公开(公告)号：US20220020573A1

公开(公告)日：2022-01-20

申请号：US16929881

申请日：2020-07-15

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Sheng-chun YANG ,  Po-Wei LIANG ,  Chao-Hung WAN ,  Yi-Ming LIN ,  Liu Che KANG

IPC: H01J37/32

Abstract: A radio frequency (RF) screen for a microwave powered ultraviolet (UV) lamp system is disclosed. In one example, a disclosed RF screen includes: a sheet comprising a conductive material; and a frame around edges of the sheet. The conductive material defines a predetermined mesh pattern of individual openings across substantially an operative area of the screen. Each of the individual openings has a triangular shape.

公开(公告)号：US20230260764A1

公开(公告)日：2023-08-17

申请号：US18140986

申请日：2023-04-28

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Sheng-chun YANG ,  Po-Wei LIANG ,  Chao-Hung WAN ,  Yi-Ming LIN ,  Liu Che KANG

IPC: H01J37/32

CPC classification number: H01J37/32651 ,  H01J37/32082 ,  H01J2237/0266

Abstract: A radio frequency (RF) screen for a microwave powered ultraviolet (UV) lamp system is disclosed. In one example, a disclosed RF screen includes: a sheet comprising a conductive material; and a frame around edges of the sheet. The conductive material defines a predetermined mesh pattern of individual openings across substantially an operative area of the screen. Each of the individual openings has a triangular shape.

公开(公告)号：US20240304426A1

公开(公告)日：2024-09-12

申请号：US18667944

申请日：2024-05-17

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Sheng-chun YANG ,  Po-Wei LIANG ,  Chao-Hung WAN ,  Yi-Ming LIN ,  Liu Che KANG

IPC: H01J37/32

CPC classification number: H01J37/32651 ,  H01J37/32082 ,  H01J2237/0266

Abstract: A radio frequency (RF) screen for a microwave powered ultraviolet (UV) lamp system is disclosed. In one example, a disclosed RF screen includes: a sheet comprising a conductive material; and a frame around edges of the sheet. The conductive material defines a predetermined mesh pattern of individual openings across substantially an operative area of the screen. Each of the individual openings has a triangular shape.

公开(公告)号：US20200058532A1

公开(公告)日：2020-02-20

申请号：US16238001

申请日：2019-01-02

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Sheng-Chun YANG ,  Yi-Ming LIN ,  Chao-Hung WAN ,  Hsiu Hao HSU ,  Guan Jung CHEN ,  Po-Wei LIANG

IPC: H01L21/673 ,  H01L21/67 ,  C23C16/44 ,  C23C16/455

Abstract: A humidity-controlled storage device includes a plurality of panels configured to form an enclosed volume. A first panel of the plurality of panels includes inlet and outlet ports. The storage device further includes a purge system with a gas inlet pipe, a gas supply system, and a gas extraction system. The gas inlet pipe includes a nozzle and a cylindrical portion coupled to the inlet port. The gas supply system is configured to supply a purge gas to the gas inlet pipe. The gas inlet pipe is configured to output the purge gas into the enclosed volume in a direction that creates a circular or an oval gas flow pattern within the enclosed volume. The gas extraction system is coupled to the outlet port and is configured to extract the purge gas from the enclosed volume.

公开(公告)号：US20220356574A1

公开(公告)日：2022-11-10

申请号：US17869706

申请日：2022-07-20

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Sheng-chun YANG ,  Yi-Ming LIN ,  Chih-tsung LEE ,  Yun-Tzu CHIU ,  Chao-Hung WAN

IPC: C23C16/44 ,  C23C16/458 ,  C23C16/50 ,  C23C16/455

Abstract: Pumping liners for use in an apparatus for depositing a material on a work piece by chemical vapor deposition includes a plurality of unevenly spaced apertures are disclosed. Uneven spacing of the plurality of apertures produces a uniform flow of processing gases within a processing chamber with which the pumping liner is associated. Films of materials deposited onto a work piece by chemical vapor deposition techniques using disclosed pumping liners exhibit desirable properties such as uniform thickness and smooth and uniform surfaces.

公开(公告)号：US20210079524A1

公开(公告)日：2021-03-18

申请号：US16570274

申请日：2019-09-13

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Sheng-chun YANG ,  Yi-Ming LIN ,  Chih-tsung LEE ,  Yun-Tzu CHIU ,  Chao-Hung WAN

IPC: C23C16/44 ,  C23C16/455 ,  C23C16/50 ,  C23C16/458

Abstract: Pumping liners for use in an apparatus for depositing a material on a work piece by chemical vapor deposition includes a plurality of unevenly spaced apertures are disclosed. Uneven spacing of the plurality of apertures produces a uniform flow of processing gases within a processing chamber with which the pumping liner is associated. Films of materials deposited onto a work piece by chemical vapor deposition techniques using disclosed pumping liners exhibit desirable properties such as uniform thickness and smooth and uniform surfaces.