公开(公告)号：US10533252B2

公开(公告)日：2020-01-14

申请号：US15088064

申请日：2016-03-31

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chih-Chiang Chiu ,  Ding-I Liu ,  Chin-Feng Lin ,  Po-Hsiung Leu

IPC: C23C16/50 ,  C23C16/455 ,  H01J37/32 ,  C23C16/505

Abstract: A showerhead is configured to be mounted inside a processing chamber and provide a processing gas onto a semiconductor wafer inside the processing chamber. The showerhead includes a supply plenum, a faceplate, and an electrode plate assembly. The faceplate is disposed at a side of the supply plenum. The electrode plate assembly is disposed between a gas source and the supply plenum. The electrode plate assembly includes a first plate having a unitary construction and having a plurality of first gas holes, and a second plate having a unitary construction and having a plurality of second gas holes. The second plate is located between the first plate and the supply plenum and separated from the first plate. The plurality of second gas holes are partially overlapped but misaligned with the plurality of first gas holes. A semiconductor apparatus having the same and a semiconductor process are also provided.

公开(公告)号：US20200073258A1

公开(公告)日：2020-03-05

申请号：US16547301

申请日：2019-08-21

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chih-Chiang Chiu ,  Ding-I Liu ,  Yu-Ying Lu

IPC: G03F7/20

Abstract: An Equipment Front End Module (EFEM) having a Front Opening Unified Pod (FOUP) dock and a tool access port, includes a robotic wafer handling system configured to transfer silicon wafers between a FOUP coupled to the FOUP dock and a process tool positioned for access via the tool access port. An air curtain system inside the EFEM is positioned to produce an air curtain across the tool access port while the port is open, acting to isolate the interior of the EFEM from the tool environment, and prevent passage of airborne contaminants into the EFEM via the access port.

公开(公告)号：US20170283948A1

公开(公告)日：2017-10-05

申请号：US15088064

申请日：2016-03-31

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chih-Chiang Chiu ,  Ding-I Liu ,  Chin-Feng Lin ,  Po-Hsiung Leu

IPC: C23C16/455 ,  H01J37/32 ,  C23C16/505

Abstract: A showerhead is configured to be mounted inside a processing chamber and provide a processing gas onto a semiconductor wafer inside the processing chamber. The showerhead includes a supply plenum, a faceplate, and an electrode plate assembly. The faceplate is disposed at a side of the supply plenum. The electrode plate assembly is disposed between a gas source and the supply plenum. The electrode plate assembly includes a first plate having a unitary construction and having a plurality of first gas holes, and a second plate having a unitary construction and having a plurality of second gas holes. The second plate is located between the first plate and the supply plenum and separated from the first plate. The plurality of second gas holes are partially overlapped but misaligned with the plurality of first gas holes. A semiconductor apparatus having the same and a semiconductor process are also provided.

公开(公告)号：US11194259B2

公开(公告)日：2021-12-07

申请号：US16547301

申请日：2019-08-21

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chih-Chiang Chiu ,  Ding-I Liu ,  Yu-Ying Lu

IPC: G03F7/20

Abstract: An Equipment Front End Module (EFEM) having a Front Opening Unified Pod (FOUP) dock and a tool access port, includes a robotic wafer handling system configured to transfer silicon wafers between a FOUP coupled to the FOUP dock and a process tool positioned for access via the tool access port. An air curtain system inside the EFEM is positioned to produce an air curtain across the tool access port while the port is open, acting to isolate the interior of the EFEM from the tool environment, and prevent passage of airborne contaminants into the EFEM via the access port.