6重量％，无机盐的浓度 相对于蚀刻剂的总重量为1.0〜5.0重量％。 无机盐包括铵离子（NH 4 +）和氯离子（Cl - ）中的至少一种。

公开(公告)号：US07803844B2

公开(公告)日：2010-09-28

申请号：US11708041

申请日：2007-02-20

申请人： Kun-Hyung Lee ,  Byung-Yoon Cha ,  Takayuki Yonezawa ,  Shinichi Hasegawa ,  Je-Tae Woo ,  Kazuo Nagai

发明人： Kun-Hyung Lee ,  Byung-Yoon Cha ,  Takayuki Yonezawa ,  Shinichi Hasegawa ,  Je-Tae Woo ,  Kazuo Nagai

IPC分类号： A61K31/05

CPC分类号： A61K31/075 ,  A23L33/10 ,  A23L33/105 ,  A23V2002/00 ,  A61K31/05 ,  A23V2200/306 ,  A23V2250/21

摘要： The present invention provides the pharmaceutical compositions, the pharmaceutical preparations thereof as an active ingredient, the health food, the food with health-promoting benefits and the like. The present invention provides the above-mentioned pharmaceutical preparations and the like comprising at least one of the compound shown in the following formula (I), physiologically acceptable salt thereof, or hydrate thereof. (wherein, R′1, R′2, and R′3 are independently a hydrogen atom, OH, or alkoxy group having C1 to C3, respectively. R1, R2, and R3 are independently a hydrogen atom or alkenyl group having C3 to C5, respectively).

摘要翻译： 本发明提供作为活性成分的药物组合物，其药物制剂，保健食品，具有促进健康益处的食品等。 本发明提供了包含下式（I）所示的化合物，其生理学上可接受的盐或其水合物中的至少一种的上述药物制剂等。 （其中，R'1，R'2和R'3分别是氢原子，OH或具有C1〜C3的烷氧基，R1，R2和R3分别是氢原子或C3〜 C5）。

公开(公告)号：US5993519A

公开(公告)日：1999-11-30

申请号：US113145

申请日：1998-07-10

申请人： Chang-su Lim ,  Hyun-joon Kim ,  Youn-soo Han ,  Kun-hyung Lee

发明人： Chang-su Lim ,  Hyun-joon Kim ,  Youn-soo Han ,  Kun-hyung Lee

IPC分类号： F24F7/06 ,  B01D46/00 ,  B01D46/10 ,  B01D46/42 ,  B01D46/44 ,  B01D46/52 ,  B01D29/52

CPC分类号： B01D46/10 ,  B01D46/0005 ,  B01D46/0023 ,  B01D46/008 ,  B01D46/4227 ,  B01D46/446 ,  B01D2271/027 ,  B01D2279/51

摘要： An auxiliary device is used in the exchanging of a filter in a clean room having a production section, and a filter frame including a filter-supporting portion which supports the filter and an extending portion which extends from the filter-supporting portion toward the production section. The auxiliary device includes a block plate to be inserted in the extending portion of the filter frame, a support supporting the bottom of the block plate and facing an inside wall of the second portion of the filter frame, and an inflatable tube disposed along the circumference of the support. The tube is inflated to press outwardly and seal the device in the filter frame, thereby blocking the flow of any unfiltered air past the filter and into the production section. Thereafter, the filter is removed and a new filter is set in its place. Finally, the tube is deflated so as to free the device from the filter frame. Accordingly, the production operation as well as the circulation of cleaning air can proceed while the filter is being exchanged.

摘要翻译： 一种辅助装置用于在具有生产部分的洁净室中更换过滤器，以及包括支撑过滤器的过滤器支撑部分和从过滤器支撑部分朝向生产部分延伸的延伸部分的过滤器框架 。 辅助装置包括插入过滤器框架的延伸部分中的块板，支撑块板底部并且面向过滤器框架的第二部分的内壁的支撑件和沿着圆周设置的可充气管 的支持。 管被充气以向外挤压并将装置密封在过滤器框架中，从而阻止任何未过滤的空气流过过滤器并进入生产部分中。 此后，将过滤器移除，并将新的过滤器置于其位置。 最后，管被放气，以使装置从过滤器框架释放。 因此，在更换过滤器时可以进行清洁空气的生产操作以及循环。

公开(公告)号：US5792226A

公开(公告)日：1998-08-11

申请号：US752385

申请日：1996-11-20

申请人： Joung-sun Lee ,  Jae-jun Ruy ,  Kun-hyung Lee ,  Sang-young Mun

发明人： Joung-sun Lee ,  Jae-jun Ruy ,  Kun-hyung Lee ,  Sang-young Mun

IPC分类号： F24F7/06 ,  F24F3/16 ,  F24F13/075 ,  H01L21/00 ,  B01D46/10 ,  B01L1/04

CPC分类号： F24F3/161

摘要： An air current controlling device for a clean room having a high efficiency particle filter, a housing cap for the filter, and an air current directional controller provided between the filter and the housing cap. The controller has a shaft extending therefrom, which extends through a central opening in the bottom of the housing cap. The controller includes a plurality of extendable and retractable blades, each being connected to a square plate that is in turn connected to the shaft. A clean room having the above air current controlling device installed in each air inlet is capable of widely distributing the clean air in the clean room. The wide air distribution reduces the temperature difference in the clean room, while optimizing the relative humidity and thereby reducing the electrostatic level of the clean room.

