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1.发明申请公开(公告)号：US20200132300A1
公开(公告)日：2020-04-30
申请号：US16725613
申请日：2019-12-23
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Ming-Hsun TSAI , Ping-Cheng LI , Yen-Hsun CHEN
Abstract: An apparatus coupled to a chamber for processing extreme ultraviolet radiation includes a gas inlet configured to direct exhaust gases from the chamber into a combustion zone. The combustion zone is configured to flamelessly ignite the exhaust gases. An air inlet is configured to direct a mixture of air and a fuel into the combustion zone. A control valve is configured to change a volume of fluid exhausted from the combustion zone. A controller configured to control the control valve so as to prevent a pressure inside the combustion zone from exceeding a preset pressure value is provided.
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2.发明申请公开(公告)号：US20200003414A1
公开(公告)日：2020-01-02
申请号：US16389579
申请日：2019-04-19
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Ming-Hsun TSAI , Ping-Cheng Li , Yen-Hsun CHEN
Abstract: An apparatus coupled to a chamber for processing extreme ultraviolet radiation includes a gas inlet configured to direct exhaust gases from the chamber into a combustion zone. The combustion zone is configured to flamelessly ignite the exhaust gases. An air inlet is configured to direct a mixture of air and a fuel into the combustion zone. A control valve is configured to change a volume of fluid exhausted from the combustion zone. A controller configured to control the control valve so as to prevent a pressure inside the combustion zone from exceeding a preset pressure value is provided.
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Patent Agency Ranking
3.发明申请公开(公告)号：US20200348608A1
公开(公告)日：2020-11-05
申请号：US16933872
申请日：2020-07-20
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Yen-Hsun CHEN , Ming-Hsun TSAI , Shao-Hua WANG , Han-Lung CHANG , Li-Jui CHEN , Chia-Chen CHEN
Abstract: An extreme ultraviolet radiation source apparatus includes a chamber including at least a droplet generator, a nozzle of the droplet generator, and a dry ice blasting assembly. The droplet generator includes a reservoir for a molten metal, and the nozzle has a first end connected to the reservoir and a second opposing end where molten metal droplets emerge from the nozzle. The dry ice blasting assembly includes a blasting nozzle, a blasting air inlet and a blaster carbon dioxide (CO2) inlet. The blasting nozzle is disposed inside the chamber. The blasting nozzle is arranged to direct a pressurized air stream and dry ice particles at the nozzle of the droplet generator.
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公开(公告)号：US20200166848A1
公开(公告)日：2020-05-28
申请号：US16249046
申请日：2019-01-16
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Ming-Hsun TSAI , Han-Lung CHANG , Yen-Hsun CHEN , Shao-Hua WANG , Li-Jui CHEN , Po-Chung CHENG
IPC: G03F7/20
Abstract: A method of operating an extreme ultraviolet (EUV) lithography system includes directing a metallic droplet along a shroud, wherein the shroud has a first opening adjacent a droplet generator and a second opening adjacent an excitation region; partially shielding the second opening of the shroud; and emitting a laser beam encountering the metallic droplet to generate an EUV light.
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公开(公告)号：US20250123555A1
公开(公告)日：2025-04-17
申请号：US18487881
申请日：2023-10-16
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Jia-Lin SYU , Tai-Yu CHEN , Yi-Zhen CHEN , Yen-Hsun CHEN , Shang-Chieh CHIEN , Li-Jui CHEN
IPC: G03F1/84 , G01N21/88 , G01N21/956
Abstract: A method for operating a reticle inspection system includes training an analysis model of the reticle inspection system with a machine learning process, generating a difference threshold based on the machine learning process, storing a reference image, and generating a scan image of a reticle with the reticle inspection system. The method includes generating a relative difference value by comparing the scan image to the reference image. The method includes, if the relative difference value is less than the difference threshold, determining that the reticle is not defective. The method includes, if the relative difference value is greater than the difference threshold, determining that the reticle is defective.
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公开(公告)号：US20230060598A1
公开(公告)日：2023-03-02
申请号：US17463328
申请日：2021-08-31
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Yi-Zhen CHEN , Yen-Hsun CHEN , Jhan-Hong YEH , Tzung-Chi FU , Han-Lung CHANG , Li-Jui CHEN
IPC: G03F7/20
Abstract: An EUV photolithography system utilizes a baseplate of an EUV pod to unload an EUV reticle from a chuck within an EUV scanner. The baseplate includes a top surface and support pins extending from the top surface. The when the reticle is unloaded onto the baseplate, the support pins hold the reticle at relatively large distance from the top surface of the baseplate. The support pins have a relatively low resistance. The large distance and low resistance help ensure that particles do not travel from the baseplate to the reticle during unloading.
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7.发明申请公开(公告)号：US20200004168A1
公开(公告)日：2020-01-02
申请号：US16404235
申请日：2019-05-06
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Yen-Hsun CHEN , Ming-Hsun TSAI , Shao-Hua WANG , Han-Lung CHANG , Li-Jui CHEN , Chia-Chen CHEN
Abstract: An extreme ultraviolet radiation source apparatus includes a chamber including at least a droplet generator, a nozzle of the droplet generator, and a dry ice blasting assembly. The droplet generator includes a reservoir for a molten metal, and the nozzle has a first end connected to the reservoir and a second opposing end where molten metal droplets emerge from the nozzle. The dry ice blasting assembly includes a blasting nozzle, a blasting air inlet and a blaster carbon dioxide (CO2) inlet. The blasting nozzle is disposed inside the chamber. The blasting nozzle is arranged to direct a pressurized air stream and dry ice particles at the nozzle of the droplet generator.
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