公开(公告)号：US20150053136A1

公开(公告)日：2015-02-26

申请号：US13974366

申请日：2013-08-23

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Eddy Lay ,  Shih-Min Tseng ,  Sheng-Wei Wu ,  Jen-Chung Chen ,  Shih-Fang Chen

IPC: C23C16/46

CPC classification number: C23C16/46 ,  C23C16/4401 ,  C23C16/455

Abstract: A vertical furnace includes a heat treatment tube, at least one reactive gas inlet, first adiabatic plates and second adiabatic plates. The at least one reactive gas inlet is disposed at or near a bottom end of the heat treatment tube. The first adiabatic plates are stacked in the heat treatment tube, each of the first adiabatic plates having a flow channel structure for allowing a gas to pass through, in which all the corners in the flow channel structure are rounded. The second adiabatic plates are stacked below the first adiabatic plates in the heat treatment tube.

Abstract translation: 立式炉包括热处理管，至少一个反应性气体入口，第一绝热板和第二绝热板。 至少一个反应气体入口设置在热处理管的底端处或其附近。 第一绝热板堆叠在热处理管中，每个第一绝热板具有用于允许气体通过的流动通道结构，其中流动通道结构中的所有角都是圆形的。 第二绝热板堆叠在热处理管中的第一绝热板的下方。

公开(公告)号：US09605345B2

公开(公告)日：2017-03-28

申请号：US13974366

申请日：2013-08-23

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Eddy Lay ,  Shih-Min Tseng ,  Sheng-Wei Wu ,  Jen-Chung Chen ,  Shih-Fang Chen

IPC: C23C16/46 ,  C23C16/44 ,  C23C16/455

CPC classification number: C23C16/46 ,  C23C16/4401 ,  C23C16/455

Abstract: A vertical furnace includes a heat treatment tube, at least one reactive gas inlet, first adiabatic plates and second adiabatic plates. The at least one reactive gas inlet is disposed at or near a bottom end of the heat treatment tube. The first adiabatic plates are stacked in the heat treatment tube, each of the first adiabatic plates having a flow channel structure for allowing a gas to pass through, in which all the corners in the flow channel structure are rounded. The second adiabatic plates are stacked below the first adiabatic plates in the heat treatment tube.