摘要翻译： 一种用于洁净室的气流控制装置，其具有高效率粒子滤波器，用于过滤器的壳体盖，以及设置在过滤器和壳体盖之间的气流定向控制器。 控制器具有从其延伸的轴，其延伸穿过壳体盖的底部中的中心开口。 控制器包括多个可伸缩和可缩回的叶片，每个叶片连接到正方形板，该方板又连接到轴上。 具有安装在每个空气入口中的上述气流控制装置的洁净室能够将清洁空气广泛地分布在洁净室中。 广泛的空气分布降低了洁净室中的温差，同时优化了相对湿度，从而降低了洁净室的静电电平。

公开(公告)号：US08529512B2

公开(公告)日：2013-09-10

申请号：US13543294

申请日：2012-07-06

申请人： Sang Bin Lee ,  Kun-Hyung Lee ,  Jeong Ju Lee ,  Jae Soon Choi ,  Seung Won Lee

发明人： Sang Bin Lee ,  Kun-Hyung Lee ,  Jeong Ju Lee ,  Jae Soon Choi ,  Seung Won Lee

IPC分类号： A61M1/00

CPC分类号： A61M5/142 ,  A61M5/1422 ,  A61M5/145 ,  A61M2005/14506

摘要： The present invention relates to a simple and small cylinder pump, which can stably supply a medical fluid regardless of the installed height of a liquid container or a blood bag. The cylinder pump includes an upper casing, and a lower casing coupled to the upper casing. An upper rotation member is rotatably inserted in the upper casing. A lower rotation member slidingly contacting the upper rotation member is rotatably inserted in the lower casing. An inner wall of the upper casing, a lower outer surface of the upper rotation member, an inner wall of the lower casing, and an upper outer surface of the rotation member constitute a cylinder having a single-tube shape. Plungers are installed on the upper rotation member and on the lower rotation member, respectively, and rotate in the cylinder, the ends of which are closed.

摘要翻译： 本发明涉及一种简单且小型的气缸泵，其能够稳定地供应医用流体，而与液体容器或血袋的安装高度无关。 气缸泵包括上壳体和联接到上壳体的下壳体。 上旋转构件可旋转地插入上壳体。 滑动地接触上旋转构件的下旋转构件可旋转地插入下壳体中。 上壳体的内壁，上旋转构件的下外表面，下壳体的内壁和旋转构件的上外表面构成具有单管形状的气缸。 柱塞分别安装在上旋转构件和下旋转构件上，并且在气缸中旋转，其端部关闭。

公开(公告)号：US07850449B2

公开(公告)日：2010-12-14

申请号：US11775640

申请日：2007-07-10

申请人： Jae-Hyun Yang ,  Yo-Han Ahn ,  Kun-Hyung Lee ,  Gui-Young Cho ,  Hong-Hee Jeong ,  Mi-Ae Kim

发明人： Jae-Hyun Yang ,  Yo-Han Ahn ,  Kun-Hyung Lee ,  Gui-Young Cho ,  Hong-Hee Jeong ,  Mi-Ae Kim

IPC分类号： F27B5/00 ,  F27B5/10

CPC分类号： F27B17/0025 ,  H01L21/67109 ,  H01L21/67253

摘要： In an embodiment, heat treatment equipment comprises a process tube, an exhaust duct connected to the process tube, and, during operation, exhausting gases present within the process tube. The heat treatment equipment also comprises a hollow pressure control member interposed between the process tube and the exhaust duct, the pressure control member being operatively connected to the process tube and the exhaust duct respectively, and including one or a number of openings. Negative pressure is avoided in the process tube during heat treatment processes so that unwanted gas and impurities cannot enter the process tube from outside.

摘要翻译： 在一个实施例中，热处理设备包括处理管，连接到处理管的排气管道，以及在操作期间排出存在于处理管内的气体。 热处理设备还包括插入处理管和排气管之间的中空压力控制构件，压力控制构件分别可操作地连接到处理管和排气管，并且包括一个或多个开口。 在热处理过程中，在处理管中避免负压，使得不需要的气体和杂质不能从外部进入工艺管。

公开(公告)号：US07398801B2

公开(公告)日：2008-07-15

申请号：US11292674

申请日：2005-12-02

申请人： Kun-Hyung Lee ,  Soo-Woong Lee ,  Hyun-Ho Cho ,  Hee-Sun Chae ,  Jae-Hyung Jung ,  Sun-Yong Lee

发明人： Kun-Hyung Lee ,  Soo-Woong Lee ,  Hyun-Ho Cho ,  Hee-Sun Chae ,  Jae-Hyung Jung ,  Sun-Yong Lee

IPC分类号： B65B1/20

CPC分类号： H01L21/67017 ,  H01L21/67772 ,  Y10S414/14

摘要： An apparatus and method for manufacturing semiconductor devices are disclosed. In accordance with the invention, a wafer transfer device for transferring wafers from wafer storage containers to wafer processing equipment includes a flow chamber designed to reduce the amount of contaminants that can enter the wafer container. The wafer transfer apparatus provide two gas inlets for allowing two gases to flow through the flow chamber of the transfer apparatus. This results in a reduced amount of contaminants able to enter the wafer container, which in turn results in manufacture of devices with more reliable performance characteristics as well as high manufacturing yield.

摘要翻译： 公开了一种用于制造半导体器件的设备和方法。 根据本发明，用于将晶片从晶片储存容器转移到晶片加工设备的晶片转移装置包括设计成减少可进入晶片容器的污染物量的流动室。 晶片传送装置提供两个气体入口，用于允许两种气体流过传送装置的流动室。 这导致能够进入晶片容器的污染物量减少，这进而导致具有更可靠的性能特征以及高制造产量的装置的制造。