公开(公告)号：US20200073258A1

公开(公告)日：2020-03-05

申请号：US16547301

申请日：2019-08-21

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chih-Chiang Chiu ,  Ding-I Liu ,  Yu-Ying Lu

IPC: G03F7/20

Abstract: An Equipment Front End Module (EFEM) having a Front Opening Unified Pod (FOUP) dock and a tool access port, includes a robotic wafer handling system configured to transfer silicon wafers between a FOUP coupled to the FOUP dock and a process tool positioned for access via the tool access port. An air curtain system inside the EFEM is positioned to produce an air curtain across the tool access port while the port is open, acting to isolate the interior of the EFEM from the tool environment, and prevent passage of airborne contaminants into the EFEM via the access port.

公开(公告)号：US11194259B2

公开(公告)日：2021-12-07

申请号：US16547301

申请日：2019-08-21

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chih-Chiang Chiu ,  Ding-I Liu ,  Yu-Ying Lu

IPC: G03F7/20

Abstract: An Equipment Front End Module (EFEM) having a Front Opening Unified Pod (FOUP) dock and a tool access port, includes a robotic wafer handling system configured to transfer silicon wafers between a FOUP coupled to the FOUP dock and a process tool positioned for access via the tool access port. An air curtain system inside the EFEM is positioned to produce an air curtain across the tool access port while the port is open, acting to isolate the interior of the EFEM from the tool environment, and prevent passage of airborne contaminants into the EFEM via the access port.

公开(公告)号：US08872138B2

公开(公告)日：2014-10-28

申请号：US13771112

申请日：2013-02-20

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yu-Ying Lu ,  Sung-Po Yang ,  Ding-I Liu ,  Kuo-Shu Tseng ,  Chung-Wen Chang

IPC: G21K5/04 ,  B05D3/06

CPC classification number: B05D3/067 ,  H01L21/67115 ,  H01L21/6776

Abstract: A UV curing system includes an enclosure defining an interior, a UV radiation source disposed within the interior of the enclosure, and a first window disposed within the interior of the enclosure. The first window creates a barrier that separates the UV radiation source and a processing chamber. A second window is disposed within the interior of the enclosure at a distance from the first window to define a gas channel. The second window defines a plurality of openings such that the gas channel is in fluid communication with the processing chamber. A gas inlet conduit is in fluid communication with the gas channel and is configured to introduce a cooling gas into the gas channel. A gas outlet is in fluid communication with the processing chamber and is configured to remove gas from the processing chamber.

Abstract translation: UV固化系统包括限定内部的外壳，设置在外壳内部的UV辐射源以及设置在外壳内部的第一窗口。 第一个窗口创建一个隔离UV辐射源和一个处理室的屏障。 第二窗口设置在与第一窗口相距一定距离的外壳的内部，以限定气体通道。 第二窗口限定多个开口，使得气体通道与处理室流体连通。 气体入口导管与气体通道流体连通，并且构造成将冷却气体引入气体通道。 气体出口与处理室流体连通并且被配置为从处理室去除气体。