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1.发明授权Illuminating optical apparatus and making method thereof, exposure apparatus and making method thereof, and device manufacturing method 失效照明光学装置及其制造方法，曝光装置及其制造方法以及装置制造方法公开(公告)号：US06727981B2
公开(公告)日：2004-04-27
申请号：US10307963
申请日：2002-12-03
IPC分类号： G03B2752
CPC分类号： G03F7/70916 , G03B27/42 , G03F7/70058 , G03F7/709
摘要： The illuminating optical system is divided into a first portion including movable blades moving during exposure, and a second portion not containing a movable portion moving over the movable blade during exposure. The second portion is installed on the exposure main portion, and the first portion, separately from the exposure main portion. The frames configuring the first and the second optical units, the second optical unit having optical elements of a smaller movable amount than the movable amount of the movable blades, are relatively displaceably connected via the bellows-shaped member. The frames configuring the second optical units are fixed to each other via the O-ring suppressing relative displacement. As a result, the effect of vibration of the illuminating optical system during exposure on the main portion can be reduced. Upon purging nitrogen gas or the like in the space interior of the frame and the space between adjacent frames, the degree of air-tightness and chemical cleanliness is improved, consequently improving the exposure accuracy.
摘要翻译： 照明光学系统被分为包括在曝光期间移动的可移动刀片的第一部分和不包含在曝光期间在可动刀片上移动的可移动部分的第二部分。 第二部分安装在曝光主体部分上，第一部分与曝光主体部分分开。 构成第一和第二光学单元的框架，具有比可动叶片的可移动量小的可移动量的光学元件的第二光学单元经由波纹管状构件相对可移动地连接。 构成第二光学单元的框架经由O形环彼此固定，抑制相对位移。 结果，可以减少照射光学系统在主要部分的曝光期间的振动的影响。 当在框架的空间内部和相邻框架之间的空间中吹扫氮气等时，提高了气密性和化学清洁度，从而提高了曝光精度。
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2.发明授权Optical apparatus, exposure apparatus using the same, and gas introduction method 失效光学装置，使用其的曝光装置和气体引入方法公开(公告)号：US06762412B1
公开(公告)日：2004-07-13
申请号：US09564632
申请日：2000-05-03
申请人： Masayuki Akagawa , Taichi Taniuchi
发明人： Masayuki Akagawa , Taichi Taniuchi
IPC分类号： H01K126
CPC分类号： G03F7/70833 , G03F7/70933
摘要： The optical apparatus of the present invention comprises; an optical member such as a lens; a casing containing the optical member; a gas supply device that supplies gas at a predetermined flow rate to inside the casing; and a gas introduction mechanism that reduces the flow rate of the gas supplied to inside the casing to below the predetermined flow rate. The casing has an inlet through which gas is supplied from the gas supply device to the inside. The gas introduction mechanism comprises an impingement member which is disposed between the inlet and a surface of the optical member, and the gas introduced from the inlet impinges against the impingement member. As a result, contamination of the optical member due to gas introduced to inside the casing can be reduced.
摘要翻译： 本发明的光学装置包括： 诸如透镜的光学构件; 容纳光学构件的壳体; 气体供给装置，其以规定的流量向外部供给气体; 以及将供给到壳体内部的气体的流量降低到规定流量以下的气体导入机构。 壳体具有从气体供应装置向内部供应气体的入口。 气体引入机构包括设置在光学构件的入口和表面之间的冲击构件，并且从入口引入的气体撞击冲击构件。 结果，可以减少由引入到壳体内部的气体引起的光学部件的污染。
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3.发明授权Optical device method of cleaning the same, projection aligner, and method of producing the same 有权光学装置清洁方法，投影对准器及其制造方法公开(公告)号：US06288769B1
公开(公告)日：2001-09-11
申请号：US09458807
申请日：1999-12-10
IPC分类号： G03B2752
CPC分类号： G03F7/70933 , G02B27/0006 , G03F7/70058 , G03F7/70241 , G03F7/70825 , G03F7/70883 , G03F7/70891 , G03F7/70925
摘要： An exposure method for irradiating a mask with an illuminating light and transferring a pattern on the mask onto a substrate through a projection optical system includes supplying a gas having a lower capability of absorbing illuminating light to each of plural chambers formed between optical elements disposed in a barrel, floating a contaminating substance on the plural elements in the gas by irradiation, exhausting the gas and contaminating substances from the barrel, supplying the plural chambers with further gas, after exhausting the gas containing the contaminating substance, and transferring the pattern onto the substrate.
摘要翻译： 一种用照射光照射掩模并通过投影光学系统将掩模上的图案转印到基板上的曝光方法包括：将设置在其中的光学元件之间形成的多个室之中的每个室提供吸收照明光的能力较低的气体 通过照射将污染物质漂浮在气体中的多个元件上，排出气体并从筒体中污染物质，在排出含有污染物质的气体之后，向多个室供给另外的气体，并将图案转印到基板上 。
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4.发明授权公开(公告)号：US06671033B2
公开(公告)日：2003-12-30
申请号：US10119141
申请日：2002-04-10
IPC分类号： G03B2752
CPC分类号： G03F7/70933 , G02B27/0006 , G03F7/70058 , G03F7/70241 , G03F7/70825 , G03F7/70883 , G03F7/70891 , G03F7/70925
摘要： A reticle (R) is irradiated with an ArF excimer laser beam to transfer a pattern on the reticle (R) onto a wafer (W) through a projection optical system (PL). Each of a plurality of illuminating lens units (2) arranged in the illuminating optical passage has a barrel containing a plurality of lenses, and caps are so provided as to be spaced from the lenses at both ends. Lens chambers among the lenses are filled with an inert gas, and the spaces between the caps and the lenses are also filled with an inert gas. When the illuminating lens unit (2) are housed in and illuminating optical path housing, the caps are removed while purging the spaces. Therefore, the lenses at both ends are prevented from being contaminated and the transmittance of the optical lens device for exposure with light having a wavelength of shorter than 300 nm is prevented from lowering.
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