公开(公告)号：US09529255B2

公开(公告)日：2016-12-27

申请号：US14096167

申请日：2013-12-04

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Meng-Lin Lu ,  Ching-Ting Yang ,  Chun-Jen Chen ,  Chien-Hung Lai ,  Jong-Yuh Chang

IPC: G06F17/50 ,  G03F1/84

CPC classification number: G03F1/84

Abstract: The present disclosure relates to a method of inspecting a photomask to decrease false defects, which uses a plurality of image rendering models with varying emphasis on different design aspects, and an associated apparatus. In some embodiments, the method is performed by forming an integrated circuit (IC) design comprising a graphical representation of an integrated circuit. A first image rendering simulation is performed on the IC design using an initial image rendering model to determine a plurality of initial mask defects. A second image rendering simulation is performed on the IC design using a modified image rendering model that emphasizes a design aspect to determine a plurality of modified mask defects. By comparing the plurality of initial mask defects with the plurality of modified mask defects, falsely identified mask defects can be detected and eliminated.

Abstract translation: 本公开涉及一种检查光掩模以减少错误缺陷的方法，其使用多个不同强调不同设计方面的图像渲染模型以及相关联的装置。 在一些实施例中，该方法通过形成包括集成电路的图形表示的集成电路（IC）设计来执行。 使用初始图像渲染模型对IC设计执行第一图像渲染模拟以确定多个初始掩模缺陷。 使用强调设计方面以确定多个修改的掩模缺陷的修改的图像渲染模型对IC设计执行第二图像渲染模拟。 通过将多个初始掩模缺陷与多个修改的掩模缺陷进行比较，可以检测和消除错误识别的掩模缺陷。

公开(公告)号：US20150154326A1

公开(公告)日：2015-06-04

申请号：US14096167

申请日：2013-12-04

Applicant: Taiwan Semiconductor Manufacturing Co.,Ltd.

Inventor： Meng-Lin Lu ,  Ching-Ting Yang ,  Chun-Jen Chen ,  Chien-Hung Lai ,  Jong-Yuh Chang

IPC: G06F17/50

CPC classification number: G03F1/84

Abstract: The present disclosure relates to a method of inspecting a photomask to decrease false defects, which uses a plurality of image rendering models with varying emphasis on different design aspects, and an associated apparatus. In some embodiments, the method is performed by forming an integrated circuit (IC) design comprising a graphical representation of an integrated circuit. A first image rendering simulation is performed on the IC design using an initial image rendering model to determine a plurality of initial mask defects. A second image rendering simulation is performed on the IC design using a modified image rendering model that emphasizes a design aspect to determine a plurality of modified mask defects. By comparing the plurality of initial mask defects with the plurality of modified mask defects, falsely identified mask defects can be detected and eliminated.

Abstract translation: 本公开涉及一种检查光掩模以减少错误缺陷的方法，其使用多个不同强调不同设计方面的图像渲染模型以及相关联的装置。 在一些实施例中，该方法通过形成包括集成电路的图形表示的集成电路（IC）设计来执行。 使用初始图像渲染模型对IC设计执行第一图像渲染模拟以确定多个初始掩模缺陷。 使用强调设计方面以确定多个修改的掩模缺陷的修改的图像渲染模型对IC设计执行第二图像渲染模拟。 通过将多个初始掩模缺陷与多个修改的掩模缺陷进行比较，可以检测和消除错误识别的掩模缺陷。